JPWO2022091475A1 - - Google Patents

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Publication number
JPWO2022091475A1
JPWO2022091475A1 JP2022558847A JP2022558847A JPWO2022091475A1 JP WO2022091475 A1 JPWO2022091475 A1 JP WO2022091475A1 JP 2022558847 A JP2022558847 A JP 2022558847A JP 2022558847 A JP2022558847 A JP 2022558847A JP WO2022091475 A1 JPWO2022091475 A1 JP WO2022091475A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022558847A
Other versions
JP7318824B2 (ja
JPWO2022091475A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022091475A1 publication Critical patent/JPWO2022091475A1/ja
Publication of JPWO2022091475A5 publication Critical patent/JPWO2022091475A5/ja
Application granted granted Critical
Publication of JP7318824B2 publication Critical patent/JP7318824B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/143—Permanent magnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/145—Combinations of electrostatic and magnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/313—Accessories, mechanical or electrical features filters, rotating filter disc
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/50—Detectors
    • G01N2223/507—Detectors secondary-emission detector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/057—Energy or mass filtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Immunology (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Tubes For Measurement (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2022558847A 2020-10-28 2021-06-21 ウィーンフィルタ及びマルチ電子ビーム検査装置 Active JP7318824B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020180675 2020-10-28
JP2020180675 2020-10-28
PCT/JP2021/023343 WO2022091475A1 (ja) 2020-10-28 2021-06-21 ウィーンフィルタ及びマルチ電子ビーム検査装置

Publications (3)

Publication Number Publication Date
JPWO2022091475A1 true JPWO2022091475A1 (ja) 2022-05-05
JPWO2022091475A5 JPWO2022091475A5 (ja) 2023-01-11
JP7318824B2 JP7318824B2 (ja) 2023-08-01

Family

ID=81383865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022558847A Active JP7318824B2 (ja) 2020-10-28 2021-06-21 ウィーンフィルタ及びマルチ電子ビーム検査装置

Country Status (5)

Country Link
US (1) US20230136198A1 (ja)
JP (1) JP7318824B2 (ja)
KR (1) KR20230042105A (ja)
TW (1) TWI804911B (ja)
WO (1) WO2022091475A1 (ja)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5266487A (en) * 1975-11-28 1977-06-01 Hitachi Ltd Wien filter form mass separator considering two axis deflection
JPH0479138A (ja) * 1990-07-20 1992-03-12 Jeol Ltd Ｅ×ｂ型エネルギーフィルタ
JP2001023564A (ja) * 1999-07-07 2001-01-26 Anelva Corp Ｅ×ｂ装置
JP2001222969A (ja) * 1999-11-16 2001-08-17 Schlumberger Technol Inc エネルギーフィルタを含む集束イオンビームカラム
JP2002532844A (ja) * 1998-12-17 2002-10-02 フィリップス エレクトロン オプティクス ビー ヴィ オージェ電子の検出を含む粒子光学装置
US20130256530A1 (en) * 2012-04-03 2013-10-03 Xinrong Jiang Apparatus and methods for high-resolution electron beam imaging
WO2019187118A1 (ja) * 2018-03-30 2019-10-03 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
JP2020021733A (ja) * 2018-08-03 2020-02-06 株式会社ニューフレアテクノロジー 電子光学系及びマルチビーム画像取得装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11233062A (ja) 1998-02-10 1999-08-27 Jeol Ltd ウィーンフィルタ及び直接写像型反射電子顕微鏡
US6750455B2 (en) * 2001-07-02 2004-06-15 Applied Materials, Inc. Method and apparatus for multiple charged particle beams
CN101630623B (zh) * 2003-05-09 2012-02-22 株式会社荏原制作所 基于带电粒子束的检查装置及采用了该检查装置的器件制造方法
JP2006277996A (ja) 2005-03-28 2006-10-12 Ebara Corp 電子線装置及び該装置を用いたデバイス製造方法
DE602005023146D1 (de) 2005-07-11 2010-10-07 Integrated Circuit Testing Vorrichtung zur Erzeugung eines elektrisch-magnetischen Feldes und Aufbaumethode derselben
WO2008129937A1 (ja) 2007-04-13 2008-10-30 Kabushiki Kaisha Hayashibara Seibutsu Kagaku Kenkyujo 口腔用多層構造物とその製造方法
JP6695223B2 (ja) 2016-01-28 2020-05-20 株式会社荏原製作所 ウィーンフィルター

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5266487A (en) * 1975-11-28 1977-06-01 Hitachi Ltd Wien filter form mass separator considering two axis deflection
JPH0479138A (ja) * 1990-07-20 1992-03-12 Jeol Ltd Ｅ×ｂ型エネルギーフィルタ
JP2002532844A (ja) * 1998-12-17 2002-10-02 フィリップス エレクトロン オプティクス ビー ヴィ オージェ電子の検出を含む粒子光学装置
JP2001023564A (ja) * 1999-07-07 2001-01-26 Anelva Corp Ｅ×ｂ装置
JP2001222969A (ja) * 1999-11-16 2001-08-17 Schlumberger Technol Inc エネルギーフィルタを含む集束イオンビームカラム
US20130256530A1 (en) * 2012-04-03 2013-10-03 Xinrong Jiang Apparatus and methods for high-resolution electron beam imaging
WO2019187118A1 (ja) * 2018-03-30 2019-10-03 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
JP2020021733A (ja) * 2018-08-03 2020-02-06 株式会社ニューフレアテクノロジー 電子光学系及びマルチビーム画像取得装置

Also Published As

Publication number Publication date
TWI804911B (zh) 2023-06-11
KR20230042105A (ko) 2023-03-27
TW202232551A (zh) 2022-08-16
US20230136198A1 (en) 2023-05-04
JP7318824B2 (ja) 2023-08-01
WO2022091475A1 (ja) 2022-05-05

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