JPWO2024009674A1 - - Google Patents
Info
- Publication number
- JPWO2024009674A1 JPWO2024009674A1 JP2024531962A JP2024531962A JPWO2024009674A1 JP WO2024009674 A1 JPWO2024009674 A1 JP WO2024009674A1 JP 2024531962 A JP2024531962 A JP 2024531962A JP 2024531962 A JP2024531962 A JP 2024531962A JP WO2024009674 A1 JPWO2024009674 A1 JP WO2024009674A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/18—Curved printing formes or printing cylinders
- B41C1/184—Curved printing formes or printing cylinders by transfer of the design to the cylinder, e.g. from a lithographic printing plate; by drawing the pattern on the cylinder; by direct cutting of the pattern on the cylinder
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/06—Transferring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/16—Curved printing plates, especially cylinders
- B41N1/22—Curved printing plates, especially cylinders made of other substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Structural Engineering (AREA)
- Toxicology (AREA)
- Architecture (AREA)
- Optics & Photonics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022108488 | 2022-07-05 | ||
| PCT/JP2023/021251 WO2024009674A1 (ja) | 2022-07-05 | 2023-06-07 | フレキソ印刷版製造用フィルム、積層体、及びフレキソ印刷版の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024009674A1 true JPWO2024009674A1 (https=) | 2024-01-11 |
Family
ID=89453265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024531962A Pending JPWO2024009674A1 (https=) | 2022-07-05 | 2023-06-07 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20250375963A1 (https=) |
| EP (1) | EP4553578A4 (https=) |
| JP (1) | JPWO2024009674A1 (https=) |
| KR (1) | KR20240141841A (https=) |
| CN (1) | CN119452306A (https=) |
| WO (1) | WO2024009674A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025143201A1 (ja) * | 2023-12-27 | 2025-07-03 | 旭化成株式会社 | 印刷版の製造方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08305007A (ja) * | 1995-05-01 | 1996-11-22 | E I Du Pont De Nemours & Co | フレキソグラフ印刷板の作成方法 |
| JP2000258898A (ja) * | 1999-03-12 | 2000-09-22 | Asahi Chem Ind Co Ltd | フレキソ印刷版用感光性構成体 |
| JP2010237583A (ja) * | 2009-03-31 | 2010-10-21 | Toray Ind Inc | 水系現像感光性樹脂印刷原版 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5996197U (ja) | 1983-09-12 | 1984-06-29 | 福田 啓始郎 | 缶切り具 |
| JPS6418605U (https=) | 1987-07-24 | 1989-01-30 | ||
| JP2634429B2 (ja) | 1988-05-11 | 1997-07-23 | 大日本印刷株式会社 | 感光性樹脂版の支持体 |
| JP3094647B2 (ja) | 1992-04-06 | 2000-10-03 | 旭化成工業株式会社 | 印刷版製造用感光性樹脂支持構造体 |
| DE19536808A1 (de) * | 1995-10-02 | 1997-04-03 | Basf Lacke & Farben | Verfahren zur Herstellung von photopolymeren Hochdruckplatten |
| EP1152296A1 (en) | 1999-09-02 | 2001-11-07 | Toray Industries, Inc. | Photosensitive resin printing plate and method for producing photosensitive printing plate having projection |
| JP4442187B2 (ja) | 2002-10-24 | 2010-03-31 | 東レ株式会社 | 感光性樹脂印刷版原版、その製造方法およびこれを用いた樹脂凸版印刷版の製造方法 |
| JP3830959B2 (ja) | 2003-05-23 | 2006-10-11 | 旭化成ケミカルズ株式会社 | フレキソ印刷用感光性構成体 |
| JP5996197B2 (ja) | 2012-01-27 | 2016-09-21 | 旭化成株式会社 | フレキソ印刷版用液状感光性樹脂組成物 |
| JP6542202B2 (ja) * | 2013-09-18 | 2019-07-10 | フリント、グループ、ジャーマニー、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツング | デジタル的に露光可能なフレキソ印刷要素、及びフレキソ印刷版を生産するための方法 |
| EP3577523B1 (de) * | 2017-01-31 | 2021-01-13 | Flint Group Germany GmbH | Strahlungshärtbares gemisch enthaltend niedrig funktionalisiertes teilverseiftes polyvinylacetat |
| US11046092B2 (en) * | 2019-02-13 | 2021-06-29 | Macdermid Graphics Solutions Llc | Photopolymer film with UV filtering |
| JP7530101B2 (ja) | 2021-01-13 | 2024-08-07 | 有限会社ジェイ・ロード | 内燃機関の出力特性を変化させる方法及びそれに使用する渦発生器具 |
| EP4282656A4 (en) * | 2021-01-20 | 2024-07-17 | Asahi Kasei Kabushiki Kaisha | PHOTOSENSITIVE RESIN STRUCTURE FOR FLEXOGRAPHIC PRINTING PLATE AND METHOD FOR PRODUCING A FLEXOGRAPHIC PRINTING PLATE |
-
2023
- 2023-06-07 CN CN202380050594.4A patent/CN119452306A/zh active Pending
- 2023-06-07 KR KR1020247030207A patent/KR20240141841A/ko active Pending
- 2023-06-07 WO PCT/JP2023/021251 patent/WO2024009674A1/ja not_active Ceased
- 2023-06-07 JP JP2024531962A patent/JPWO2024009674A1/ja active Pending
- 2023-06-07 EP EP23835210.8A patent/EP4553578A4/en not_active Withdrawn
- 2023-06-07 US US18/880,312 patent/US20250375963A1/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08305007A (ja) * | 1995-05-01 | 1996-11-22 | E I Du Pont De Nemours & Co | フレキソグラフ印刷板の作成方法 |
| JP2000258898A (ja) * | 1999-03-12 | 2000-09-22 | Asahi Chem Ind Co Ltd | フレキソ印刷版用感光性構成体 |
| JP2010237583A (ja) * | 2009-03-31 | 2010-10-21 | Toray Ind Inc | 水系現像感光性樹脂印刷原版 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN119452306A (zh) | 2025-02-14 |
| WO2024009674A1 (ja) | 2024-01-11 |
| EP4553578A4 (en) | 2025-12-24 |
| EP4553578A1 (en) | 2025-05-14 |
| KR20240141841A (ko) | 2024-09-27 |
| US20250375963A1 (en) | 2025-12-11 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20241129 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20260109 |