JPWO2024101131A1 - - Google Patents

Info

Publication number
JPWO2024101131A1
JPWO2024101131A1 JP2024557290A JP2024557290A JPWO2024101131A1 JP WO2024101131 A1 JPWO2024101131 A1 JP WO2024101131A1 JP 2024557290 A JP2024557290 A JP 2024557290A JP 2024557290 A JP2024557290 A JP 2024557290A JP WO2024101131 A1 JPWO2024101131 A1 JP WO2024101131A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024557290A
Other languages
Japanese (ja)
Other versions
JPWO2024101131A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024101131A1 publication Critical patent/JPWO2024101131A1/ja
Publication of JPWO2024101131A5 publication Critical patent/JPWO2024101131A5/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • H10D30/021Manufacture or treatment of FETs having insulated gates [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
JP2024557290A 2022-11-08 2023-10-23 Pending JPWO2024101131A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022178811 2022-11-08
PCT/JP2023/038175 WO2024101131A1 (ja) 2022-11-08 2023-10-23 SiC半導体装置

Publications (2)

Publication Number Publication Date
JPWO2024101131A1 true JPWO2024101131A1 (https=) 2024-05-16
JPWO2024101131A5 JPWO2024101131A5 (https=) 2025-07-17

Family

ID=91032632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024557290A Pending JPWO2024101131A1 (https=) 2022-11-08 2023-10-23

Country Status (2)

Country Link
JP (1) JPWO2024101131A1 (https=)
WO (1) WO2024101131A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026018786A1 (ja) * 2024-07-16 2026-01-22 ローム株式会社 半導体装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4764998B2 (ja) * 2003-11-14 2011-09-07 富士電機株式会社 半導体装置
JP5048273B2 (ja) * 2006-05-10 2012-10-17 オンセミコンダクター・トレーディング・リミテッド 絶縁ゲート型半導体装置
JP6022082B2 (ja) * 2014-07-11 2016-11-09 新電元工業株式会社 半導体装置及び半導体装置の製造方法
JP6876767B2 (ja) * 2019-10-07 2021-05-26 ローム株式会社 半導体装置
JP7471974B2 (ja) * 2020-09-18 2024-04-22 株式会社東芝 半導体装置
CN116830262A (zh) * 2021-03-18 2023-09-29 罗姆股份有限公司 宽带隙半导体装置

Also Published As

Publication number Publication date
WO2024101131A1 (ja) 2024-05-16

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Legal Events

Date Code Title Description
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Effective date: 20250424