JPWO2022019136A1 - - Google Patents
Info
- Publication number
- JPWO2022019136A1 JPWO2022019136A1 JP2022537919A JP2022537919A JPWO2022019136A1 JP WO2022019136 A1 JPWO2022019136 A1 JP WO2022019136A1 JP 2022537919 A JP2022537919 A JP 2022537919A JP 2022537919 A JP2022537919 A JP 2022537919A JP WO2022019136 A1 JPWO2022019136 A1 JP WO2022019136A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B7/00—Generation of oscillations using active element having a negative resistance between two of its electrodes
- H03B7/02—Generation of oscillations using active element having a negative resistance between two of its electrodes with frequency-determining element comprising lumped inductance and capacitance
- H03B7/06—Generation of oscillations using active element having a negative resistance between two of its electrodes with frequency-determining element comprising lumped inductance and capacitance active element being semiconductor device
- H03B7/08—Generation of oscillations using active element having a negative resistance between two of its electrodes with frequency-determining element comprising lumped inductance and capacitance active element being semiconductor device being a tunnel diode
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66083—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by variation of the electric current supplied or the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. two-terminal devices
- H01L29/66196—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by variation of the electric current supplied or the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. two-terminal devices with an active layer made of a group 13/15 material
- H01L29/66204—Diodes
- H01L29/66219—Diodes with a heterojunction, e.g. resonant tunneling diodes [RTD]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P3/00—Waveguides; Transmission lines of the waveguide type
- H01P3/16—Dielectric waveguides, i.e. without a longitudinal conductor
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B10/00—Transmission systems employing electromagnetic waves other than radio-waves, e.g. infrared, visible or ultraviolet light, or employing corpuscular radiation, e.g. quantum communication
- H04B10/50—Transmitters
- H04B10/572—Wavelength control
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B2200/00—Indexing scheme relating to details of oscillators covered by H03B
- H03B2200/006—Functional aspects of oscillators
- H03B2200/0084—Functional aspects of oscillators dedicated to Terahertz frequencies
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Electromagnetism (AREA)
- Computer Networks & Wireless Communication (AREA)
- Signal Processing (AREA)
- Optical Integrated Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020123912 | 2020-07-20 | ||
PCT/JP2021/025773 WO2022019136A1 (ja) | 2020-07-20 | 2021-07-08 | テラヘルツモジュール |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2022019136A1 true JPWO2022019136A1 (ja) | 2022-01-27 |
Family
ID=79728698
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022537919A Pending JPWO2022019136A1 (ja) | 2020-07-20 | 2021-07-08 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20230260913A1 (ja) |
JP (1) | JPWO2022019136A1 (ja) |
DE (1) | DE112021003317T5 (ja) |
WO (1) | WO2022019136A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024009769A1 (ja) * | 2022-07-04 | 2024-01-11 | ローム株式会社 | テラヘルツ装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7507293B2 (en) * | 2002-10-28 | 2009-03-24 | Hewlett-Packard Development Company, L.P. | Photonic crystals with nanowire-based fabrication |
KR101670963B1 (ko) * | 2010-01-11 | 2016-11-01 | 삼성전자주식회사 | 테라헤르츠 발진기 및 그 제조방법 |
JP6281867B2 (ja) * | 2013-03-04 | 2018-02-21 | 国立大学法人大阪大学 | テラヘルツ波コネクタおよびテラヘルツ波集積回路、および導波路およびアンテナ構造 |
JP6478220B2 (ja) * | 2014-03-12 | 2019-03-06 | 国立大学法人大阪大学 | テラヘルツ波デバイス、およびテラヘルツ波集積回路 |
US10522891B2 (en) * | 2017-08-03 | 2019-12-31 | California Institute Of Technology | Millimeter-wave coupler for semi-confocal fabry-perot cavity |
-
2021
- 2021-07-08 JP JP2022537919A patent/JPWO2022019136A1/ja active Pending
- 2021-07-08 WO PCT/JP2021/025773 patent/WO2022019136A1/ja active Application Filing
- 2021-07-08 US US18/003,819 patent/US20230260913A1/en active Pending
- 2021-07-08 DE DE112021003317.4T patent/DE112021003317T5/de active Pending
Also Published As
Publication number | Publication date |
---|---|
US20230260913A1 (en) | 2023-08-17 |
WO2022019136A1 (ja) | 2022-01-27 |
DE112021003317T5 (de) | 2023-04-06 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240516 |