KR100194289B1 - Chemical Circulator - Google Patents

Abstract

The present invention relates to a circulator for chemicals, in a circulator for controlling an automatic valve according to a set signal, storing in a first and a second supply tank, and subsequently filtering the second filter and discharging it to a semiconductor manufacturing process. The 10th automatic valve is installed between the discharge line from the second filter is connected to the storage tank having a large storage volume and configured to repeatedly discharge the chemicals to the second filter through the circulation pump, the second filter It stabilizes the hammering phenomenon caused by the pressure change generated in the process and repeatedly purifies the chemicals without stagnation through the second filter to discharge only a certain amount, thereby supplying pure chemicals to the product process to minimize the defect rate of the product. There is an effect that can significantly improve the productivity.

Description

Chemical Circulator

The present invention relates to a chemical circulation device, and more specifically, to supply and circulate chemicals used for etching, photomask, deep zone, etching, and post-processing operations in a semiconductor manufacturing process, and spraying at a predetermined time in a supply line. Chemical circulator that minimizes the defect rate of the product by supplying only pure chemicals to the manufacturing process by filtering out contaminated phenomena in the supply line and filtering out foreign substances and impurities contained in the chemicals sequentially. It is about.

In general, in the delivery line for supplying chemicals, the chemicals passing through the supply line contain some impurities according to the original manufacturing process and are purified by a filter to reduce the impurities to a minimum and supply the product. It is possible to reduce the defective rate of the product by processing.

Conventionally, as shown in FIG. 1, a transfer pump 2 for transferring chemicals at a constant pressure from a container 1 containing chemicals, and impurities of chemicals transferred from the transfer pump 2 A first supply tank (4) and a second supply tank (5) for storing a predetermined amount of the chemicals filtered in the first filter (3), the first filter (3), and then supplying a predetermined amount to the manufacturing process; A second filter 6 for filtering impurities of the chemicals supplied through the first supply tank 4 and the second supply tank 5 in two stages, and the chemical filtered through the second filter 6 It is installed and configured as a discharge port 7 for discharging a chemical.

Then, a first automatic valve (A) and a second automatic valve (B) are installed between the transfer pumps (2) for transferring the chemicals from the container (1) containing the chemicals, and the transfer pump (2) And a third automatic valve (C) and a fourth automatic valve (D) are respectively installed in the supply lines between the first supply tank 4 and the second supply tank 5, respectively. 4) and the fifth automatic valve (E) and the sixth automatic valve (F) are installed between the second filter (6) supplied from the second supply tank (5), the chemicals from the second filter (6) The seventh automatic valve G is provided between the discharge ports 7 to be discharged, and is configured to be opened and closed mutually by a signal of a set program.

Each automatic valve mentioned above employs the diaphragm valve which can normally open and operate a valve according to the air pressure signal.

Referring to the operation of the conventional chemical circulation device configured as described above are as follows.

The first automatic valve (A) and the second automatic valve (A) to the supply line connected from the chemical container (1) containing the chemical in the manufacturing process work line where the semiconductor etching, photomask, deep zone, etching and post-processing operations are performed When the automatic valve (B) is opened by the set signal, the feed pump (2) installed in the supply line is then turned on, and the chemical at this time is the first automatic valve (A) and the second automatic valve (B). As it opens, it is transferred to the first filter 3 via the transfer pump 2.

In the above state, the chemical is filtered through the first filter 3 and primarily filters impurities, and the first automatic valve (C) and the fourth automatic valve (D) of the supply line are opened in accordance with the first filter. Supply tank (4) The chemical is introduced into the second supply tank (5) and stored.

The first supply tank (4), the second supply tank (5) is provided with a level gauge (shown in the drawing) to check the storage amount and pressure of the chemicals, so that the storage state of the introduced chemicals It is possible to identify the height of the pressure according to the chemicals can be stored in a certain amount, constant pressure.

Meanwhile, the fifth automatic valve E and the sixth automatic valve F installed in the supply lines of the first supply tank 4 and the second supply tank 5 are the first supply tank 4 and the second supply. If the discharge time from the tank 5 to the manufacturing process and the predetermined pressure, the first filter described above through the second filter (6) installed in the supply line by opening each of the chemicals by a predetermined amount is opened in accordance with the set program signal Secondly, the impurities remaining in the chemicals passed while filtering in (3) are secondarily filtered and sent to the discharge port 7 through the seventh automatic valve G of the supply line to etch the reaction body, photomask, deep zone, and etching. And it is possible to carry out the process of post-processing work.

