JPWO2021246251A1 - - Google Patents

Info

Publication number
JPWO2021246251A1
JPWO2021246251A1 JP2022528767A JP2022528767A JPWO2021246251A1 JP WO2021246251 A1 JPWO2021246251 A1 JP WO2021246251A1 JP 2022528767 A JP2022528767 A JP 2022528767A JP 2022528767 A JP2022528767 A JP 2022528767A JP WO2021246251 A1 JPWO2021246251 A1 JP WO2021246251A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2022528767A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021246251A1 publication Critical patent/JPWO2021246251A1/ja
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
JP2022528767A 2020-06-02 2021-05-26 Abandoned JPWO2021246251A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020096326 2020-06-02
PCT/JP2021/019916 WO2021246251A1 (ja) 2020-06-02 2021-05-26 転写フィルム、積層体の製造方法

Publications (1)

Publication Number Publication Date
JPWO2021246251A1 true JPWO2021246251A1 (zh) 2021-12-09

Family

ID=78831056

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022528767A Abandoned JPWO2021246251A1 (zh) 2020-06-02 2021-05-26

Country Status (3)

Country Link
JP (1) JPWO2021246251A1 (zh)
TW (1) TW202209077A (zh)
WO (1) WO2021246251A1 (zh)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005081026A1 (ja) * 2004-02-25 2005-09-01 Kansai Paint Co., Ltd. 光導波路形成用光硬化性樹脂組成物、光導波路形成用光硬化性ドライフィルム及び光導波路
WO2018105313A1 (ja) * 2016-12-08 2018-06-14 富士フイルム株式会社 転写フィルム、電極保護膜、積層体、静電容量型入力装置、及び、タッチパネルの製造方法
WO2019073926A1 (ja) * 2017-10-11 2019-04-18 東レ株式会社 感光性導電ペーストおよび導電パターン形成用フィルム

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2020105457A1 (ja) * 2018-11-20 2021-10-14 富士フイルム株式会社 転写材料、樹脂パターンの製造方法、回路配線の製造方法、及び、タッチパネルの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005081026A1 (ja) * 2004-02-25 2005-09-01 Kansai Paint Co., Ltd. 光導波路形成用光硬化性樹脂組成物、光導波路形成用光硬化性ドライフィルム及び光導波路
WO2018105313A1 (ja) * 2016-12-08 2018-06-14 富士フイルム株式会社 転写フィルム、電極保護膜、積層体、静電容量型入力装置、及び、タッチパネルの製造方法
WO2019073926A1 (ja) * 2017-10-11 2019-04-18 東レ株式会社 感光性導電ペーストおよび導電パターン形成用フィルム

Also Published As

Publication number Publication date
TW202209077A (zh) 2022-03-01
WO2021246251A1 (ja) 2021-12-09

Similar Documents

Publication Publication Date Title
BR112023012656A2 (zh)
BR102021018859A2 (zh)
BR102021015500A2 (zh)
BR102021007058A2 (zh)
BR112023016292A2 (zh)
JPWO2022138578A1 (zh)
BR112023011610A2 (zh)
BR102021018926A2 (zh)
BR102021018167A2 (zh)
BR102021017576A2 (zh)
BR102021016837A2 (zh)
BR102021016375A2 (zh)
JPWO2022044879A1 (zh)
BR102021016176A2 (zh)
BR102021016200A2 (zh)
BR102021015566A2 (zh)
BR102021015450A8 (zh)
BR102021015220A2 (zh)
BR102021015247A2 (zh)
BR102021014056A2 (zh)
BR102021014044A2 (zh)
BR102021013929A2 (zh)
BR102021012571A2 (zh)
BR102021012230A2 (zh)
BR102021012107A2 (zh)

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20221020

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230509

A762 Written abandonment of application

Free format text: JAPANESE INTERMEDIATE CODE: A762

Effective date: 20230522