JPWO2021215155A1 - - Google Patents

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Publication number
JPWO2021215155A1
JPWO2021215155A1 JP2022516891A JP2022516891A JPWO2021215155A1 JP WO2021215155 A1 JPWO2021215155 A1 JP WO2021215155A1 JP 2022516891 A JP2022516891 A JP 2022516891A JP 2022516891 A JP2022516891 A JP 2022516891A JP WO2021215155 A1 JPWO2021215155 A1 JP WO2021215155A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022516891A
Other languages
Japanese (ja)
Other versions
JP7469746B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021215155A1 publication Critical patent/JPWO2021215155A1/ja
Application granted granted Critical
Publication of JP7469746B2 publication Critical patent/JP7469746B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/04—Polythioethers from mercapto compounds or metallic derivatives thereof
    • C08G75/045—Polythioethers from mercapto compounds or metallic derivatives thereof from mercapto compounds and unsaturated compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2022516891A 2020-04-20 2021-03-18 Photocurable composition Active JP7469746B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020074903 2020-04-20
JP2020074903 2020-04-20
PCT/JP2021/011251 WO2021215155A1 (en) 2020-04-20 2021-03-18 Photocurable composition

Publications (2)

Publication Number Publication Date
JPWO2021215155A1 true JPWO2021215155A1 (en) 2021-10-28
JP7469746B2 JP7469746B2 (en) 2024-04-17

Family

ID=78269411

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022516891A Active JP7469746B2 (en) 2020-04-20 2021-03-18 Photocurable composition

Country Status (3)

Country Link
JP (1) JP7469746B2 (en)
TW (1) TW202206466A (en)
WO (1) WO2021215155A1 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011202127A (en) 2010-03-26 2011-10-13 Asahi Kasei E-Materials Corp Light sensitive resin composition and cured product
JP5678901B2 (en) 2012-01-25 2015-03-04 信越化学工業株式会社 Curable resin composition, cured product thereof and article having cured film
JP2015172176A (en) 2014-02-18 2015-10-01 日立化成株式会社 Photocurable resin composition, photocurable light-shielding coating and light leakage prevention material using the composition, liquid crystal panel, liquid crystal display and photo-curing method
JP6638380B2 (en) 2015-12-22 2020-01-29 日立化成株式会社 Pre-supply type underfill material and cured product thereof, electronic component device and method of manufacturing the same
KR102208741B1 (en) 2016-05-27 2021-01-28 후지필름 가부시키가이샤 Curable composition, cured film, color filter, light-shielding film, solid-state imaging device, image display device, and method for producing cured film
JPWO2018155013A1 (en) 2017-02-22 2019-12-12 日産化学株式会社 Photo-curable composition for imprint

Also Published As

Publication number Publication date
JP7469746B2 (en) 2024-04-17
TW202206466A (en) 2022-02-16
WO2021215155A1 (en) 2021-10-28

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