JPWO2022270347A1 - - Google Patents

Info

Publication number
JPWO2022270347A1
JPWO2022270347A1 JP2023530331A JP2023530331A JPWO2022270347A1 JP WO2022270347 A1 JPWO2022270347 A1 JP WO2022270347A1 JP 2023530331 A JP2023530331 A JP 2023530331A JP 2023530331 A JP2023530331 A JP 2023530331A JP WO2022270347 A1 JPWO2022270347 A1 JP WO2022270347A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023530331A
Other versions
JP7434669B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022270347A1 publication Critical patent/JPWO2022270347A1/ja
Priority to JP2024017046A priority Critical patent/JP7474913B2/ja
Application granted granted Critical
Publication of JP7434669B2 publication Critical patent/JP7434669B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32137Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155Frequency modulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32174Circuits specially adapted for controlling the RF discharge
    • H01J37/32183Matching circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32137Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155Frequency modulation
    • H01J37/32165Plural frequencies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32715Workpiece holder
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32091Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32174Circuits specially adapted for controlling the RF discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
JP2023530331A 2021-06-21 2022-06-14 プラズマ処理装置及びプラズマ処理方法 Active JP7434669B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024017046A JP7474913B2 (ja) 2021-06-21 2024-02-07 電源システム

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021102227 2021-06-21
JP2021102227 2021-06-21
PCT/JP2022/023741 WO2022270347A1 (ja) 2021-06-21 2022-06-14 プラズマ処理装置及びプラズマ処理方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024017046A Division JP7474913B2 (ja) 2021-06-21 2024-02-07 電源システム

Publications (2)

Publication Number Publication Date
JPWO2022270347A1 true JPWO2022270347A1 (ja) 2022-12-29
JP7434669B2 JP7434669B2 (ja) 2024-02-20

Family

ID=84544315

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2023530331A Active JP7434669B2 (ja) 2021-06-21 2022-06-14 プラズマ処理装置及びプラズマ処理方法
JP2024017046A Active JP7474913B2 (ja) 2021-06-21 2024-02-07 電源システム

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024017046A Active JP7474913B2 (ja) 2021-06-21 2024-02-07 電源システム

Country Status (6)

Country Link
US (2) US20240120176A1 (ja)
JP (2) JP7434669B2 (ja)
KR (1) KR20240009537A (ja)
CN (1) CN117480870A (ja)
TW (1) TW202314780A (ja)
WO (1) WO2022270347A1 (ja)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4041579B2 (ja) * 1998-04-01 2008-01-30 株式会社ルネサステクノロジ プラズマ処理の終点検出方法及びそれを用いた半導体デバイスの製造方法
KR101174202B1 (ko) * 2007-08-31 2012-08-14 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 유전체 배리어 방전 가스의 생성 장치
JP5319150B2 (ja) 2008-03-31 2013-10-16 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法及びコンピュータ読み取り可能な記憶媒体
KR101528528B1 (ko) 2008-05-14 2015-06-12 어플라이드 머티어리얼스, 인코포레이티드 Rf 전력 전달을 위한 시간 분해된 조정 방식을 이용하는 펄스화된 플라즈마 처리를 위한 방법 및 장치
US9947514B2 (en) * 2015-09-01 2018-04-17 Mks Instruments, Inc. Plasma RF bias cancellation system
US9754767B2 (en) * 2015-10-13 2017-09-05 Applied Materials, Inc. RF pulse reflection reduction for processing substrates
KR20210054017A (ko) * 2018-10-01 2021-05-12 도쿄엘렉트론가부시키가이샤 기판 표면으로부터 이물질을 정전기적으로 제거하기 위한 장치 및 방법
JP7101096B2 (ja) * 2018-10-12 2022-07-14 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置
JP7250663B2 (ja) * 2018-12-19 2023-04-03 東京エレクトロン株式会社 プラズマ処理装置及びインピーダンスの整合方法

Also Published As

Publication number Publication date
US20240170257A1 (en) 2024-05-23
JP7434669B2 (ja) 2024-02-20
WO2022270347A1 (ja) 2022-12-29
KR20240009537A (ko) 2024-01-22
JP2024046672A (ja) 2024-04-03
JP7474913B2 (ja) 2024-04-25
CN117480870A (zh) 2024-01-30
US20240120176A1 (en) 2024-04-11
TW202314780A (zh) 2023-04-01

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