JPWO2024201614A1 - - Google Patents
Info
- Publication number
- JPWO2024201614A1 JPWO2024201614A1 JP2025509250A JP2025509250A JPWO2024201614A1 JP WO2024201614 A1 JPWO2024201614 A1 JP WO2024201614A1 JP 2025509250 A JP2025509250 A JP 2025509250A JP 2025509250 A JP2025509250 A JP 2025509250A JP WO2024201614 A1 JPWO2024201614 A1 JP WO2024201614A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Sampling And Sample Adjustment (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2023/012017 WO2024201614A1 (ja) | 2023-03-24 | 2023-03-24 | イオンミリング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024201614A1 true JPWO2024201614A1 (cg-RX-API-DMAC7.html) | 2024-10-03 |
| JPWO2024201614A5 JPWO2024201614A5 (cg-RX-API-DMAC7.html) | 2025-11-11 |
Family
ID=92903562
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025509250A Pending JPWO2024201614A1 (cg-RX-API-DMAC7.html) | 2023-03-24 | 2023-03-24 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPWO2024201614A1 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2024201614A1 (cg-RX-API-DMAC7.html) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5862080U (ja) * | 1981-10-21 | 1983-04-26 | 昭和電線電纜株式会社 | 冷媒自動供給装置 |
| JPH0634818Y2 (ja) * | 1991-03-15 | 1994-09-14 | 岩谷産業株式会社 | 機器冷却用液化ガス貯蔵容器への液化ガス自動供給装置 |
| JP2903754B2 (ja) * | 1991-03-28 | 1999-06-14 | 株式会社島津製作所 | 熱分析装置用加熱炉及び温度制御方法 |
| CN105264632B (zh) * | 2013-06-10 | 2017-03-08 | 株式会社日立高新技术 | 离子碾磨装置 |
| CN208367555U (zh) * | 2018-06-20 | 2019-01-11 | 福建省银丰干细胞工程有限公司 | 程序降温仪 |
| JP6901461B2 (ja) * | 2018-12-07 | 2021-07-14 | 日本電子株式会社 | 真空冷却装置及びイオンミリング装置 |
-
2023
- 2023-03-24 WO PCT/JP2023/012017 patent/WO2024201614A1/ja not_active Ceased
- 2023-03-24 JP JP2025509250A patent/JPWO2024201614A1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024201614A1 (ja) | 2024-10-03 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A529 | Written submission of copy of amendment under article 34 pct |
Free format text: JAPANESE INTERMEDIATE CODE: A5211 Effective date: 20250728 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20250728 |