KR0176009B1 - Photoresist coating apparatus of lcd glass kit - Google Patents
Photoresist coating apparatus of lcd glass kit Download PDFInfo
- Publication number
- KR0176009B1 KR0176009B1 KR1019960031832A KR19960031832A KR0176009B1 KR 0176009 B1 KR0176009 B1 KR 0176009B1 KR 1019960031832 A KR1019960031832 A KR 1019960031832A KR 19960031832 A KR19960031832 A KR 19960031832A KR 0176009 B1 KR0176009 B1 KR 0176009B1
- Authority
- KR
- South Korea
- Prior art keywords
- coating
- glass substrate
- bowl
- coating liquid
- coating apparatus
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
Abstract
본 발명은 코팅장치에 관한 것으로서, 보울(4)내에 스핀축(1)과 배큠테이블(2)로 이루어진 코팅장치에 있어서, 상기 배큠테이블(2)에 윙오버 발생용 날개(11)를 설치하고 날개(11)상에 글라스기판(3) 고정용 글라스 스톱퍼핀(12)을 설치 한 구성으로 보울에 부딪쳐 되돌아오는 코팅액을 최소화하여 글라스기판상 코팅을 균일하게 할 수 있는 장점이 있을 뿐만 아니라 글라스기판의 크기에 관계없이 코팅이 가능한 장점이 있는 LCD용 글라스기판에 포토레지스트를 코팅하는 장치이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating apparatus, wherein a coating apparatus comprising a spin shaft (1) and a vacuum table (2) in a bowl (4), wherein a wingover generating wing (11) is provided on the vacuum table (2) The glass stopper pin 12 for fixing the glass substrate 3 on the vane 11 is provided to minimize the coating liquid coming back from the bowl, thereby providing an advantage of uniform coating on the glass substrate. Regardless of the size of the coating is a device for coating a photoresist on a glass substrate for the LCD which has the advantage that the coating is possible.
Description
제1도는 종래 코팅장치의 구조도.1 is a structural diagram of a conventional coating apparatus.
제2도는 본 발명 LCD용 글라스기판에 포토레지스트를 코팅하는 장치의 구조도이다.2 is a structural diagram of an apparatus for coating a photoresist on a glass substrate for an LCD of the present invention.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
1 : 스핀축 2 : 배큠테이블(Vacuum Table)1: spin axis 2: vacuum table
3 : 글라스기판 4 : 보울(Bowl)3: glass substrate 4: bowl
5 : 코팅액 6 : 배출구5: coating liquid 6: outlet
11 : 날개 12 : 글라스 스톱퍼 핀11: wing 12: glass stopper pin
본 발명은 포토레지스트 코팅장치에 관한 것으로서 특히, 글라스 배큠 테이블(Glass Vacuum Table)에 윙 오버(Wing Over)발생용 날개를 설치하여 스핀(Spin)에 의한 공기로를 형성함으로써 원심력에 의한 잔량의 코팅액이 보울(Bowl)에 부딪혀 되돌아오는 현상을 방지하여 균일한 침적막(deposition 막)을 형성하는 LCD용 글라스기판에 포토레지스트를 코팅하는 장치에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photoresist coating apparatus, and in particular, a wing over-generating wing is installed in a glass vacuum table to form an air path by spin, thereby forming a residual amount of coating liquid by centrifugal force. The present invention relates to an apparatus for coating a photoresist on a glass substrate for an LCD, which prevents the phenomenon of hitting the bowl and returns to form a uniform deposition film.
