JPWO2023053438A1 - - Google Patents

Info

Publication number
JPWO2023053438A1
JPWO2023053438A1 JP2022564615A JP2022564615A JPWO2023053438A1 JP WO2023053438 A1 JPWO2023053438 A1 JP WO2023053438A1 JP 2022564615 A JP2022564615 A JP 2022564615A JP 2022564615 A JP2022564615 A JP 2022564615A JP WO2023053438 A1 JPWO2023053438 A1 JP WO2023053438A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022564615A
Other languages
Japanese (ja)
Other versions
JPWO2023053438A5 (https=
JP7266348B1 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023053438A1 publication Critical patent/JPWO2023053438A1/ja
Application granted granted Critical
Publication of JP7266348B1 publication Critical patent/JP7266348B1/ja
Publication of JPWO2023053438A5 publication Critical patent/JPWO2023053438A5/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/001—Axicons, waxicons, reflaxicons
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B27/0172—Head mounted characterised by optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0988—Diaphragms, spatial filters, masks for removing or filtering a part of the beam
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/30—Collimators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/0101—Head-up displays characterised by optical features
    • G02B2027/0118—Head-up displays characterised by optical features comprising devices for improving the contrast of the display / brillance control visibility
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/0101—Head-up displays characterised by optical features
    • G02B2027/0127—Head-up displays characterised by optical features comprising devices increasing the depth of field
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B2027/0178—Eyeglass type

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
JP2022564615A 2021-10-01 2021-10-01 細径ビーム生成装置 Active JP7266348B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/036398 WO2023053438A1 (ja) 2021-10-01 2021-10-01 細径ビーム生成装置

Publications (3)

Publication Number Publication Date
JPWO2023053438A1 true JPWO2023053438A1 (https=) 2023-04-06
JP7266348B1 JP7266348B1 (ja) 2023-04-28
JPWO2023053438A5 JPWO2023053438A5 (https=) 2023-09-06

Family

ID=85782078

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022564615A Active JP7266348B1 (ja) 2021-10-01 2021-10-01 細径ビーム生成装置

Country Status (5)

Country Link
US (1) US20240402507A1 (https=)
EP (1) EP4411449A4 (https=)
JP (1) JP7266348B1 (https=)
CN (1) CN118020006A (https=)
WO (1) WO2023053438A1 (https=)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2264427B1 (en) * 1997-01-31 2017-05-03 Xy, Llc Optical apparatus with focussing reflector for converging radiation onto a flow of particles, and related method of analysis
JP3632392B2 (ja) 1997-08-14 2005-03-23 富士ゼロックス株式会社 網膜ディスプレイ装置
KR100800709B1 (ko) * 2005-10-10 2008-02-01 삼성전자주식회사 영상 스캔 장치
US8194170B2 (en) * 2009-06-02 2012-06-05 Algonquin College Axicon lens array
JP2013173178A (ja) * 2012-02-27 2013-09-05 Zeta Photon Kk レーザ剥離装置およびレーザ剥離方法
EP2754524B1 (de) * 2013-01-15 2015-11-25 Corning Laser Technologies GmbH Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
DE102014213775B4 (de) * 2014-07-15 2018-02-15 Innolas Solutions Gmbh Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen, kristallinen Substraten, insbesondere von Halbleitersubstraten
DE102014116958B9 (de) * 2014-11-19 2017-10-05 Trumpf Laser- Und Systemtechnik Gmbh Optisches System zur Strahlformung eines Laserstrahls, Laserbearbeitungsanlage, Verfahren zur Materialbearbeitung und Verwenden einer gemeinsamen langgezogenen Fokuszone zur Lasermaterialbearbeitung
DE102015201639B4 (de) * 2015-01-30 2018-01-04 Asphericon Gmbh Strahlfokussierer und Verwendungen
JP6635052B2 (ja) * 2015-02-05 2020-01-22 株式会社ニコン 構造化照明顕微鏡、及び観察方法
JP6603829B1 (ja) * 2018-04-04 2019-11-06 日本板硝子株式会社 レーザービームを用いた加工のための光学装置、レーザービームを用いた加工方法、及びガラス物品の製造方法

Also Published As

Publication number Publication date
JP7266348B1 (ja) 2023-04-28
US20240402507A1 (en) 2024-12-05
EP4411449A4 (en) 2025-08-20
CN118020006A (zh) 2024-05-10
WO2023053438A1 (ja) 2023-04-06
EP4411449A1 (en) 2024-08-07

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