JPWO2021220648A5 - - Google Patents

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Publication number
JPWO2021220648A5
JPWO2021220648A5 JP2022517543A JP2022517543A JPWO2021220648A5 JP WO2021220648 A5 JPWO2021220648 A5 JP WO2021220648A5 JP 2022517543 A JP2022517543 A JP 2022517543A JP 2022517543 A JP2022517543 A JP 2022517543A JP WO2021220648 A5 JPWO2021220648 A5 JP WO2021220648A5
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JP
Japan
Prior art keywords
formula
examples
limited
compound represented
following compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022517543A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2021220648A1 (fr
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2021/010568 external-priority patent/WO2021220648A1/fr
Publication of JPWO2021220648A1 publication Critical patent/JPWO2021220648A1/ja
Publication of JPWO2021220648A5 publication Critical patent/JPWO2021220648A5/ja
Pending legal-status Critical Current

Links

JP2022517543A 2020-04-27 2021-03-16 Pending JPWO2021220648A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020077908 2020-04-27
PCT/JP2021/010568 WO2021220648A1 (fr) 2020-04-27 2021-03-16 Composition de résine sensible aux rayonnements, procédé de formation de motif de photorésine faisant appel à celle-ci et composé de sel d'acide sulfonique et générateur d'acide sensible aux rayonnements comprenant celui-ci

Publications (2)

Publication Number Publication Date
JPWO2021220648A1 JPWO2021220648A1 (fr) 2021-11-04
JPWO2021220648A5 true JPWO2021220648A5 (fr) 2023-01-23

Family

ID=78331946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022517543A Pending JPWO2021220648A1 (fr) 2020-04-27 2021-03-16

Country Status (3)

Country Link
JP (1) JPWO2021220648A1 (fr)
TW (1) TW202140420A (fr)
WO (1) WO2021220648A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023100574A1 (fr) * 2021-12-01 2023-06-08 Jsr株式会社 Composition de résine sensible au rayonnement, procédé de formation de motif, procédé de fabrication de substrat et composé
WO2024070091A1 (fr) * 2022-09-29 2024-04-04 東洋合成工業株式会社 Sel d'onium, générateur de photoacide, polymère, composition de réserve et procédé de fabrication de dispositif utilisant ladite composition de réserve

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003057825A (ja) * 2001-08-16 2003-02-28 Fuji Photo Film Co Ltd ポジ型レジスト組成物
US7678528B2 (en) * 2005-11-16 2010-03-16 Az Electronic Materials Usa Corp. Photoactive compounds
US8455176B2 (en) * 2008-11-12 2013-06-04 Az Electronic Materials Usa Corp. Coating composition
WO2010123009A1 (fr) * 2009-04-21 2010-10-28 Jsr株式会社 Composition de résine sensible au rayonnement, polymère et procédé pour la formation d'un motif de résistance
JP5618619B2 (ja) * 2010-05-17 2014-11-05 富士フイルム株式会社 Ｘ線、電子線又はｅｕｖ光露光用の感活性光線性又は感放射線性樹脂組成物、並びに該組成物を用いたレジスト膜及びパターン形成方法

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