일반적으로 반도체기판 등을 코팅하는 종래의 코팅장치는 제1도에 도시한 바와 같이 스핀모터(도시하지 않음)에 의해 회전하는 스핀축(1)상에 글라스기판(3)재치용 배큠테이블(2)을 설치한 것으로서, 보울(Bowl;4)내에서 배큠테이블(2)상에 글라스기판(3)을 올려 놓고 코팅액(5)을 글라스기판(3)에 일정량 공급한 후 스핀축(1)상에 연결된 진공에 의해 글라스기판(3)이 홀딩된 상태에서 스핀모터와 연결된 구동장치로 스핀축(1)을 회전시켜 코팅을 실시하였다.In general, a conventional coating apparatus for coating a semiconductor substrate or the like has a backing table (2) for placing a glass substrate (3) on a spin shaft (1) rotated by a spin motor (not shown) as shown in FIG. ), The glass substrate (3) is placed on the table (2) in the bowl (4) and the coating liquid (5) is supplied to the glass substrate (3), and then the spin shaft (1) The coating was performed by rotating the spin shaft 1 with a driving device connected to the spin motor while the glass substrate 3 was held by the vacuum connected thereto.
그러나, 이와 같은 종래의 코팅장치는 글라스기판(3)이 스핀에 의한 원심력으로부터 이탈하지 않도록 유지하는 기능만을 갖고 있어서 코팅이 실시되면서 글라스기판(3) 중심부에서 부터 코팅액(5)이 외각으로 퍼져나가 침적되면서 남은 잔량의 코팅액(5)이 글라스기판(3)에서 떨어져 나가며 이때 글라스기판(3)에서 떨어져 나간 잔량의 코팅액(5)이 스핀축(1)의 회전방향에 수평으로 떨어져 나가다가 보울(4)내벽면에 부딪쳐 보울(4)의 구배각도 방향으로 반사되며 떨어지게 되고 반사되어 떨어지는 일부의 코팅액(5)은 부딪치는 각도에 따라 다시 스핀축(1)의 중심축 방향으로 되돌아 온다.However, the conventional coating apparatus has only a function of maintaining the glass substrate 3 so as not to deviate from the centrifugal force due to the spin. As the coating is performed, the coating liquid 5 spreads from the center of the glass substrate 3 to the outer shell. The remaining amount of coating liquid (5) is deposited while falling off the glass substrate (3), and the remaining amount of coating liquid (5) falling off from the glass substrate (3) falls horizontally in the direction of rotation of the spin shaft (1) 4) The coating liquid 5, which is reflected and dropped in the direction of the gradient angle of the bowl 4 by hitting the inner wall surface, is returned to the central axis direction of the spin axis 1 again according to the hit angle.
되돌아오는 코팅액(5)은 자중에 의하여 중심부 하단방향으로 떨어지는데 이때 떨어지는 코팅액(5)은 배큠테이블(2) 중심부 및 테이블축 부분으로 떨어져 부착이 된다. 그에 따라 글라스기판(3)의 코팅이 불균일하게 이루어지는 문제점이 있었다.The return coating liquid 5 falls toward the lower end of the center due to its own weight, and the coating liquid 5 falling off is attached to the center of the backing table 2 and the table shaft portion. Accordingly, there is a problem that the coating of the glass substrate 3 is non-uniform.
또한 배큠테이블(2)의 크기가 다양하지 않고 일정하여 각 크기별로 대응할 수 없어 전용 테이블로 연구소등에서 필요로 하는 다양한 크기의 글라스기판(3)을 코팅할 수 없으므로 글라스기판(3)의 크기 별로 전용 배큠테이블(2)을 교체하거나 또는 글라스기판(3) 크기별로 코팅장치가 요구된다고 하는 문제점이 있었다.In addition, since the size of the backing table 2 is not diverse and constant, it cannot cope with each size, so it is not possible to coat the glass substrate 3 of various sizes required by the laboratory, etc. There was a problem that the coating table is required for each size of the glass table 3 or the replacement of the back table 2.
본 발명은 상기한 실정을 감안하여 종래의 코팅장치가 갖는 문제점들을 해결하고자 발명한 것으로서, 배큠테이블에 윙오버 발생용 날개를 설치하여 스핀에 의한 공기로를 형성함으로써 원심력에 의한 잔량의 코팅액이 보울에 부딪쳐 되돌아오는 현상을 방지하여 균일한 침적막을 코팅할 수 있고, 글라스기판의 크기에 관계없이 사용할 수 있는 LCD용 글라스기판에 포토레지스트를 코팅하는 장치를 제공함에 그 목적이 있다.The present invention has been invented to solve the problems of the conventional coating apparatus in view of the above situation, by installing the wing for generating wings on the backing table to form an air path by the spin, the remaining amount of the coating liquid by the centrifugal force bowl It is an object of the present invention to provide a device for coating a photoresist on a glass substrate for LCD which can coat a uniform deposition film by preventing the phenomenon coming back to hit, regardless of the size of the glass substrate.
