JPWO2022230694A1 - - Google Patents
Info
- Publication number
- JPWO2022230694A1 JPWO2022230694A1 JP2023517448A JP2023517448A JPWO2022230694A1 JP WO2022230694 A1 JPWO2022230694 A1 JP WO2022230694A1 JP 2023517448 A JP2023517448 A JP 2023517448A JP 2023517448 A JP2023517448 A JP 2023517448A JP WO2022230694 A1 JPWO2022230694 A1 JP WO2022230694A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021077848 | 2021-04-30 | ||
PCT/JP2022/017946 WO2022230694A1 (en) | 2021-04-30 | 2022-04-15 | Phase shift mask blank, phase shift mask, light exposure method, and device manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2022230694A1 true JPWO2022230694A1 (en) | 2022-11-03 |
JPWO2022230694A5 JPWO2022230694A5 (en) | 2024-02-06 |
Family
ID=83848108
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023517448A Pending JPWO2022230694A1 (en) | 2021-04-30 | 2022-04-15 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2022230694A1 (en) |
KR (1) | KR20240003435A (en) |
CN (1) | CN116670583A (en) |
TW (1) | TW202303260A (en) |
WO (1) | WO2022230694A1 (en) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08297357A (en) * | 1995-04-25 | 1996-11-12 | Toppan Printing Co Ltd | Production of edge enhancement type phase shift mask |
JP3037941B2 (en) * | 1997-12-19 | 2000-05-08 | ホーヤ株式会社 | Halftone type phase shift mask and halftone type phase shift mask blank |
JP4324778B2 (en) * | 2003-11-21 | 2009-09-02 | 信越化学工業株式会社 | Phase shift mask blank, phase shift mask, phase shift mask blank manufacturing method, and pattern transfer method |
JP2005284216A (en) * | 2004-03-31 | 2005-10-13 | Shin Etsu Chem Co Ltd | Target for forming film and method for manufacturing phase shift mask blank |
JP5588633B2 (en) | 2009-06-30 | 2014-09-10 | アルバック成膜株式会社 | Phase shift mask manufacturing method, flat panel display manufacturing method, and phase shift mask |
JP6891099B2 (en) * | 2017-01-16 | 2021-06-18 | Hoya株式会社 | A phase shift mask blank, a method for manufacturing a phase shift mask using the blank, and a method for manufacturing a display device. |
JP7073246B2 (en) * | 2018-02-27 | 2022-05-23 | Hoya株式会社 | Phase shift mask blank, manufacturing method of phase shift mask, and manufacturing method of display device |
-
2022
- 2022-04-15 WO PCT/JP2022/017946 patent/WO2022230694A1/en active Application Filing
- 2022-04-15 KR KR1020237027182A patent/KR20240003435A/en unknown
- 2022-04-15 JP JP2023517448A patent/JPWO2022230694A1/ja active Pending
- 2022-04-15 CN CN202280008221.6A patent/CN116670583A/en active Pending
- 2022-04-20 TW TW111115050A patent/TW202303260A/en unknown
Also Published As
Publication number | Publication date |
---|---|
TW202303260A (en) | 2023-01-16 |
CN116670583A (en) | 2023-08-29 |
WO2022230694A1 (en) | 2022-11-03 |
KR20240003435A (en) | 2024-01-09 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230829 |