KR100201395B1 - 반도체 노광장비의 얼라인 키 인식방법 - Google Patents
반도체 노광장비의 얼라인 키 인식방법 Download PDFInfo
- Publication number
- KR100201395B1 KR100201395B1 KR1019960027749A KR19960027749A KR100201395B1 KR 100201395 B1 KR100201395 B1 KR 100201395B1 KR 1019960027749 A KR1019960027749 A KR 1019960027749A KR 19960027749 A KR19960027749 A KR 19960027749A KR 100201395 B1 KR100201395 B1 KR 100201395B1
- Authority
- KR
- South Korea
- Prior art keywords
- alignment
- alignment key
- exposure apparatus
- semiconductor exposure
- key
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 17
- 238000001514 detection method Methods 0.000 title description 5
- 238000000034 method Methods 0.000 claims abstract description 13
- 230000002194 synthesizing effect Effects 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 10
- 238000005530 etching Methods 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (1)
- 웨이퍼 상에 형성되어 있는 X축 또는 Y축의 얼라인 키에 각각 2개의 스코프를 경사지도록 설치하여 일정각도로 경사지도록 빛을 비추고, 그 비춰진 빛의 반사된 시그널을 합성하여 적분함으로써 중심치를 구하여 정열오차를 감소시키도록 하는 것을 특징으로 하는 반도체 노광장비의 얼라인 키 인식방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960027749A KR100201395B1 (ko) | 1996-07-10 | 1996-07-10 | 반도체 노광장비의 얼라인 키 인식방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960027749A KR100201395B1 (ko) | 1996-07-10 | 1996-07-10 | 반도체 노광장비의 얼라인 키 인식방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR980010641A KR980010641A (ko) | 1998-04-30 |
KR100201395B1 true KR100201395B1 (ko) | 1999-06-15 |
Family
ID=19465858
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960027749A Expired - Fee Related KR100201395B1 (ko) | 1996-07-10 | 1996-07-10 | 반도체 노광장비의 얼라인 키 인식방법 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100201395B1 (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100464854B1 (ko) * | 2002-06-26 | 2005-01-06 | 삼성전자주식회사 | 반도체 기판의 정렬 방법 및 정렬 장치 |
-
1996
- 1996-07-10 KR KR1019960027749A patent/KR100201395B1/ko not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR980010641A (ko) | 1998-04-30 |
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Legal Events
Date | Code | Title | Description |
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A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19960710 |
|
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 19960710 Comment text: Request for Examination of Application |
|
PG1501 | Laying open of application | ||
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 19980929 Patent event code: PE09021S01D |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19981216 |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 19990313 Patent event code: PR07011E01D |
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PR1002 | Payment of registration fee |
Payment date: 19990315 End annual number: 3 Start annual number: 1 |
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PG1601 | Publication of registration | ||
PR1001 | Payment of annual fee |
Payment date: 20020219 Start annual number: 4 End annual number: 4 |
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PR1001 | Payment of annual fee |
Payment date: 20030218 Start annual number: 5 End annual number: 5 |
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PR1001 | Payment of annual fee |
Payment date: 20040218 Start annual number: 6 End annual number: 6 |
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FPAY | Annual fee payment |
Payment date: 20050221 Year of fee payment: 7 |
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PR1001 | Payment of annual fee |
Payment date: 20050221 Start annual number: 7 End annual number: 7 |
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LAPS | Lapse due to unpaid annual fee | ||
PC1903 | Unpaid annual fee |
Termination category: Default of registration fee Termination date: 20070210 |