JPWO2025079493A1 - - Google Patents

Info

Publication number
JPWO2025079493A1
JPWO2025079493A1 JP2025511362A JP2025511362A JPWO2025079493A1 JP WO2025079493 A1 JPWO2025079493 A1 JP WO2025079493A1 JP 2025511362 A JP2025511362 A JP 2025511362A JP 2025511362 A JP2025511362 A JP 2025511362A JP WO2025079493 A1 JPWO2025079493 A1 JP WO2025079493A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2025511362A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2025079493A1 publication Critical patent/JPWO2025079493A1/ja
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05Metallic powder characterised by the size or surface area of the particles
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/04Making non-ferrous alloys by powder metallurgy
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C27/00Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/04Alloys based on tungsten or molybdenum
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
JP2025511362A 2023-10-12 2024-10-03 Pending JPWO2025079493A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023176717 2023-10-12
PCT/JP2024/035427 WO2025079493A1 (ja) 2023-10-12 2024-10-03 モリブデンを含む粉末およびターゲット

Publications (1)

Publication Number Publication Date
JPWO2025079493A1 true JPWO2025079493A1 (https=) 2025-04-17

Family

ID=95395302

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025511362A Pending JPWO2025079493A1 (https=) 2023-10-12 2024-10-03

Country Status (2)

Country Link
JP (1) JPWO2025079493A1 (https=)
WO (1) WO2025079493A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005314714A (ja) * 2004-04-27 2005-11-10 Japan New Metals Co Ltd スパッタリング用高純度金属Mo焼結ターゲットの製造に原料粉末として用いるのに適した高純度金属Mo粗粒粉末
WO2019176962A1 (ja) * 2018-03-13 2019-09-19 Jx金属株式会社 スパッタリングターゲット及び、スパッタリングターゲットの製造方法
WO2023063204A1 (ja) * 2021-10-13 2023-04-20 株式会社アライドマテリアル モリブデンを含む粉末

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005314714A (ja) * 2004-04-27 2005-11-10 Japan New Metals Co Ltd スパッタリング用高純度金属Mo焼結ターゲットの製造に原料粉末として用いるのに適した高純度金属Mo粗粒粉末
WO2019176962A1 (ja) * 2018-03-13 2019-09-19 Jx金属株式会社 スパッタリングターゲット及び、スパッタリングターゲットの製造方法
WO2023063204A1 (ja) * 2021-10-13 2023-04-20 株式会社アライドマテリアル モリブデンを含む粉末

Also Published As

Publication number Publication date
WO2025079493A1 (ja) 2025-04-17

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