JPWO2022018968A1 - - Google Patents

Info

Publication number
JPWO2022018968A1
JPWO2022018968A1 JP2022538614A JP2022538614A JPWO2022018968A1 JP WO2022018968 A1 JPWO2022018968 A1 JP WO2022018968A1 JP 2022538614 A JP2022538614 A JP 2022538614A JP 2022538614 A JP2022538614 A JP 2022538614A JP WO2022018968 A1 JPWO2022018968 A1 JP WO2022018968A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022538614A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022018968A1 publication Critical patent/JPWO2022018968A1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
    • C07D335/12—Thioxanthenes
    • C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
    • C07D335/16—Oxygen atoms, e.g. thioxanthones
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/06—Phosphorus compounds without P—C bonds
    • C07F9/22—Amides of acids of phosphorus
    • C07F9/26—Amides of acids of phosphorus containing P-halide groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
JP2022538614A 2020-07-23 2021-05-28 Pending JPWO2022018968A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020125872 2020-07-23
PCT/JP2021/020358 WO2022018968A1 (fr) 2020-07-23 2021-05-28 Générateur de photoacide

Publications (1)

Publication Number Publication Date
JPWO2022018968A1 true JPWO2022018968A1 (fr) 2022-01-27

Family

ID=79728613

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022538614A Pending JPWO2022018968A1 (fr) 2020-07-23 2021-05-28

Country Status (3)

Country Link
JP (1) JPWO2022018968A1 (fr)
TW (1) TW202204317A (fr)
WO (1) WO2022018968A1 (fr)

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4204113B2 (ja) * 1997-12-04 2009-01-07 株式会社Ａｄｅｋａ 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法
US8338074B2 (en) * 2003-06-25 2012-12-25 Cmet Inc. Actinic radiation-curable stereolithographic resin composition having improved stability
CN1989145B (zh) * 2004-05-28 2010-06-23 三亚普罗株式会社 新颖的氟代烷基氟磷酸鎓盐和过渡金属络合物盐
US20090163723A1 (en) * 2005-11-25 2009-06-25 Hideki Kimura Method for producing sulfonium fluorinated alkylfluorophosphate
JP2007262401A (ja) * 2006-03-03 2007-10-11 San Apro Kk 活性エネルギー線硬化性光学的立体造形用樹脂組成物およびそれを硬化した光造形物
WO2007119391A1 (fr) * 2006-03-22 2007-10-25 San-Apro Limited Composition de resist a travail negatif par rayonnement d'energie actinique et produit durci correspondant
JP2011201803A (ja) * 2010-03-25 2011-10-13 San Apro Kk オニウムボレート塩、光酸発生剤及び感光性樹脂組成物
CN107493684B (zh) * 2015-01-21 2019-08-30 三键有限公司 光固化性组合物
KR102321241B1 (ko) * 2016-07-28 2021-11-02 산아프로 가부시키가이샤 술포늄염, 열 또는 광산 발생제, 열 또는 광 경화성 조성물 및 그 경화체
JP2019086559A (ja) * 2017-11-02 2019-06-06 サンアプロ株式会社 ネガ型フォトレジスト用樹脂組成物及び硬化膜
JP7017909B2 (ja) * 2017-11-15 2022-02-09 サンアプロ株式会社 化学増幅型ポジ型フォトレジスト組成物
JP2019099666A (ja) * 2017-12-01 2019-06-24 サンアプロ株式会社 光学的立体造形用樹脂組成物
JP7057240B2 (ja) * 2018-07-02 2022-04-19 サンアプロ株式会社 スルホニウム塩の製造方法
JP7230383B2 (ja) * 2018-09-13 2023-03-01 株式会社レゾナック 感光性樹脂組成物、感光性フィルム、デバイス及びレジストパターンの形成方法

Also Published As

Publication number Publication date
TW202204317A (zh) 2022-02-01
WO2022018968A1 (fr) 2022-01-27

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Legal Events

Date Code Title Description
A621 Written request for application examination

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Effective date: 20240119