JPWO2025142647A1 - - Google Patents
Info
- Publication number
- JPWO2025142647A1 JPWO2025142647A1 JP2025529781A JP2025529781A JPWO2025142647A1 JP WO2025142647 A1 JPWO2025142647 A1 JP WO2025142647A1 JP 2025529781 A JP2025529781 A JP 2025529781A JP 2025529781 A JP2025529781 A JP 2025529781A JP WO2025142647 A1 JPWO2025142647 A1 JP WO2025142647A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023219175 | 2023-12-26 | ||
| JP2023219175 | 2023-12-26 | ||
| PCT/JP2024/044654 WO2025142647A1 (ja) | 2023-12-26 | 2024-12-17 | 感光性樹脂組成物、硬化物および半導体装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2025142647A1 true JPWO2025142647A1 (https=) | 2025-07-03 |
| JPWO2025142647A5 JPWO2025142647A5 (https=) | 2025-11-26 |
| JP7786648B2 JP7786648B2 (ja) | 2025-12-16 |
Family
ID=96217730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025529781A Active JP7786648B2 (ja) | 2023-12-26 | 2024-12-17 | 感光性樹脂組成物、硬化物および半導体装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7786648B2 (https=) |
| TW (1) | TW202542647A (https=) |
| WO (1) | WO2025142647A1 (https=) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018070829A (ja) * | 2016-11-02 | 2018-05-10 | 東レ株式会社 | 樹脂組成物 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102371148B1 (ko) * | 2016-09-09 | 2022-03-08 | 도레이 카부시키가이샤 | 수지 조성물 |
| JPWO2022270541A1 (https=) * | 2021-06-25 | 2022-12-29 | ||
| JPWO2024095884A1 (https=) * | 2022-10-31 | 2024-05-10 | ||
| TWI909442B (zh) * | 2023-05-10 | 2025-12-21 | 日商旭化成股份有限公司 | 負型感光性樹脂組合物及硬化浮凸圖案之製造方法 |
-
2024
- 2024-12-17 WO PCT/JP2024/044654 patent/WO2025142647A1/ja active Pending
- 2024-12-17 JP JP2025529781A patent/JP7786648B2/ja active Active
- 2024-12-25 TW TW113150645A patent/TW202542647A/zh unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018070829A (ja) * | 2016-11-02 | 2018-05-10 | 東レ株式会社 | 樹脂組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202542647A (zh) | 2025-11-01 |
| WO2025142647A1 (ja) | 2025-07-03 |
| JP7786648B2 (ja) | 2025-12-16 |
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