상기한 목적을 달성하기 위한 본 발명은 보울(4)내에 스핀축(1)과 배큠테이블(2)로 이루어진 코팅장치에 있어서, 상기 배큠테이블(2)에 윙오버 발생용 날개(11)를 설치하고 날개(11)상에 글라스기판(3) 고정용 글라스 스톱퍼핀(12)을 설치하여서 구성됨을 특징으로 한다.In order to achieve the above object, the present invention provides a coating apparatus including a spin shaft (1) and a backing table (2) in a bowl (4), wherein winging heads (11) for generating wingovers are installed on the backing table (2). And a glass stopper pin 12 for fixing the glass substrate 3 on the wing 11.
이하, 첨부도면을 참조하여 본 발명의 작용 및 효과를 상세하게 설명한다.Hereinafter, with reference to the accompanying drawings will be described in detail the operation and effect of the present invention.
제2도는 본 발명 LCD용 글라스기판에 포토레지스트를 코팅하는 장치의 단면도이다.2 is a cross-sectional view of an apparatus for coating a photoresist on a glass substrate for an LCD of the present invention.
먼저 글라스기판(3)을 배큠테이블(2)상에 올려 놓고 코팅액(5)을 글라스기판(3)의 중심부에 일정량 공급한 후 스핀축(1)에 연결된 진공에 의하여 글라스기판(3)이 홀딩된 상태에서 스핀모터와 연결된 구동장치에 의하여 스핀축(1)을 회전시키면서 코팅을 실시한다.First, the glass substrate 3 is placed on the table 2, the coating liquid 5 is supplied to the center of the glass substrate 3, and then the glass substrate 3 is held by the vacuum connected to the spin shaft 1. In this state, the coating is performed while rotating the spin shaft 1 by a driving device connected to the spin motor.
그러면 코팅이 실시되면서 글라스기판(3) 중심부에서 부터 코팅액(5)이 외각으로 퍼져나가 침적되고 글라스기판(3)상에 침척후 남은 코팅액(5)을 글라스기판(3)으로부터 회전에 의한 원심력 바깥방향으로 떨어져 나가다가 윙오버용 날개(11)에 의한 공기로의 흐름에 흡수되면서 아래 방향으로 떨어지게 된다.Then, the coating is carried out, and the coating liquid 5 spreads from the center of the glass substrate 3 to the outer shell, and the coating liquid 5 remaining after the infiltration on the glass substrate 3 is rotated from the glass substrate 3 to the outside of the centrifugal force. While falling off in the direction is absorbed by the flow to the air by the wing 11 wing 11 will fall in the downward direction.
이와 같은 현상으로 코팅액(5)은 보울(4)면 하단으로 떨어져서 보울(4)면과 부딪치는 량을 최소화하여 반사되는 코팅액(5)을 줄이게 되고, 일부 보울(4)면에 반사되어 돌아오는 코팅액(5)로 윙오버 현상에 의한 공기의 다운(Down)방향에 의해 보울(4) 바닥으로 떨어져 배출된다.As a result of this phenomenon, the coating solution 5 falls to the bottom of the bowl 4 surface, thereby minimizing the amount of the coating liquid 5 to collide with the surface of the bowl 4, thereby reducing the amount of the coating liquid 5 that is reflected. The coating liquid 5 is discharged to the bottom of the bowl 4 by the down direction of air due to the wingover phenomenon.
