JPWO2021210599A1 - - Google Patents

Info

Publication number
JPWO2021210599A1
JPWO2021210599A1 JP2022515407A JP2022515407A JPWO2021210599A1 JP WO2021210599 A1 JPWO2021210599 A1 JP WO2021210599A1 JP 2022515407 A JP2022515407 A JP 2022515407A JP 2022515407 A JP2022515407 A JP 2022515407A JP WO2021210599 A1 JPWO2021210599 A1 JP WO2021210599A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022515407A
Other languages
Japanese (ja)
Other versions
JPWO2021210599A5 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021210599A1 publication Critical patent/JPWO2021210599A1/ja
Publication of JPWO2021210599A5 publication Critical patent/JPWO2021210599A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Detergent Compositions (AREA)
JP2022515407A 2020-04-15 2021-04-14 Pending JPWO2021210599A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020072961 2020-04-15
PCT/JP2021/015404 WO2021210599A1 (en) 2020-04-15 2021-04-14 Method of cleaning substrate

Publications (2)

Publication Number Publication Date
JPWO2021210599A1 true JPWO2021210599A1 (en) 2021-10-21
JPWO2021210599A5 JPWO2021210599A5 (en) 2023-01-05

Family

ID=78084566

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022515407A Pending JPWO2021210599A1 (en) 2020-04-15 2021-04-14

Country Status (4)

Country Link
JP (1) JPWO2021210599A1 (en)
CN (1) CN115280244A (en)
TW (1) TW202215172A (en)
WO (1) WO2021210599A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115261879A (en) * 2022-07-05 2022-11-01 南通群安电子材料有限公司 Organic film removing liquid suitable for MSAP (multiple-site amplification process)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4914629B1 (en) * 1970-12-08 1974-04-09
JPS5192735A (en) * 1975-02-12 1976-08-14 KINZOKUSENJOYOSOSEIBUTSU
JPS60218488A (en) * 1984-04-12 1985-11-01 Rinrei:Kk Iron rust remover
JP2597931B2 (en) * 1991-08-19 1997-04-09 株式会社不二越 Removal agent for titanium coating on high speed tool steel
JPH08283791A (en) * 1993-10-22 1996-10-29 Kazuyuki Urushibara Remover for ink and oil stain
JP3041763B2 (en) * 1995-11-14 2000-05-15 修 弓田 Method for producing rust remover for wheel and rust remover for wheel obtained by this method
JP2003027092A (en) * 2001-07-16 2003-01-29 Techno Trading:Kk Rust remover detergent composition
JP3797541B2 (en) * 2001-08-31 2006-07-19 東京応化工業株式会社 Photoresist stripping solution
JP2007114519A (en) * 2005-10-20 2007-05-10 Tokyo Ohka Kogyo Co Ltd Photoresist stripping liquid
JP5637548B2 (en) * 2012-02-09 2014-12-10 クラシエ製薬株式会社 Exfoliating composition

Also Published As

Publication number Publication date
TW202215172A (en) 2022-04-16
WO2021210599A1 (en) 2021-10-21
CN115280244A (en) 2022-11-01

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Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220708

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240311