JPWO2022215423A1 - - Google Patents
Info
- Publication number
- JPWO2022215423A1 JPWO2022215423A1 JP2023512875A JP2023512875A JPWO2022215423A1 JP WO2022215423 A1 JPWO2022215423 A1 JP WO2022215423A1 JP 2023512875 A JP2023512875 A JP 2023512875A JP 2023512875 A JP2023512875 A JP 2023512875A JP WO2022215423 A1 JPWO2022215423 A1 JP WO2022215423A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/12—Esters of monohydric alcohols or phenols
- C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021066532 | 2021-04-09 | ||
| PCT/JP2022/010353 WO2022215423A1 (ja) | 2021-04-09 | 2022-03-09 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法、重合性化合物、樹脂 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022215423A1 true JPWO2022215423A1 (zh) | 2022-10-13 |
Family
ID=83546352
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023512875A Pending JPWO2022215423A1 (zh) | 2021-04-09 | 2022-03-09 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2022215423A1 (zh) |
| TW (1) | TW202307565A (zh) |
| WO (1) | WO2022215423A1 (zh) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4315761B2 (ja) * | 2003-07-31 | 2009-08-19 | 三菱レイヨン株式会社 | （共）重合体、製造方法、レジスト組成物およびパターン形成方法 |
| JP5740287B2 (ja) * | 2011-11-09 | 2015-06-24 | 富士フイルム株式会社 | パターン形成方法、及び、電子デバイスの製造方法 |
| JP6370265B2 (ja) * | 2015-07-09 | 2018-08-08 | 信越化学工業株式会社 | 重合性モノマー、高分子化合物、ポジ型レジスト材料、及びパターン形成方法 |
| WO2019151463A1 (ja) * | 2018-02-02 | 2019-08-08 | 株式会社シード | 重合性トリプチセン誘導体化合物及びその化合物を構成成分として含む高分子化合物 |
| EP3783434A4 (en) * | 2018-04-20 | 2021-06-23 | FUJIFILM Corporation | LIGHT SENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN GENERATION METHOD, AND METHOD FOR MANUFACTURING AN ELECTRONIC DEVICE |
-
2022
- 2022-03-09 WO PCT/JP2022/010353 patent/WO2022215423A1/ja active Application Filing
- 2022-03-09 JP JP2023512875A patent/JPWO2022215423A1/ja active Pending
- 2022-03-17 TW TW111109867A patent/TW202307565A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202307565A (zh) | 2023-02-16 |
| WO2022215423A1 (ja) | 2022-10-13 |