JPWO2023282210A1 - - Google Patents
Info
- Publication number
- JPWO2023282210A1 JPWO2023282210A1 JP2023533108A JP2023533108A JPWO2023282210A1 JP WO2023282210 A1 JPWO2023282210 A1 JP WO2023282210A1 JP 2023533108 A JP2023533108 A JP 2023533108A JP 2023533108 A JP2023533108 A JP 2023533108A JP WO2023282210 A1 JPWO2023282210 A1 JP WO2023282210A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021111848 | 2021-07-05 | ||
PCT/JP2022/026496 WO2023282210A1 (fr) | 2021-07-05 | 2022-07-01 | Dispositif d'exposition, procédé d'exposition, procédé de fabrication d'écran plat et procédé de création de données d'exposition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2023282210A1 true JPWO2023282210A1 (fr) | 2023-01-12 |
Family
ID=84800655
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023533108A Pending JPWO2023282210A1 (fr) | 2021-07-05 | 2022-07-01 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2023282210A1 (fr) |
KR (1) | KR20240017069A (fr) |
CN (1) | CN117597632A (fr) |
TW (1) | TW202309675A (fr) |
WO (1) | WO2023282210A1 (fr) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101019389B1 (ko) * | 2003-01-23 | 2011-03-07 | 가부시키가이샤 니콘 | 노광 장치 |
JP2005266779A (ja) | 2004-02-18 | 2005-09-29 | Fuji Photo Film Co Ltd | 露光装置及び方法 |
US7609362B2 (en) * | 2004-11-08 | 2009-10-27 | Asml Netherlands B.V. | Scanning lithographic apparatus and device manufacturing method |
JP5470707B2 (ja) * | 2008-01-17 | 2014-04-16 | 株式会社ニコン | 露光方法及び装置、並びにデバイス製造方法 |
JP7052242B2 (ja) * | 2017-07-25 | 2022-04-12 | 凸版印刷株式会社 | 露光装置 |
-
2022
- 2022-07-01 WO PCT/JP2022/026496 patent/WO2023282210A1/fr active Application Filing
- 2022-07-01 CN CN202280047260.7A patent/CN117597632A/zh active Pending
- 2022-07-01 JP JP2023533108A patent/JPWO2023282210A1/ja active Pending
- 2022-07-01 KR KR1020247000251A patent/KR20240017069A/ko unknown
- 2022-07-04 TW TW111124948A patent/TW202309675A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
CN117597632A (zh) | 2024-02-23 |
TW202309675A (zh) | 2023-03-01 |
KR20240017069A (ko) | 2024-02-06 |
WO2023282210A1 (fr) | 2023-01-12 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20231128 |