JPWO2023027159A1 - - Google Patents

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Publication number
JPWO2023027159A1
JPWO2023027159A1 JP2023543990A JP2023543990A JPWO2023027159A1 JP WO2023027159 A1 JPWO2023027159 A1 JP WO2023027159A1 JP 2023543990 A JP2023543990 A JP 2023543990A JP 2023543990 A JP2023543990 A JP 2023543990A JP WO2023027159 A1 JPWO2023027159 A1 JP WO2023027159A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023543990A
Other versions
JP7448730B2 (ja
JPWO2023027159A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023027159A1 publication Critical patent/JPWO2023027159A1/ja
Publication of JPWO2023027159A5 publication Critical patent/JPWO2023027159A5/ja
Priority to JP2024030670A priority Critical patent/JP2024059923A/ja
Application granted granted Critical
Publication of JP7448730B2 publication Critical patent/JP7448730B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/158—Carbon nanotubes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/158—Carbon nanotubes
    • C01B32/168—After-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Manufacturing & Machinery (AREA)
  • Composite Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Carbon And Carbon Compounds (AREA)
JP2023543990A 2021-08-26 2022-08-25 ペリクル膜、ペリクル、露光原版、露光装置、及びペリクル膜の製造方法 Active JP7448730B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024030670A JP2024059923A (ja) 2021-08-26 2024-02-29 ペリクル膜、ペリクル、露光原版、露光装置、及びペリクル膜の製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021138015 2021-08-26
JP2021138015 2021-08-26
PCT/JP2022/032111 WO2023027159A1 (ja) 2021-08-26 2022-08-25 ペリクル膜、ペリクル、露光原版、露光装置、及びペリクル膜の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024030670A Division JP2024059923A (ja) 2021-08-26 2024-02-29 ペリクル膜、ペリクル、露光原版、露光装置、及びペリクル膜の製造方法

Publications (3)

Publication Number Publication Date
JPWO2023027159A1 true JPWO2023027159A1 (ja) 2023-03-02
JPWO2023027159A5 JPWO2023027159A5 (ja) 2023-12-27
JP7448730B2 JP7448730B2 (ja) 2024-03-12

Family

ID=85322938

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2023543990A Active JP7448730B2 (ja) 2021-08-26 2022-08-25 ペリクル膜、ペリクル、露光原版、露光装置、及びペリクル膜の製造方法
JP2024030670A Pending JP2024059923A (ja) 2021-08-26 2024-02-29 ペリクル膜、ペリクル、露光原版、露光装置、及びペリクル膜の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024030670A Pending JP2024059923A (ja) 2021-08-26 2024-02-29 ペリクル膜、ペリクル、露光原版、露光装置、及びペリクル膜の製造方法

Country Status (7)

Country Link
US (1) US20240103357A1 (ja)
EP (1) EP4361092A1 (ja)
JP (2) JP7448730B2 (ja)
KR (1) KR20230152163A (ja)
CN (1) CN117377909A (ja)
TW (1) TW202314376A (ja)
WO (1) WO2023027159A1 (ja)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101913591B (zh) 2004-07-27 2012-11-14 独立行政法人产业技术综合研究所 单层碳纳米管以及取向单层碳纳米管块结构体以及它们的制造方法、装置以及用途
US8778116B2 (en) * 2007-12-07 2014-07-15 Meijyo Nano Carbon Co., Ltd. Method for producing carbon nanotube-containing conductor
KR101172688B1 (ko) * 2010-06-23 2012-08-10 전자부품연구원 고분자전해질을 이용한 기판 전처리를 통한 탄소나노튜브 박막 제조방법 및 그 방법으로 제조된 탄소나노튜브 박막
US10035918B2 (en) * 2014-09-05 2018-07-31 Nitto Denko Corporation Carbon nanotube coating composition
KR20230092024A (ko) 2014-11-17 2023-06-23 에이에스엠엘 네델란즈 비.브이. 장치
JP2016126847A (ja) * 2014-12-26 2016-07-11 富士フイルム株式会社 透明導電膜の製造方法および透明導電性積層体
WO2016124068A1 (zh) * 2015-02-02 2016-08-11 上海坚柏国际贸易有限公司 一种可变为无人机的手机壳
WO2016140168A1 (ja) * 2015-03-04 2016-09-09 Ｊｘエネルギー株式会社 複合膜及びその製造方法
EP3483655A4 (en) 2016-07-05 2020-02-26 Mitsui Chemicals, Inc. FILM FILM, FILM FRAME, FILM, PRODUCTION METHOD THEREOF, ORIGINAL PLATE FOR LIGHT EXPOSURE, LIGHT EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
JP6853550B2 (ja) * 2017-03-02 2021-03-31 国立研究開発法人産業技術総合研究所 カーボンナノチューブ膜、及び電子デバイス
JP7018661B2 (ja) * 2017-06-09 2022-02-14 国立研究開発法人産業技術総合研究所 カーボンナノチューブ分散液、カーボンナノチューブ分散液の製造方法及びカーボンナノチューブ複合膜の製造方法
JP7019472B2 (ja) * 2018-03-22 2022-02-15 三井化学株式会社 カーボンナノチューブ自立膜の製造方法、およびペリクルの製造方法
CN108649104A (zh) * 2018-05-17 2018-10-12 天津宝兴威科技股份有限公司 一种柔性透明电极的制备方法
JP7060030B2 (ja) 2020-03-04 2022-04-26 横浜ゴム株式会社 タイヤ加硫用モールドの製造方法およびメンテナンス方法
JP2021172528A (ja) * 2020-04-17 2021-11-01 国立研究開発法人産業技術総合研究所 カーボンナノチューブ膜、分散液及びカーボンナノチューブ膜の製造方法

Also Published As

Publication number Publication date
US20240103357A1 (en) 2024-03-28
WO2023027159A1 (ja) 2023-03-02
CN117377909A (zh) 2024-01-09
JP7448730B2 (ja) 2024-03-12
EP4361092A1 (en) 2024-05-01
JP2024059923A (ja) 2024-05-01
TW202314376A (zh) 2023-04-01
KR20230152163A (ko) 2023-11-02

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