JPWO2025115438A1 - - Google Patents
Info
- Publication number
- JPWO2025115438A1 JPWO2025115438A1 JP2025521123A JP2025521123A JPWO2025115438A1 JP WO2025115438 A1 JPWO2025115438 A1 JP WO2025115438A1 JP 2025521123 A JP2025521123 A JP 2025521123A JP 2025521123 A JP2025521123 A JP 2025521123A JP WO2025115438 A1 JPWO2025115438 A1 JP WO2025115438A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2025188923A JP2026012442A (ja) | 2023-11-27 | 2025-11-10 | 反射型マスクブランク、反射型マスク、反射型マスクの製造方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023199954 | 2023-11-27 | ||
| PCT/JP2024/036843 WO2025115438A1 (ja) | 2023-11-27 | 2024-10-16 | 反射型マスクブランク、反射型マスク、反射型マスクの製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025188923A Division JP2026012442A (ja) | 2023-11-27 | 2025-11-10 | 反射型マスクブランク、反射型マスク、反射型マスクの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2025115438A1 true JPWO2025115438A1 (https=) | 2025-06-05 |
Family
ID=95897295
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025521123A Pending JPWO2025115438A1 (https=) | 2023-11-27 | 2024-10-16 | |
| JP2025188923A Pending JP2026012442A (ja) | 2023-11-27 | 2025-11-10 | 反射型マスクブランク、反射型マスク、反射型マスクの製造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025188923A Pending JP2026012442A (ja) | 2023-11-27 | 2025-11-10 | 反射型マスクブランク、反射型マスク、反射型マスクの製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (2) | JPWO2025115438A1 (https=) |
| TW (1) | TW202538394A (https=) |
| WO (1) | WO2025115438A1 (https=) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220121105A1 (en) * | 2019-02-07 | 2022-04-21 | Asml Netherlands B.V. | A patterning device and method of use thereof |
| WO2023112767A1 (ja) * | 2021-12-13 | 2023-06-22 | Ａｇｃ株式会社 | 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法 |
| WO2023190696A1 (ja) * | 2022-03-29 | 2023-10-05 | 株式会社トッパンフォトマスク | 反射型フォトマスクブランク及び反射型フォトマスク |
| JP2023168532A (ja) * | 2022-04-28 | 2023-11-24 | Ａｇｃ株式会社 | 反射型マスクブランク |
-
2024
- 2024-10-16 WO PCT/JP2024/036843 patent/WO2025115438A1/ja active Pending
- 2024-10-16 JP JP2025521123A patent/JPWO2025115438A1/ja active Pending
- 2024-10-22 TW TW113140066A patent/TW202538394A/zh unknown
-
2025
- 2025-11-10 JP JP2025188923A patent/JP2026012442A/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220121105A1 (en) * | 2019-02-07 | 2022-04-21 | Asml Netherlands B.V. | A patterning device and method of use thereof |
| WO2023112767A1 (ja) * | 2021-12-13 | 2023-06-22 | Ａｇｃ株式会社 | 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法 |
| WO2023190696A1 (ja) * | 2022-03-29 | 2023-10-05 | 株式会社トッパンフォトマスク | 反射型フォトマスクブランク及び反射型フォトマスク |
| JP2023168532A (ja) * | 2022-04-28 | 2023-11-24 | Ａｇｃ株式会社 | 反射型マスクブランク |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202538394A (zh) | 2025-10-01 |
| JP2026012442A (ja) | 2026-01-23 |
| WO2025115438A1 (ja) | 2025-06-05 |
Similar Documents
Legal Events
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