In the state in which the chemical is discharged through the discharge port 7 of the supply line by a predetermined amount, the chemical is supplied from the container 1 as in the initial state as described above, so that the first supply tank 4 and the second supply tank Stored repeatedly in (5).

However, finally, the chemical discharged through the discharge port (7) is a constant pressure from the fifth automatic valve (E), the sixth automatic valve (F) installed in the first supply tank (4), the second supply tank (5) As the chemical is supplied to the second filter 6 to be filtered, a hammering phenomenon occurs in the second filter 6, which causes the second filter 6 to be impaired, thereby causing damage. The mixed impurities are sent out with less filtered impurities by coercive filtering, which leads to poor quality in the product quality during the semiconductor product processing step, and the chemicals are stagnated in the supply line because they are sent out by a certain amount according to the manufacturing process. The longer the time is, the more practically the phenomenon of collecting finely generated impurities from each valve from the supply line, and the product is processed with the impurities exceeding the allowable value. There was a problem of reducing acidity.

The technical problem of the present invention has been devised to solve the conventional problems as described above, by allowing the chemicals in the supply line to be repeatedly purified without stagnant phenomena in order to sequentially filter the foreign substances and impurities contained in the chemicals Its purpose is to supply chemicals to the product process to minimize the defect rate of the product according to the product process.

According to the present invention for achieving the above object, according to the control of the automatic valve by the set signal filtered by the first filter in the supply line for transporting the chemical is stored in the first and second supply tank secondary to the second filter A circulating device for filtering and discharging to a semiconductor manufacturing process through a seventh automatic valve, comprising: an eighth automatic valve installed on the supply line side of the first filter to control supply of chemicals; A storage tank connected to and installed to store a predetermined amount of chemicals, a ninth automatic valve installed in a supply line of the storage tank to control supply of stored chemicals, and forcibly transferring chemicals according to the opening of the automatic valve Connected to the storage tank between the circulation pump for supplying the first supply tank and the second supply tank and the supply line is filtered and discharged by the second filter following the supply tank It is achieved by providing a chemical purifying apparatus installed with a tenth automatic valve installed to control supply of chemicals.

1 is a flow chart showing a circulator of a conventional chemical.

2 is a flow chart showing the discharge state in the chemical supply of the present invention.

* Explanation of symbols for main parts of the drawings

30: first filter 40: first supply tank

50: second supply tank 60: second filter

70: discharge port 80: storage tank

90: circulation pump 100: circulation line

g: 7th automatic valve h: 8th automatic valve

i: 9th automatic valve j: 10th automatic valve

Referring to the accompanying Figure 2 showing the present invention will be described.

2 is a flow chart showing the discharge state in the chemical supply of the present invention.

In accordance with the control of the automatic valve by the set signal filtered by the first filter 30 from the supply line for transporting chemicals in the apparatus required for the etching, photomask, deep zone, etching, and post-processing of the semiconductor The first and second supply tanks 40, 50 after storing in the second filter 60 and secondary circulating device to be discharged to the semiconductor manufacturing process through the seventh automatic valve (g), 1, an eighth automatic valve (h) for controlling chemicals is installed on the supply line side of the filter (30), and a storage tank (80) connected to the eighth automatic valve (h) for storing a predetermined amount of chemicals is provided. Is installed, the ninth automatic valve (i) is installed in the supply line of the storage tank 80 to control the supply of the stored chemicals is installed, and forced chemicals in accordance with the opening of the ninth automatic valve (i) A circulation pump 90 which transfers and supplies the first supply tank 40 and the second supply tank 50 to each other. ), And a tenth automatic valve (j) connected to the storage tank 80 is installed between the supply line is filtered and discharged by the second filter 60 after the supply tank to control the supply of chemicals. .

In addition, the tenth automatic valve j is configured to be opened at the same time when the seventh automatic valve g is opened according to a set signal so that the chemicals are re-stored in the storage tank 80 and the supply tank.

Reference numeral 100 denotes a circulation line in which the tenth automatic valve j is installed.

