JPWO2022224835A1 - - Google Patents
Info
- Publication number
- JPWO2022224835A1 JPWO2022224835A1 JP2023516436A JP2023516436A JPWO2022224835A1 JP WO2022224835 A1 JPWO2022224835 A1 JP WO2022224835A1 JP 2023516436 A JP2023516436 A JP 2023516436A JP 2023516436 A JP2023516436 A JP 2023516436A JP WO2022224835 A1 JPWO2022224835 A1 JP WO2022224835A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
- C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Liquid Crystal (AREA)
- Materials For Photolithography (AREA)
- Indole Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021072876 | 2021-04-22 | ||
| PCT/JP2022/017251 WO2022224835A1 (ja) | 2021-04-22 | 2022-04-07 | 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022224835A1 true JPWO2022224835A1 (zh) | 2022-10-27 |
Family
ID=83722924
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023516436A Pending JPWO2022224835A1 (zh) | 2021-04-22 | 2022-04-07 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2022224835A1 (zh) |
| TW (1) | TW202302528A (zh) |
| WO (1) | WO2022224835A1 (zh) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103389621B (zh) * | 2013-07-26 | 2016-03-16 | 常州强力先端电子材料有限公司 | 一种磺酸肟酯类光产酸剂 |
| KR20220061910A (ko) * | 2019-09-10 | 2022-05-13 | 가부시키가이샤 아데카 | 화합물, 산 발생제, 조성물, 경화물 및 패턴, 그리고 경화물 및 패턴의 제조 방법 |
| KR20220061909A (ko) * | 2019-09-10 | 2022-05-13 | 가부시키가이샤 아데카 | 화합물, 산 발생제, 조성물, 경화물 및 패턴, 그리고 경화물 및 패턴의 제조 방법 |
| JPWO2021125132A1 (zh) * | 2019-12-20 | 2021-06-24 |
-
2022
- 2022-04-07 WO PCT/JP2022/017251 patent/WO2022224835A1/ja active Application Filing
- 2022-04-07 JP JP2023516436A patent/JPWO2022224835A1/ja active Pending
- 2022-04-12 TW TW111113806A patent/TW202302528A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202302528A (zh) | 2023-01-16 |
| WO2022224835A1 (ja) | 2022-10-27 |