JPWO2024116513A1 - - Google Patents
Info
- Publication number
- JPWO2024116513A1 JPWO2024116513A1 JP2024561170A JP2024561170A JPWO2024116513A1 JP WO2024116513 A1 JPWO2024116513 A1 JP WO2024116513A1 JP 2024561170 A JP2024561170 A JP 2024561170A JP 2024561170 A JP2024561170 A JP 2024561170A JP WO2024116513 A1 JPWO2024116513 A1 JP WO2024116513A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials For Photolithography (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/043813 WO2024116247A1 (ja) | 2022-11-28 | 2022-11-28 | 感光性エレメント、レジストパターンの形成方法、及びプリント配線板の製造方法 |
| PCT/JP2023/031634 WO2024116513A1 (ja) | 2022-11-28 | 2023-08-30 | 感光性エレメント、レジストパターンの形成方法、及びプリント配線板の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024116513A1 true JPWO2024116513A1 (https=) | 2024-06-06 |
Family
ID=91323290
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024561170A Pending JPWO2024116513A1 (https=) | 2022-11-28 | 2023-08-30 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20250278024A1 (https=) |
| JP (1) | JPWO2024116513A1 (https=) |
| KR (1) | KR20250111303A (https=) |
| CN (1) | CN120202439A (https=) |
| TW (1) | TW202421429A (https=) |
| WO (2) | WO2024116247A1 (https=) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001013681A (ja) * | 1999-06-28 | 2001-01-19 | Hitachi Chem Co Ltd | 感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法 |
| JP2014074764A (ja) * | 2012-10-03 | 2014-04-24 | Hitachi Chemical Co Ltd | 感光性エレメント及びこれを用いたレジストパターンの形成方法、プリント配線板の製造方法 |
| WO2017007001A1 (ja) * | 2015-07-08 | 2017-01-12 | 日立化成株式会社 | 感光性エレメント、積層体、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP2021015296A (ja) * | 2020-10-30 | 2021-02-12 | 昭和電工マテリアルズ株式会社 | 感光性エレメント、レジストパターンの形成方法、及び、プリント配線板の製造方法 |
-
2022
- 2022-11-28 WO PCT/JP2022/043813 patent/WO2024116247A1/ja not_active Ceased
-
2023
- 2023-08-30 WO PCT/JP2023/031634 patent/WO2024116513A1/ja not_active Ceased
- 2023-08-30 US US18/858,202 patent/US20250278024A1/en active Pending
- 2023-08-30 CN CN202380037188.4A patent/CN120202439A/zh active Pending
- 2023-08-30 KR KR1020257015044A patent/KR20250111303A/ko active Pending
- 2023-08-30 JP JP2024561170A patent/JPWO2024116513A1/ja active Pending
- 2023-09-18 TW TW112135477A patent/TW202421429A/zh unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001013681A (ja) * | 1999-06-28 | 2001-01-19 | Hitachi Chem Co Ltd | 感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法 |
| JP2014074764A (ja) * | 2012-10-03 | 2014-04-24 | Hitachi Chemical Co Ltd | 感光性エレメント及びこれを用いたレジストパターンの形成方法、プリント配線板の製造方法 |
| WO2017007001A1 (ja) * | 2015-07-08 | 2017-01-12 | 日立化成株式会社 | 感光性エレメント、積層体、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP2021015296A (ja) * | 2020-10-30 | 2021-02-12 | 昭和電工マテリアルズ株式会社 | 感光性エレメント、レジストパターンの形成方法、及び、プリント配線板の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024116247A1 (ja) | 2024-06-06 |
| TW202421429A (zh) | 2024-06-01 |
| US20250278024A1 (en) | 2025-09-04 |
| CN120202439A (zh) | 2025-06-24 |
| WO2024116513A1 (ja) | 2024-06-06 |
| KR20250111303A (ko) | 2025-07-22 |
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