JPWO2022014344A1 - - Google Patents
Info
- Publication number
- JPWO2022014344A1 JPWO2022014344A1 JP2022536245A JP2022536245A JPWO2022014344A1 JP WO2022014344 A1 JPWO2022014344 A1 JP WO2022014344A1 JP 2022536245 A JP2022536245 A JP 2022536245A JP 2022536245 A JP2022536245 A JP 2022536245A JP WO2022014344 A1 JPWO2022014344 A1 JP WO2022014344A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
- C07C225/02—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton
- C07C225/14—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020119765 | 2020-07-13 | ||
PCT/JP2021/024953 WO2022014344A1 (ja) | 2020-07-13 | 2021-07-01 | 薄膜形成用原料、薄膜及び薄膜の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2022014344A1 true JPWO2022014344A1 (ja) | 2022-01-20 |
Family
ID=79554619
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022536245A Pending JPWO2022014344A1 (ja) | 2020-07-13 | 2021-07-01 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2022014344A1 (ja) |
TW (1) | TW202212343A (ja) |
WO (1) | WO2022014344A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11784041B2 (en) | 2022-02-08 | 2023-10-10 | L'Air Liquide, Sociéte Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7947814B2 (en) * | 2006-04-25 | 2011-05-24 | Air Products And Chemicals, Inc. | Metal complexes of polydentate beta-ketoiminates |
US7691984B2 (en) * | 2007-11-27 | 2010-04-06 | Air Products And Chemicals, Inc. | Metal complexes of tridentate β-ketoiminates |
US8617305B2 (en) * | 2011-01-25 | 2013-12-31 | Air Products And Chemicals, Inc. | Metal complexes for metal-containing film deposition |
JP6020257B2 (ja) * | 2013-02-28 | 2016-11-02 | 宇部興産株式会社 | 新規なイットリウム化合物、共役ジエン重合用触媒、並びにそれを用いた共役ジエン重合体の製造方法 |
-
2021
- 2021-07-01 WO PCT/JP2021/024953 patent/WO2022014344A1/ja active Application Filing
- 2021-07-01 JP JP2022536245A patent/JPWO2022014344A1/ja active Pending
- 2021-07-09 TW TW110125276A patent/TW202212343A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO2022014344A1 (ja) | 2022-01-20 |
TW202212343A (zh) | 2022-04-01 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240617 |