JPWO2022168735A1 - - Google Patents
Info
- Publication number
- JPWO2022168735A1 JPWO2022168735A1 JP2022579500A JP2022579500A JPWO2022168735A1 JP WO2022168735 A1 JPWO2022168735 A1 JP WO2022168735A1 JP 2022579500 A JP2022579500 A JP 2022579500A JP 2022579500 A JP2022579500 A JP 2022579500A JP WO2022168735 A1 JPWO2022168735 A1 JP WO2022168735A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/20—Purification, separation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021017792 | 2021-02-05 | ||
| PCT/JP2022/003177 WO2022168735A1 (en) | 2021-02-05 | 2022-01-27 | Silicon compound containing hexafluoroisopropanol group, method for producing silicon compound, polysiloxane, and method for producing polysiloxane |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022168735A1 true JPWO2022168735A1 (en) | 2022-08-11 |
Family
ID=82741564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022579500A Pending JPWO2022168735A1 (en) | 2021-02-05 | 2022-01-27 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2022168735A1 (en) |
| KR (1) | KR20230142534A (en) |
| CN (1) | CN116802186A (en) |
| TW (1) | TW202246291A (en) |
| WO (1) | WO2022168735A1 (en) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4019247B2 (en) | 2000-06-02 | 2007-12-12 | 信越化学工業株式会社 | Polymer compound, resist material, and pattern forming method |
| JP4172291B2 (en) | 2003-02-27 | 2008-10-29 | 東亞合成株式会社 | Method for producing organosilicon compound |
| JP6281288B2 (en) * | 2013-01-21 | 2018-02-21 | セントラル硝子株式会社 | Silicon compound containing hexafluoroisopropanol group, method for producing the same, and polymer compound obtained by polymerization thereof |
| JP6323225B2 (en) * | 2013-11-01 | 2018-05-16 | セントラル硝子株式会社 | Positive photosensitive resin composition, film production method using the same, and electronic component |
| JP7189453B2 (en) * | 2018-02-28 | 2022-12-14 | セントラル硝子株式会社 | Silicon compound containing hexafluoroisopropanol group, and method for producing the same |
| JPWO2020090746A1 (en) * | 2018-10-30 | 2021-10-14 | セントラル硝子株式会社 | Resin composition, photosensitive resin composition, cured film, method for producing cured film, method for producing pattern cured film and pattern cured film |
-
2022
- 2022-01-27 KR KR1020237029113A patent/KR20230142534A/en unknown
- 2022-01-27 WO PCT/JP2022/003177 patent/WO2022168735A1/en active Application Filing
- 2022-01-27 CN CN202280011656.6A patent/CN116802186A/en active Pending
- 2022-01-27 JP JP2022579500A patent/JPWO2022168735A1/ja active Pending
- 2022-01-28 TW TW111103957A patent/TW202246291A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20230142534A (en) | 2023-10-11 |
| TW202246291A (en) | 2022-12-01 |
| CN116802186A (en) | 2023-09-22 |
| WO2022168735A1 (en) | 2022-08-11 |