JPWO2023248355A5 - - Google Patents

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Publication number
JPWO2023248355A5
JPWO2023248355A5 JP2024528155A JP2024528155A JPWO2023248355A5 JP WO2023248355 A5 JPWO2023248355 A5 JP WO2023248355A5 JP 2024528155 A JP2024528155 A JP 2024528155A JP 2024528155 A JP2024528155 A JP 2024528155A JP WO2023248355 A5 JPWO2023248355 A5 JP WO2023248355A5
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JP
Japan
Prior art keywords
conformity
learning
model
unit
image
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JP2024528155A
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English (en)
Japanese (ja)
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JPWO2023248355A1 (https=
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Priority claimed from PCT/JP2022/024750 external-priority patent/WO2023248355A1/ja
Publication of JPWO2023248355A1 publication Critical patent/JPWO2023248355A1/ja
Publication of JPWO2023248355A5 publication Critical patent/JPWO2023248355A5/ja
Pending legal-status Critical Current

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JP2024528155A 2022-06-21 2022-06-21 Pending JPWO2023248355A1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/024750 WO2023248355A1 (ja) 2022-06-21 2022-06-21 不適合検出装置、および、不適合検出方法

Publications (2)

Publication Number Publication Date
JPWO2023248355A1 JPWO2023248355A1 (https=) 2023-12-28
JPWO2023248355A5 true JPWO2023248355A5 (https=) 2025-02-19

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ID=89379603

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Application Number Title Priority Date Filing Date
JP2024528155A Pending JPWO2023248355A1 (https=) 2022-06-21 2022-06-21

Country Status (6)

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US (1) US20250356476A1 (https=)
JP (1) JPWO2023248355A1 (https=)
KR (1) KR20240163122A (https=)
CN (1) CN119317938A (https=)
TW (2) TW202507649A (https=)
WO (1) WO2023248355A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025177678A (ja) * 2024-05-24 2025-12-05 浜松ホトニクス株式会社 学習方法、推論モデル、ノイズ低減方法、ノイズ低減システム及びノイズ低減プログラム

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7190842B2 (ja) * 2017-11-02 2022-12-16 キヤノン株式会社 情報処理装置、情報処理装置の制御方法及びプログラム
JP7122625B2 (ja) * 2018-07-02 2022-08-22 パナソニックIpマネジメント株式会社 学習データ収集装置、学習データ収集システム、及び学習データ収集方法
EP3618077A1 (en) * 2018-08-27 2020-03-04 Koninklijke Philips N.V. Generating metadata for trained model
KR102654003B1 (ko) * 2018-12-21 2024-04-04 주식회사 히타치하이테크 화상 인식 장치 및 방법
CN114245933B (zh) * 2019-09-06 2025-11-18 株式会社日立高新技术 制程信息提示系统、制程错误推定系统
JPWO2021095256A1 (https=) * 2019-11-15 2021-05-20
US11544838B2 (en) * 2020-03-21 2023-01-03 Kla Corporation Systems and methods of high-resolution review for semiconductor inspection in backend and wafer level packaging
US12051183B2 (en) * 2020-04-30 2024-07-30 KLA Corp. Training a machine learning model to generate higher resolution images from inspection images
US11769242B2 (en) * 2020-05-21 2023-09-26 Kla Corporation Mode selection and defect detection training
US11776108B2 (en) * 2020-08-05 2023-10-03 KLA Corp. Deep learning based defect detection
CN114095662B (zh) * 2022-01-20 2022-07-05 荣耀终端有限公司 拍摄指引方法及电子设备

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