JPWO2023190677A1 - - Google Patents

Info

Publication number
JPWO2023190677A1
JPWO2023190677A1 JP2024512672A JP2024512672A JPWO2023190677A1 JP WO2023190677 A1 JPWO2023190677 A1 JP WO2023190677A1 JP 2024512672 A JP2024512672 A JP 2024512672A JP 2024512672 A JP2024512672 A JP 2024512672A JP WO2023190677 A1 JPWO2023190677 A1 JP WO2023190677A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2024512672A
Other languages
Japanese (ja)
Other versions
JPWO2023190677A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023190677A1 publication Critical patent/JPWO2023190677A1/ja
Publication of JPWO2023190677A5 publication Critical patent/JPWO2023190677A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46Filters
    • H03H9/54Filters comprising resonators of piezoelectric or electrostrictive material
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02007Details of bulk acoustic wave devices
    • H03H9/02086Means for compensation or elimination of undesirable effects
    • H03H9/02133Means for compensation or elimination of undesirable effects of stress
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02007Details of bulk acoustic wave devices
    • H03H9/02157Dimensional parameters, e.g. ratio between two dimension parameters, length, width or thickness
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/15Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/15Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H03H9/171Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
    • H03H9/172Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
    • H03H9/175Acoustic mirrors

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
JP2024512672A 2022-03-31 2023-03-29 Withdrawn JPWO2023190677A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022058814 2022-03-31
PCT/JP2023/012784 WO2023190677A1 (ja) 2022-03-31 2023-03-29 音響多層膜、高周波フィルタデバイス、及びバルク弾性波フィルタデバイス

Publications (2)

Publication Number Publication Date
JPWO2023190677A1 true JPWO2023190677A1 (https=) 2023-10-05
JPWO2023190677A5 JPWO2023190677A5 (https=) 2026-02-10

Family

ID=88202021

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024512672A Withdrawn JPWO2023190677A1 (https=) 2022-03-31 2023-03-29

Country Status (4)

Country Link
US (1) US20250219611A1 (https=)
JP (1) JPWO2023190677A1 (https=)
TW (1) TW202406299A (https=)
WO (1) WO2023190677A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025205107A1 (ja) * 2024-03-28 2025-10-02 日東電工株式会社 圧電デバイス及び電子機器
CN118249774B (zh) * 2024-05-21 2024-09-20 河源市艾佛光通科技有限公司 一种体声波谐振器及其制备方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005197983A (ja) * 2004-01-07 2005-07-21 Tdk Corp 薄膜バルク波共振器
JP4693407B2 (ja) * 2004-12-28 2011-06-01 京セラキンセキ株式会社 圧電薄膜デバイス及びその製造方法
JP4846477B2 (ja) * 2006-07-26 2011-12-28 パナソニック株式会社 薄膜音響共振器の製造方法
JP2008187303A (ja) * 2007-01-26 2008-08-14 Matsushita Electric Works Ltd 共振装置の製造方法
US8586195B2 (en) * 2007-07-11 2013-11-19 Avago Technologies General Ip (Singapore) Pte. Ltd. Method for forming an acoustic mirror with reduced metal layer roughness and related structure
US7869187B2 (en) * 2007-09-04 2011-01-11 Paratek Microwave, Inc. Acoustic bandgap structures adapted to suppress parasitic resonances in tunable ferroelectric capacitors and method of operation and fabrication therefore

Also Published As

Publication number Publication date
WO2023190677A1 (ja) 2023-10-05
US20250219611A1 (en) 2025-07-03
TW202406299A (zh) 2024-02-01

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