JPWO2022180914A1 - - Google Patents
Info
- Publication number
- JPWO2022180914A1 JPWO2022180914A1 JP2023502054A JP2023502054A JPWO2022180914A1 JP WO2022180914 A1 JPWO2022180914 A1 JP WO2022180914A1 JP 2023502054 A JP2023502054 A JP 2023502054A JP 2023502054 A JP2023502054 A JP 2023502054A JP WO2022180914 A1 JPWO2022180914 A1 JP WO2022180914A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/02—Feed or outlet devices therefor
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021029664 | 2021-02-26 | ||
| PCT/JP2021/036960 WO2022180914A1 (en) | 2021-02-26 | 2021-10-06 | Vacuum device and method for producing vacuum processed body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022180914A1 true JPWO2022180914A1 (en) | 2022-09-01 |
Family
ID=83047908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023502054A Pending JPWO2022180914A1 (en) | 2021-02-26 | 2021-10-06 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPWO2022180914A1 (en) |
| WO (1) | WO2022180914A1 (en) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06192829A (en) * | 1992-04-15 | 1994-07-12 | Asahi Glass Co Ltd | Thin film forming device |
| JPH072277A (en) * | 1993-03-26 | 1995-01-06 | Musashino Eng:Kk | Vacuum part and vacuum container |
| JP4829485B2 (en) * | 2003-06-10 | 2011-12-07 | 有限会社真空実験室 | Vacuum component material, vacuum component, vacuum device, vacuum component material manufacturing method, vacuum component processing method, and vacuum device processing method |
| JP6432936B2 (en) * | 2014-12-02 | 2018-12-05 | 国立研究開発法人産業技術総合研究所 | Small equipment maintenance mechanism |
| JP6934239B2 (en) * | 2017-02-27 | 2021-09-15 | 国立大学法人東京工業大学 | High-sensitivity temperature rise desorption gas analyzer |
-
2021
- 2021-10-06 JP JP2023502054A patent/JPWO2022180914A1/ja active Pending
- 2021-10-06 WO PCT/JP2021/036960 patent/WO2022180914A1/en active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022180914A1 (en) | 2022-09-01 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AA64 | Notification of invalidation of claim of internal priority (with term) |
Free format text: JAPANESE INTERMEDIATE CODE: A241764 Effective date: 20231114 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231127 |