JPWO2022270347A1 - - Google Patents
Info
- Publication number
- JPWO2022270347A1 JPWO2022270347A1 JP2023530331A JP2023530331A JPWO2022270347A1 JP WO2022270347 A1 JPWO2022270347 A1 JP WO2022270347A1 JP 2023530331 A JP2023530331 A JP 2023530331A JP 2023530331 A JP2023530331 A JP 2023530331A JP WO2022270347 A1 JPWO2022270347 A1 JP WO2022270347A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32155—Frequency modulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32155—Frequency modulation
- H01J37/32165—Plural frequencies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2024017046A JP7474913B2 (ja) | 2021-06-21 | 2024-02-07 | 電源システム |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021102227 | 2021-06-21 | ||
JP2021102227 | 2021-06-21 | ||
PCT/JP2022/023741 WO2022270347A1 (ja) | 2021-06-21 | 2022-06-14 | プラズマ処理装置及びプラズマ処理方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2024017046A Division JP7474913B2 (ja) | 2021-06-21 | 2024-02-07 | 電源システム |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2022270347A1 true JPWO2022270347A1 (ja) | 2022-12-29 |
JP7434669B2 JP7434669B2 (ja) | 2024-02-20 |
Family
ID=84544315
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023530331A Active JP7434669B2 (ja) | 2021-06-21 | 2022-06-14 | プラズマ処理装置及びプラズマ処理方法 |
JP2024017046A Active JP7474913B2 (ja) | 2021-06-21 | 2024-02-07 | 電源システム |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2024017046A Active JP7474913B2 (ja) | 2021-06-21 | 2024-02-07 | 電源システム |
Country Status (6)
Country | Link |
---|---|
US (2) | US20240120176A1 (ja) |
JP (2) | JP7434669B2 (ja) |
KR (1) | KR20240009537A (ja) |
CN (1) | CN117480870A (ja) |
TW (1) | TW202314780A (ja) |
WO (1) | WO2022270347A1 (ja) |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4041579B2 (ja) * | 1998-04-01 | 2008-01-30 | 株式会社ルネサステクノロジ | プラズマ処理の終点検出方法及びそれを用いた半導体デバイスの製造方法 |
KR101174202B1 (ko) * | 2007-08-31 | 2012-08-14 | 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 | 유전체 배리어 방전 가스의 생성 장치 |
JP5319150B2 (ja) | 2008-03-31 | 2013-10-16 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法及びコンピュータ読み取り可能な記憶媒体 |
KR101528528B1 (ko) | 2008-05-14 | 2015-06-12 | 어플라이드 머티어리얼스, 인코포레이티드 | Rf 전력 전달을 위한 시간 분해된 조정 방식을 이용하는 펄스화된 플라즈마 처리를 위한 방법 및 장치 |
US9947514B2 (en) * | 2015-09-01 | 2018-04-17 | Mks Instruments, Inc. | Plasma RF bias cancellation system |
US9754767B2 (en) * | 2015-10-13 | 2017-09-05 | Applied Materials, Inc. | RF pulse reflection reduction for processing substrates |
KR20210054017A (ko) * | 2018-10-01 | 2021-05-12 | 도쿄엘렉트론가부시키가이샤 | 기판 표면으로부터 이물질을 정전기적으로 제거하기 위한 장치 및 방법 |
JP7101096B2 (ja) * | 2018-10-12 | 2022-07-14 | 東京エレクトロン株式会社 | プラズマ処理方法及びプラズマ処理装置 |
JP7250663B2 (ja) * | 2018-12-19 | 2023-04-03 | 東京エレクトロン株式会社 | プラズマ処理装置及びインピーダンスの整合方法 |
-
2022
- 2022-06-14 CN CN202280042070.6A patent/CN117480870A/zh active Pending
- 2022-06-14 WO PCT/JP2022/023741 patent/WO2022270347A1/ja active Application Filing
- 2022-06-14 TW TW111122096A patent/TW202314780A/zh unknown
- 2022-06-14 JP JP2023530331A patent/JP7434669B2/ja active Active
- 2022-06-14 KR KR1020247001020A patent/KR20240009537A/ko active Search and Examination
-
2023
- 2023-12-21 US US18/392,294 patent/US20240120176A1/en active Pending
- 2023-12-21 US US18/392,239 patent/US20240170257A1/en active Pending
-
2024
- 2024-02-07 JP JP2024017046A patent/JP7474913B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
US20240170257A1 (en) | 2024-05-23 |
JP7434669B2 (ja) | 2024-02-20 |
WO2022270347A1 (ja) | 2022-12-29 |
KR20240009537A (ko) | 2024-01-22 |
JP2024046672A (ja) | 2024-04-03 |
JP7474913B2 (ja) | 2024-04-25 |
CN117480870A (zh) | 2024-01-30 |
US20240120176A1 (en) | 2024-04-11 |
TW202314780A (zh) | 2023-04-01 |
Similar Documents
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