JPWO2021246400A1 - - Google Patents
Info
- Publication number
- JPWO2021246400A1 JPWO2021246400A1 JP2022528842A JP2022528842A JPWO2021246400A1 JP WO2021246400 A1 JPWO2021246400 A1 JP WO2021246400A1 JP 2022528842 A JP2022528842 A JP 2022528842A JP 2022528842 A JP2022528842 A JP 2022528842A JP WO2021246400 A1 JPWO2021246400 A1 JP WO2021246400A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
- C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Human Computer Interaction (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020097537 | 2020-06-04 | ||
| JP2020097537 | 2020-06-04 | ||
| PCT/JP2021/020833 WO2021246400A1 (ja) | 2020-06-04 | 2021-06-01 | 転写フィルム及び積層体の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2021246400A1 true JPWO2021246400A1 (https=) | 2021-12-09 |
| JPWO2021246400A5 JPWO2021246400A5 (https=) | 2023-02-02 |
| JP7538224B2 JP7538224B2 (ja) | 2024-08-21 |
Family
ID=78831127
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022528842A Active JP7538224B2 (ja) | 2020-06-04 | 2021-06-01 | 転写フィルム及び積層体の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20230104836A1 (https=) |
| JP (1) | JP7538224B2 (https=) |
| CN (1) | CN115702386A (https=) |
| TW (1) | TW202212372A (https=) |
| WO (1) | WO2021246400A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120441461A (zh) * | 2025-07-03 | 2025-08-08 | 天津久瑞盛科技有限公司 | 一种二芳基硫醚类光引发剂及其制备方法和应用 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10291969A (ja) * | 1996-12-06 | 1998-11-04 | Ciba Specialty Chem Holding Inc | 新規α−アミノアセトフェノン光開始剤 |
| JP2016090857A (ja) * | 2014-11-06 | 2016-05-23 | 株式会社Adeka | 感光性ソルダーレジスト用光重合開始剤及びこれを用いた感光性ソルダーレジスト組成物 |
| JP2020056825A (ja) * | 2018-09-28 | 2020-04-09 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜、積層体、転写フィルム、及び、タッチパネルの製造方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011236278A (ja) * | 2010-05-07 | 2011-11-24 | Toyo Ink Sc Holdings Co Ltd | 活性エネルギー線硬化型インキおよび印刷物 |
-
2021
- 2021-06-01 JP JP2022528842A patent/JP7538224B2/ja active Active
- 2021-06-01 WO PCT/JP2021/020833 patent/WO2021246400A1/ja not_active Ceased
- 2021-06-01 CN CN202180037653.5A patent/CN115702386A/zh active Pending
- 2021-06-03 TW TW110120118A patent/TW202212372A/zh unknown
-
2022
- 2022-12-02 US US18/061,211 patent/US20230104836A1/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10291969A (ja) * | 1996-12-06 | 1998-11-04 | Ciba Specialty Chem Holding Inc | 新規α−アミノアセトフェノン光開始剤 |
| JP2016090857A (ja) * | 2014-11-06 | 2016-05-23 | 株式会社Adeka | 感光性ソルダーレジスト用光重合開始剤及びこれを用いた感光性ソルダーレジスト組成物 |
| JP2020056825A (ja) * | 2018-09-28 | 2020-04-09 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜、積層体、転写フィルム、及び、タッチパネルの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2021246400A1 (ja) | 2021-12-09 |
| JP7538224B2 (ja) | 2024-08-21 |
| CN115702386A (zh) | 2023-02-14 |
| US20230104836A1 (en) | 2023-04-06 |
| TW202212372A (zh) | 2022-04-01 |
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