JPWO2023008249A1 - - Google Patents

Info

Publication number
JPWO2023008249A1
JPWO2023008249A1 JP2023538451A JP2023538451A JPWO2023008249A1 JP WO2023008249 A1 JPWO2023008249 A1 JP WO2023008249A1 JP 2023538451 A JP2023538451 A JP 2023538451A JP 2023538451 A JP2023538451 A JP 2023538451A JP WO2023008249 A1 JPWO2023008249 A1 JP WO2023008249A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023538451A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023008249A1 publication Critical patent/JPWO2023008249A1/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C15/00—Enclosures for apparatus; Booths
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2023538451A 2021-07-30 2022-07-19 Pending JPWO2023008249A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021125404 2021-07-30
PCT/JP2022/028010 WO2023008249A1 (ja) 2021-07-30 2022-07-19 現像処理装置及び現像処理方法

Publications (1)

Publication Number Publication Date
JPWO2023008249A1 true JPWO2023008249A1 (ja) 2023-02-02

Family

ID=85087574

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023538451A Pending JPWO2023008249A1 (ja) 2021-07-30 2022-07-19

Country Status (3)

Country Link
JP (1) JPWO2023008249A1 (ja)
TW (1) TW202309684A (ja)
WO (1) WO2023008249A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117311106B (zh) * 2023-11-17 2024-02-09 深圳市龙图光罩股份有限公司 显影方法及显影装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003324064A (ja) * 2002-03-01 2003-11-14 Tokyo Electron Ltd 現像処理方法及び現像処理装置
JP6203893B2 (ja) * 2012-07-26 2017-09-27 東京エレクトロン株式会社 液処理装置および洗浄方法
JP6769166B2 (ja) * 2016-08-10 2020-10-14 東京エレクトロン株式会社 液処理装置及び液処理方法
JP7335797B2 (ja) * 2019-11-29 2023-08-30 株式会社Ｓｃｒｅｅｎホールディングス 現像装置

Also Published As

Publication number Publication date
TW202309684A (zh) 2023-03-01
WO2023008249A1 (ja) 2023-02-02

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Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240117