JPWO2022044992A1 - - Google Patents

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Publication number
JPWO2022044992A1
JPWO2022044992A1 JP2022544539A JP2022544539A JPWO2022044992A1 JP WO2022044992 A1 JPWO2022044992 A1 JP WO2022044992A1 JP 2022544539 A JP2022544539 A JP 2022544539A JP 2022544539 A JP2022544539 A JP 2022544539A JP WO2022044992 A1 JPWO2022044992 A1 JP WO2022044992A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022544539A
Other versions
JP7400985B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of JPWO2022044992A1 publication Critical patent/JPWO2022044992A1/ja
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Publication of JP7400985B2 publication Critical patent/JP7400985B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Optical Scanning Systems (AREA)
JP2022544539A 2020-08-25 2021-08-20 パターン描画装置用の検査装置 Active JP7400985B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020141323 2020-08-25
JP2020141323 2020-08-25
PCT/JP2021/030564 WO2022044992A1 (ja) 2020-08-25 2021-08-20 パターン描画装置用の検査装置

Publications (2)

Publication Number Publication Date
JPWO2022044992A1 true JPWO2022044992A1 (ja) 2022-03-03
JP7400985B2 JP7400985B2 (ja) 2023-12-19

Family

ID=80355231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022544539A Active JP7400985B2 (ja) 2020-08-25 2021-08-20 パターン描画装置用の検査装置

Country Status (3)

Country Link
JP (1) JP7400985B2 (ja)
TW (1) TW202214448A (ja)
WO (1) WO2022044992A1 (ja)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62201412A (ja) * 1986-02-28 1987-09-05 Toshiba Mach Co Ltd レ−ザ描画装置
JPH07253379A (ja) * 1994-03-16 1995-10-03 Asahi Optical Co Ltd ポリゴンミラー測定器
JP2016015305A (ja) * 2014-06-13 2016-01-28 ウシオ電機株式会社 光投射装置および車載用前照灯
WO2018061633A1 (ja) * 2016-09-29 2018-04-05 株式会社ニコン ビーム走査装置およびパターン描画装置
JP2018167564A (ja) * 2017-03-30 2018-11-01 京セラドキュメントソリューションズ株式会社 光走査装置および画像形成装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62201412A (ja) * 1986-02-28 1987-09-05 Toshiba Mach Co Ltd レ−ザ描画装置
JPH07253379A (ja) * 1994-03-16 1995-10-03 Asahi Optical Co Ltd ポリゴンミラー測定器
JP2016015305A (ja) * 2014-06-13 2016-01-28 ウシオ電機株式会社 光投射装置および車載用前照灯
WO2018061633A1 (ja) * 2016-09-29 2018-04-05 株式会社ニコン ビーム走査装置およびパターン描画装置
JP2018167564A (ja) * 2017-03-30 2018-11-01 京セラドキュメントソリューションズ株式会社 光走査装置および画像形成装置

Also Published As

Publication number Publication date
JP7400985B2 (ja) 2023-12-19
TW202214448A (zh) 2022-04-16
WO2022044992A1 (ja) 2022-03-03

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