JPWO2023032456A1 - - Google Patents
Info
- Publication number
- JPWO2023032456A1 JPWO2023032456A1 JP2023545123A JP2023545123A JPWO2023032456A1 JP WO2023032456 A1 JPWO2023032456 A1 JP WO2023032456A1 JP 2023545123 A JP2023545123 A JP 2023545123A JP 2023545123 A JP2023545123 A JP 2023545123A JP WO2023032456 A1 JPWO2023032456 A1 JP WO2023032456A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Structural Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Compositions Of Oxide Ceramics (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2024070413A JP7557648B2 (ja) | 2021-09-01 | 2024-04-24 | 酸化物焼結体及びその製造方法並びにスパッタリングターゲット材 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021142257 | 2021-09-01 | ||
JP2021142257 | 2021-09-01 | ||
PCT/JP2022/026468 WO2023032456A1 (ja) | 2021-09-01 | 2022-07-01 | 酸化物焼結体及びその製造方法並びにスパッタリングターゲット材 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2024070413A Division JP7557648B2 (ja) | 2021-09-01 | 2024-04-24 | 酸化物焼結体及びその製造方法並びにスパッタリングターゲット材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2023032456A1 true JPWO2023032456A1 (ja) | 2023-03-09 |
JP7480439B2 JP7480439B2 (ja) | 2024-05-09 |
Family
ID=85412118
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023545123A Active JP7480439B2 (ja) | 2021-09-01 | 2022-07-01 | 酸化物焼結体及びその製造方法並びにスパッタリングターゲット材 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7480439B2 (ja) |
KR (1) | KR20240046818A (ja) |
CN (1) | CN117529574A (ja) |
TW (1) | TW202323220A (ja) |
WO (1) | WO2023032456A1 (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04187555A (ja) * | 1990-11-22 | 1992-07-06 | Mitsubishi Heavy Ind Ltd | セラミックス原料の調整方法及び装置 |
JP2000273622A (ja) * | 1999-03-26 | 2000-10-03 | Mitsui Mining & Smelting Co Ltd | 薄膜形成用材料 |
JP2008150224A (ja) * | 2006-12-14 | 2008-07-03 | Kao Corp | セラミックスの製造方法 |
WO2008111324A1 (ja) * | 2007-03-14 | 2008-09-18 | Asahi Glass Co., Ltd. | 透明導電膜およびその製造方法、ならびにその製造に使用されるスパッタリングターゲット |
JP2011184285A (ja) * | 2010-02-09 | 2011-09-22 | Sumitomo Osaka Cement Co Ltd | 焼結体及びその製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4851777B2 (ja) | 2005-11-09 | 2012-01-11 | 三井金属鉱業株式会社 | SnO2系スパッタリングターゲットおよびその製造方法 |
JP4859726B2 (ja) | 2007-03-29 | 2012-01-25 | 三井金属鉱業株式会社 | SnO2系スパッタリングターゲットおよびスパッタ膜 |
-
2022
- 2022-07-01 CN CN202280043590.9A patent/CN117529574A/zh active Pending
- 2022-07-01 WO PCT/JP2022/026468 patent/WO2023032456A1/ja active Application Filing
- 2022-07-01 JP JP2023545123A patent/JP7480439B2/ja active Active
- 2022-07-01 KR KR1020237041060A patent/KR20240046818A/ko unknown
- 2022-07-12 TW TW111126031A patent/TW202323220A/zh unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04187555A (ja) * | 1990-11-22 | 1992-07-06 | Mitsubishi Heavy Ind Ltd | セラミックス原料の調整方法及び装置 |
JP2000273622A (ja) * | 1999-03-26 | 2000-10-03 | Mitsui Mining & Smelting Co Ltd | 薄膜形成用材料 |
JP2008150224A (ja) * | 2006-12-14 | 2008-07-03 | Kao Corp | セラミックスの製造方法 |
WO2008111324A1 (ja) * | 2007-03-14 | 2008-09-18 | Asahi Glass Co., Ltd. | 透明導電膜およびその製造方法、ならびにその製造に使用されるスパッタリングターゲット |
JP2011184285A (ja) * | 2010-02-09 | 2011-09-22 | Sumitomo Osaka Cement Co Ltd | 焼結体及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20240046818A (ko) | 2024-04-09 |
CN117529574A (zh) | 2024-02-06 |
JP2024083640A (ja) | 2024-06-21 |
JP7480439B2 (ja) | 2024-05-09 |
WO2023032456A1 (ja) | 2023-03-09 |
TW202323220A (zh) | 2023-06-16 |
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