보울(4) 상부에서 유입되는 공기는 소핀에 의한 윙오버기류에 의해 글라스기판(3)의 외부로 흐르고 또한 드레인(Drain)과 같이 구성된 배출구(6)로 배기되면서 글라스기판(3)의 면에 코팅액(5)이 침적되면서 글라스기판(3)에 진공상태를 만들어 주어 공기에 의한 코팅액(5)이 침적되는 순간 공기의 흐름이 없으므로 균일한 침적막을 얻을 수 있다. 또한 날개(11)상에 설치된 글라스 스톱퍼핀(12)에 의에 글라스기판(3)의 크기에 관계없이 본 코팅장치를 사용할 수 있다.Air flowing from the upper part of the bowl 4 flows to the outside of the glass substrate 3 by a wingover air flow caused by sopin, and is also exhausted to the outlet 6 configured as a drain, and thus the air flows to the surface of the glass substrate 3. As the coating liquid 5 is deposited, a vacuum is formed on the glass substrate 3, and thus, when the coating liquid 5 is deposited by air, there is no flow of air, thereby obtaining a uniform deposition film. In addition, the coating apparatus can be used regardless of the size of the glass substrate 3 by the glass stopper pin 12 installed on the wing 11.
상기한 바와같이 작용하는 본 발명 코팅장치는 보울에 부딪쳐 되돌아오는 코팅액을 최소화하여 글라스기판상 코팅을 균일하게 할 수 있는 장점이 있을 뿐만 아니라 글라스기판의 크기에 관계없이 코팅이 가능한 장점이 있다.The coating apparatus of the present invention, which acts as described above, has the advantage of uniformizing the glass substrate coating by minimizing the coating liquid returned to the bowl, and has the advantage of coating regardless of the size of the glass substrate.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960031832A KR0176009B1 (en) | 1996-07-31 | 1996-07-31 | Photoresist coating apparatus of lcd glass kit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960031832A KR0176009B1 (en) | 1996-07-31 | 1996-07-31 | Photoresist coating apparatus of lcd glass kit |
Publications (2)
Publication Number | Publication Date |
---|---|
KR980009159A KR980009159A (en) | 1998-04-30 |
KR0176009B1 true KR0176009B1 (en) | 1999-03-20 |
Family
ID=19468333
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960031832A KR0176009B1 (en) | 1996-07-31 | 1996-07-31 | Photoresist coating apparatus of lcd glass kit |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0176009B1 (en) |
-
1996
- 1996-07-31 KR KR1019960031832A patent/KR0176009B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR980009159A (en) | 1998-04-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0248136B2 (en) | ||
KR0176009B1 (en) | Photoresist coating apparatus of lcd glass kit | |
US6716285B1 (en) | Spin coating of substrate with chemical | |
US6576055B2 (en) | Method and apparatus for controlling air over a spinning microelectronic substrate | |
JPS584926A (en) | Spin coater | |
JP2800008B2 (en) | Rotation processing device and rotation processing method | |
JPS63229169A (en) | Coating apparatus | |
JPH07308625A (en) | Spin coater of substrate | |
JP4447673B2 (en) | Spin processing equipment | |
JP3050630B2 (en) | Coating device | |
KR200235002Y1 (en) | Resist Solution Discharge Device | |
JP2593465B2 (en) | Liquid processing equipment for semiconductor wafers | |
US6395086B1 (en) | Shield for wafer station | |
JPH0766099A (en) | Spinning apparatus | |
JPH0453224A (en) | Spin coater | |
JPH0462069B2 (en) | ||
KR200210564Y1 (en) | Spin coating apparatus of photo resist | |
JPH05166713A (en) | Spin coating device | |
JP2970657B1 (en) | Substrate processing equipment | |
KR960002768B1 (en) | Dispenser for ejecting phenol epoxy | |
JPS5787862A (en) | Rotary coating device | |
JPS63100973A (en) | Coating apparatus | |
JPH03151076A (en) | Coating apparatus | |
JPS63260025A (en) | Spinning coater | |
JPH0450946Y2 (en) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20081006 Year of fee payment: 11 |
|
LAPS | Lapse due to unpaid annual fee |