JPWO2022102636A1 - - Google Patents
Info
- Publication number
- JPWO2022102636A1 JPWO2022102636A1 JP2022561951A JP2022561951A JPWO2022102636A1 JP WO2022102636 A1 JPWO2022102636 A1 JP WO2022102636A1 JP 2022561951 A JP2022561951 A JP 2022561951A JP 2022561951 A JP2022561951 A JP 2022561951A JP WO2022102636 A1 JPWO2022102636 A1 JP WO2022102636A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/22—Tin compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020188967 | 2020-11-12 | ||
| PCT/JP2021/041260 WO2022102636A1 (fr) | 2020-11-12 | 2021-11-10 | Composé organique d'étain, procédé pour sa production, composition liquide pour former un film de résine photosensible aux euv l'utilisant et procédé de formation d'un film de résine photosensible aux euv |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022102636A1 true JPWO2022102636A1 (fr) | 2022-05-19 |
Family
ID=81602331
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022561951A Pending JPWO2022102636A1 (fr) | 2020-11-12 | 2021-11-10 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2022102636A1 (fr) |
| TW (1) | TW202233640A (fr) |
| WO (1) | WO2022102636A1 (fr) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008091215A (ja) * | 2006-10-02 | 2008-04-17 | Nitto Kasei Co Ltd | 酸化錫膜形成剤、該酸化錫膜形成剤を用いる酸化錫膜形成方法、及び該形成方法により形成される酸化錫膜 |
| JP2018124354A (ja) * | 2017-01-30 | 2018-08-09 | Jsr株式会社 | レジスト膜形成方法及び保護膜形成用組成物 |
| WO2018173446A1 (fr) * | 2017-03-22 | 2018-09-27 | Jsr株式会社 | Procédé de formation de motif |
| WO2018179704A1 (fr) * | 2017-03-27 | 2018-10-04 | Jsr株式会社 | Procédé de formation de motif |
| WO2019035446A1 (fr) * | 2017-08-17 | 2019-02-21 | 三菱マテリアル株式会社 | ALLIAGE DE MÉTAL ET D'ÉTAIN PRÉSENTANT UNE FAIBLE ÉMISSION DE RAYONS α, ET SON PROCÉDÉ DE PRODUCTION |
| WO2020026745A1 (fr) * | 2018-07-30 | 2020-02-06 | 三菱マテリアル株式会社 | Oxyde stanneux à faible émission de rayons alpha et son procédé de fabrication |
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2021
- 2021-11-10 JP JP2022561951A patent/JPWO2022102636A1/ja active Pending
- 2021-11-10 WO PCT/JP2021/041260 patent/WO2022102636A1/fr active Application Filing
- 2021-11-12 TW TW110142166A patent/TW202233640A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202233640A (zh) | 2022-09-01 |
| WO2022102636A1 (fr) | 2022-05-19 |