JPWO2024219050A1 - - Google Patents
Info
- Publication number
- JPWO2024219050A1 JPWO2024219050A1 JP2025515059A JP2025515059A JPWO2024219050A1 JP WO2024219050 A1 JPWO2024219050 A1 JP WO2024219050A1 JP 2025515059 A JP2025515059 A JP 2025515059A JP 2025515059 A JP2025515059 A JP 2025515059A JP WO2024219050 A1 JPWO2024219050 A1 JP WO2024219050A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/04—Pattern deposit, e.g. by using masks
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/10—Heating of the reaction chamber or the substrate
- C30B25/105—Heating of the reaction chamber or the substrate by irradiation or electric discharge
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
- C30B25/186—Epitaxial-layer growth characterised by the substrate being specially pre-treated by, e.g. chemical or physical means
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
- G01R29/08—Measuring electromagnetic field characteristics
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/20—Arrangements or instruments for measuring magnetic variables involving magnetic resonance
- G01R33/24—Arrangements or instruments for measuring magnetic variables involving magnetic resonance for measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/26—Arrangements or instruments for measuring magnetic variables involving magnetic resonance for measuring direction or magnitude of magnetic fields or magnetic flux using optical pumping
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/20—Arrangements or instruments for measuring magnetic variables involving magnetic resonance
- G01R33/28—Details of apparatus provided for in groups G01R33/44 - G01R33/64
- G01R33/32—Excitation or detection systems, e.g. using radio frequency signals
- G01R33/323—Detection of MR without the use of RF or microwaves, e.g. force-detected MR, thermally detected MR, MR detection via electrical conductivity, optically detected MR
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023067532 | 2023-04-18 | ||
| PCT/JP2024/003395 WO2024219050A1 (ja) | 2023-04-18 | 2024-02-02 | ダイヤモンドスピンセンサおよびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024219050A1 true JPWO2024219050A1 (https=) | 2024-10-24 |
| JPWO2024219050A5 JPWO2024219050A5 (https=) | 2026-01-22 |
Family
ID=93152264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025515059A Pending JPWO2024219050A1 (https=) | 2023-04-18 | 2024-02-02 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP4700418A1 (https=) |
| JP (1) | JPWO2024219050A1 (https=) |
| CN (1) | CN121039516A (https=) |
| WO (1) | WO2024219050A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025182849A1 (ja) * | 2024-02-28 | 2025-09-04 | 住友電気工業株式会社 | ダイヤモンドセンサ |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9133566B2 (en) * | 2005-12-09 | 2015-09-15 | Element Six Technologies Limited | High crystalline quality synthetic diamond |
| US10324142B2 (en) * | 2014-01-20 | 2019-06-18 | Japan Science And Technology Agency | Diamond crystal, diamond devices, magnetic sensor, magnetic sensor system, and method for manufacturing sensor array |
| CN107356820A (zh) * | 2017-06-07 | 2017-11-17 | 南京邮电大学 | 一种基于脉冲光探测磁共振的电磁场近场成像系统及方法 |
| US10481155B2 (en) * | 2018-03-09 | 2019-11-19 | Somalogic, Inc. | Proteomic assay using quantum sensors |
| EP3803423A4 (en) * | 2018-04-30 | 2022-03-16 | Khodas, Maxim | ESTIMATION OF DYNAMIC PROPERTIES OF FLUIDS USING OPTICAL DEFECTS PRESENT IN SOLIDS |
| JP7186963B2 (ja) * | 2018-10-16 | 2022-12-12 | 国立大学法人東京工業大学 | 磁気計測装置 |
| DE102019219052A1 (de) * | 2019-12-06 | 2021-06-10 | Robert Bosch Gmbh | Verfahren zur Ermittlung der Änderung einer Orientierung im Raum eines NMR-Gyroskops sowie ein NMR-Gyroskop |
| CN116997689A (zh) * | 2021-03-31 | 2023-11-03 | 住友电气工业株式会社 | 单晶金刚石及其制造方法 |
| JP7535988B2 (ja) | 2021-11-01 | 2024-08-19 | 三菱電機株式会社 | 乾燥装置、熱交換換気装置および乾燥制御方法 |
-
2024
- 2024-02-02 CN CN202480026238.3A patent/CN121039516A/zh active Pending
- 2024-02-02 EP EP24792326.1A patent/EP4700418A1/en active Pending
- 2024-02-02 JP JP2025515059A patent/JPWO2024219050A1/ja active Pending
- 2024-02-02 WO PCT/JP2024/003395 patent/WO2024219050A1/ja not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024219050A1 (ja) | 2024-10-24 |
| CN121039516A (zh) | 2025-11-28 |
| EP4700418A1 (en) | 2026-02-25 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250718 |