JPWO2024134780A1 - - Google Patents
Info
- Publication number
- JPWO2024134780A1 JPWO2024134780A1 JP2024565455A JP2024565455A JPWO2024134780A1 JP WO2024134780 A1 JPWO2024134780 A1 JP WO2024134780A1 JP 2024565455 A JP2024565455 A JP 2024565455A JP 2024565455 A JP2024565455 A JP 2024565455A JP WO2024134780 A1 JPWO2024134780 A1 JP WO2024134780A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
- G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/046927 WO2024134780A1 (ja) | 2022-12-20 | 2022-12-20 | 露光システム、及び電子デバイスの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024134780A1 true JPWO2024134780A1 (https=) | 2024-06-27 |
Family
ID=91588120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024565455A Pending JPWO2024134780A1 (https=) | 2022-12-20 | 2022-12-20 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20250264804A1 (https=) |
| JP (1) | JPWO2024134780A1 (https=) |
| CN (1) | CN120153322A (https=) |
| WO (1) | WO2024134780A1 (https=) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4838430B2 (ja) * | 2001-01-26 | 2011-12-14 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
| JP4534376B2 (ja) * | 2001-04-10 | 2010-09-01 | ソニー株式会社 | 露光マスクの製造方法および露光マスク |
| JP6929549B2 (ja) * | 2018-02-14 | 2021-09-01 | 株式会社ピーエムティー | 露光装置及び露光方法 |
| JP2020021084A (ja) * | 2019-09-27 | 2020-02-06 | キヤノン株式会社 | 照明光学系、露光装置、および物品の製造方法 |
-
2022
- 2022-12-20 JP JP2024565455A patent/JPWO2024134780A1/ja active Pending
- 2022-12-20 WO PCT/JP2022/046927 patent/WO2024134780A1/ja not_active Ceased
- 2022-12-20 CN CN202280101662.0A patent/CN120153322A/zh active Pending
-
2025
- 2025-05-06 US US19/199,798 patent/US20250264804A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024134780A1 (ja) | 2024-06-27 |
| CN120153322A (zh) | 2025-06-13 |
| US20250264804A1 (en) | 2025-08-21 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20251110 |