JPWO2023008432A1 - - Google Patents

Info

Publication number
JPWO2023008432A1
JPWO2023008432A1 JP2023538555A JP2023538555A JPWO2023008432A1 JP WO2023008432 A1 JPWO2023008432 A1 JP WO2023008432A1 JP 2023538555 A JP2023538555 A JP 2023538555A JP 2023538555 A JP2023538555 A JP 2023538555A JP WO2023008432 A1 JPWO2023008432 A1 JP WO2023008432A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023538555A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023008432A1 publication Critical patent/JPWO2023008432A1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20Multistable switching devices, e.g. memristors
    • H10N70/231Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • H01L27/105Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/10Phase change RAM [PCRAM, PRAM] devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/20Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011Manufacture or treatment of multistable switching devices
    • H10N70/021Formation of switching materials, e.g. deposition of layers
    • H10N70/026Formation of switching materials, e.g. deposition of layers by physical vapor deposition, e.g. sputtering
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/821Device geometry
    • H10N70/826Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/881Switching materials
    • H10N70/882Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
    • H10N70/8828Tellurides, e.g. GeSbTe

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Memories (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Glass Compositions (AREA)
  • Conductive Materials (AREA)
  • Contacts (AREA)
JP2023538555A 2021-07-29 2022-07-26 Pending JPWO2023008432A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021124132 2021-07-29
PCT/JP2022/028790 WO2023008432A1 (ja) 2021-07-29 2022-07-26 相変化材料

Publications (1)

Publication Number Publication Date
JPWO2023008432A1 true JPWO2023008432A1 (ja) 2023-02-02

Family

ID=85087618

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023538555A Pending JPWO2023008432A1 (ja) 2021-07-29 2022-07-26

Country Status (6)

Country Link
US (1) US20240292762A1 (ja)
JP (1) JPWO2023008432A1 (ja)
KR (1) KR20240032696A (ja)
CN (1) CN117204144A (ja)
TW (1) TW202314002A (ja)
WO (1) WO2023008432A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024219141A1 (ja) * 2023-04-20 2024-10-24 国立大学法人東北大学 抵抗変化材料、スイッチ素子用材料、スイッチ層、スイッチ素子及び記憶装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03238882A (ja) * 1990-02-16 1991-10-24 Hitachi Ltd 情報の記憶用素子
JP2004005879A (ja) * 2002-03-27 2004-01-08 Hitachi Ltd 情報記録媒体、情報記録方法及び媒体製造方法
KR20070084514A (ko) * 2004-11-26 2007-08-24 마쯔시다덴기산교 가부시키가이샤 광학 정보 기록 매체 및 광학 정보 기록 매체의 기록 방법
WO2006112344A1 (ja) * 2005-04-15 2006-10-26 Matsushita Electric Industrial Co., Ltd. 光学情報記録媒体および光学情報記録媒体への記録方法
KR100735525B1 (ko) * 2006-01-04 2007-07-04 삼성전자주식회사 상변화 메모리 장치
US8574954B2 (en) 2010-08-31 2013-11-05 Micron Technology, Inc. Phase change memory structures and methods

Also Published As

Publication number Publication date
TW202314002A (zh) 2023-04-01
US20240292762A1 (en) 2024-08-29
WO2023008432A1 (ja) 2023-02-02
KR20240032696A (ko) 2024-03-12
CN117204144A (zh) 2023-12-08

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