JPWO2021177253A1 - - Google Patents

Info

Publication number
JPWO2021177253A1
JPWO2021177253A1 JP2022504367A JP2022504367A JPWO2021177253A1 JP WO2021177253 A1 JPWO2021177253 A1 JP WO2021177253A1 JP 2022504367 A JP2022504367 A JP 2022504367A JP 2022504367 A JP2022504367 A JP 2022504367A JP WO2021177253 A1 JPWO2021177253 A1 JP WO2021177253A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2022504367A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021177253A1 publication Critical patent/JPWO2021177253A1/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
JP2022504367A 2020-03-04 2021-03-01 Withdrawn JPWO2021177253A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020037173 2020-03-04
PCT/JP2021/007785 WO2021177253A1 (en) 2020-03-04 2021-03-01 Positive-type photosensitive resin composition

Publications (1)

Publication Number Publication Date
JPWO2021177253A1 true JPWO2021177253A1 (en) 2021-09-10

Family

ID=77614271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022504367A Withdrawn JPWO2021177253A1 (en) 2020-03-04 2021-03-01

Country Status (5)

Country Link
JP (1) JPWO2021177253A1 (en)
KR (1) KR20220149673A (en)
CN (1) CN115176201A (en)
TW (1) TW202141188A (en)
WO (1) WO2021177253A1 (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5310051B2 (en) 2009-02-12 2013-10-09 Ｊｓｒ株式会社 Radiation-sensitive composition, microlens and method for forming the same
KR20140148431A (en) * 2012-04-27 2014-12-31 후지필름 가부시키가이샤 Chemically amplified positive photosensitive resin composition, method for manufacturing hardened film, hardened film, organic el display device, and liquid-crystal display device
JP6536578B2 (en) * 2014-07-18 2019-07-03 Ａｇｃ株式会社 Negative photosensitive resin composition, cured resin film, partition wall, optical element and method for producing optical element
JP6506184B2 (en) * 2016-01-21 2019-04-24 富士フイルム株式会社 Photosensitive resin composition, method of producing cured product, cured film, display device, and touch panel
JP7075243B2 (en) * 2018-02-28 2022-05-25 太陽ホールディングス株式会社 Photosensitive resin compositions, dry films, cured products, and electronic components

Also Published As

Publication number Publication date
TW202141188A (en) 2021-11-01
CN115176201A (en) 2022-10-11
KR20220149673A (en) 2022-11-08
WO2021177253A1 (en) 2021-09-10

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Legal Events

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