Referring to the operation of the circulator of the chemical of the present invention configured as described above are as follows.

First, the first automatic valve (a) and the second automatic valve (b) are sequentially opened in the supply line connected from the chemical container 10 by the same method as the conventional method and the transfer pump 20 of the supply line is installed. It turns on.

The chemicals mixed in the above state are introduced into the storage tank 80 according to the opening of the eighth automatic valve (h) of the supply line in the state in which impurities are filtered through the first filter 30. Save it.

At this time, when a certain amount of chemical is introduced into the storage tank 80, the first automatic valve (a), the second automatic valve (b) is opened and closed sequentially, the chemical in the storage tank (80) It is stored at a constant pressure.

When the chemicals stored in the storage tank 80 in the above state reaches an appropriate amount in the level gauge (omitted in the drawing), the ninth automatic valve (i) installed in the lower supply line of the storage tank 80 Is opened according to the program signal, and the chemical passing through the ninth automatic valve (i) is circulated by the circulation pump (90) installed in the supply line while the third automatic valve (c) and the fourth automatic valve (d) Is transported through and stored in the first supply tank 40, the second supply tank (50).

Meanwhile, the fifth automatic valve (e) and the sixth automatic valve (f) installed at the lower supply line of the first supply tank 40 and the second supply tank 50 are opened and sent out according to the manufacturing process and at the same time, the supply line It is sent to the discharge port 70 side through the second filter 60 installed in the.

In this case, the chemical is supplied in the first supply tank 40 because the chemical is secondarily stored in the first supply tank 40 and the second supply tank 50 in the storage tank 80 having a large storage amount. In this case, the pressure of the chemical supply state can be balanced from the second supply tank 50, and chemicals can be sent out within a range not imparting pressure to the second filter 60.

At this time, the chemicals are secondarily filtered through the second filter 60 and the remaining impurities are sent out through the seventh automatic valve g. In this connection, the chemicals are interposed between the second filter 60 and the seventh automatic valve. The tenth automatic valve j of the circulation line 100 installed between (g) is simultaneously opened in accordance with a set program signal, and a predetermined amount of chemicals sent out is the tenth automatic valve of the circulation line 100. Through (j) is introduced into the storage tank 80 and stored.

On the other hand, the chemicals sent through the discharge port 70 performs the etching, photomask, deep zone, etching and post-processing of the semiconductor, the chemicals stored in the storage tank 80 is again with the newly introduced chemicals The second filter 60 is filtered in the state of being stored secondary to the first supply tank 40 and the second supply tank 50, and is supplied to the manufacturing process through the discharge port 70 to perform the repetitive work. Do.

As described above, the present invention stabilizes the hammering phenomenon due to the pressure change generated in the second filter by allowing the storage line to be re-stored in a storage tank having a large storage volume in a supply line for circulating chemicals through the discharge port without stabilizing the pressure. In addition, by repeatedly circulating the chemical through the second filter without congestion, only a certain amount is discharged, the chemical supplies pure chemicals to the product process according to the repeated filtration through the second filter to reduce the defect rate of the product. It is a useful invention that can minimize and significantly improve productivity.

Claims (2)

In the supply line to which chemicals are transferred, the filter is filtered by the first filter 30 and then stored in the first and second supply tanks 40 and 50 according to the control of the automatic valve by the set signal. In the circulation device to be discharged to the peninsula through the seventh automatic valve (g) to the manufacturing process, the eighth automatic valve which is installed on the supply line side of the first filter 30 to control the chemicals ( h), a storage tank (80) connected to the eighth automatic valve (h) and installed to store a predetermined amount of chemicals, and an agent for controlling the supply of stored chemicals installed in a supply line of the storage tank (80). A circulating pump 90 forcibly transferring chemicals to the first supply tank 40 and the second supply tank 50 according to the opening of the ninth automatic valve i and the ninth automatic valve i. And between the first supply tank 40 and the second supply tank 50, the supply line is filtered and discharged by the second filter 60 and the Chemical tank circulating device, characterized in that installed in connection with the storage tank (80) is installed as a tenth automatic valve (j) for controlling the supply of chemicals. The method according to claim 1, wherein the tenth automatic valve j is simultaneously opened when the seventh automatic valve g is opened according to a set signal so that the chemicals are re-stored in the storage tank 80. Circulator of chemicals.