JPWO2021176847A5 - - Google Patents

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JPWO2021176847A5
JPWO2021176847A5 JP2022505007A JP2022505007A JPWO2021176847A5 JP WO2021176847 A5 JPWO2021176847 A5 JP WO2021176847A5 JP 2022505007 A JP2022505007 A JP 2022505007A JP 2022505007 A JP2022505007 A JP 2022505007A JP WO2021176847 A5 JPWO2021176847 A5 JP WO2021176847A5
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Prior art keywords
metal
oxide film
microstructure according
filling
pores
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JP2022505007A
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JPWO2021176847A1 (en
JP7336584B2 (en
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Priority claimed from PCT/JP2021/000672 external-priority patent/WO2021176847A1/en
Publication of JPWO2021176847A1 publication Critical patent/JPWO2021176847A1/ja
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Claims (9)

バルブ金属部材の外縁に配置されたフレーム部により囲まれる形成領域に、複数の細孔を有する酸化膜を形成することにより、前記バルブ金属部材と前記酸化膜とを有する構造体を得る形成工程と、
前記構造体に対して、前記酸化膜の前記複数の細孔に金属を充填する充填工程と、
前記充填工程により、前記構造体に対して、前記酸化膜の前記複数の細孔に金属を充填して得られた金属充填部材を、相対湿度10~30%の環境に24時間以上さらす保持工程とを有し、
前記複数の細孔は、平均直径が1μm以下である、金属充填微細構造体の製造方法。
a forming step of obtaining a structure having the valve metal member and the oxide film by forming an oxide film having a plurality of pores in a formation region surrounded by a frame portion disposed on the outer edge of the valve metal member; ,
a filling step of filling the plurality of pores of the oxide film with a metal for the structure;
In the filling step, the metal-filled member obtained by filling the plurality of pores of the oxide film with the metal in the structure is exposed to an environment with a relative humidity of 10 to 30% for 24 hours or more. and
A method for producing a metal-filled microstructure, wherein the plurality of pores have an average diameter of 1 μm or less.
前記バルブ金属部材は、アルミニウムで構成されている、請求項1に記載の金属充填微細構造体の製造方法。 2. The method of manufacturing a metal-filled microstructure according to claim 1, wherein said valve metal member is composed of aluminum. 前記酸化膜は、陽極酸化膜である、請求項1又は2に記載の金属充填微細構造体の製造方法。 3. The method for producing a metal-filled microstructure according to claim 1, wherein said oxide film is an anodized film. 前記陽極酸化膜は、Al膜である、請求項3に記載の金属充填微細構造体の製造方法。 4. The method of manufacturing a metal-filled microstructure according to claim 3 , wherein said anodized film is an Al2O3 film. 前記充填工程において、前記酸化膜の前記複数の細孔に充填する金属は、銅である、請求項1~4のいずれか1項に記載の金属充填微細構造体の製造方法。 5. The method for producing a metal-filled microstructure according to claim 1, wherein in said filling step, the metal with which said plurality of pores of said oxide film are filled is copper. 前記充填工程は、前記構造体の表面に金属層を形成することにより、前記金属を前記複数の細孔に充填する工程であり、
前記充填工程は、前記金属層を前記フレーム部上に厚み100μm以下に形成する、請求項1~5のいずれか1項に記載の金属充填微細構造体の製造方法。
The filling step is a step of filling the plurality of pores with the metal by forming a metal layer on the surface of the structure,
6. The method for producing a metal-filled microstructure according to claim 1, wherein said filling step forms said metal layer on said frame portion to a thickness of 100 μm or less.
前記保持工程の後、前記構造体の前記表面に形成された前記金属層を除去する金属層除去工程を有する、請求項6に記載の金属充填微細構造体の製造方法。 7. The method for manufacturing a metal-filled microstructure according to claim 6, further comprising a metal layer removing step of removing said metal layer formed on said surface of said structure after said holding step. 前記金属層除去工程の後、前記酸化膜の前記表面を平滑化する表面平滑化処理工程を有する、請求項7に記載の金属充填微細構造体の製造方法。 8. The method for manufacturing a metal-filled microstructure according to claim 7, further comprising a surface smoothing treatment step of smoothing said surface of said oxide film after said metal layer removing step. 前記表面平滑化処理工程の平滑化は、化学的機械的研磨、ドライエッチング又は研削を用いる請求項8に記載の金属充填微細構造体の製造方法。 9. The method of manufacturing a metal-filled microstructure according to claim 8, wherein the smoothing in the surface smoothing treatment step uses chemical mechanical polishing, dry etching or grinding.
JP2022505007A 2020-03-06 2021-01-12 Method for manufacturing metal-filled microstructure Active JP7336584B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020039126 2020-03-06
JP2020039126 2020-03-06
PCT/JP2021/000672 WO2021176847A1 (en) 2020-03-06 2021-01-12 Method for manufacturing metal-filled microstructure

Publications (3)

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JPWO2021176847A1 JPWO2021176847A1 (en) 2021-09-10
JPWO2021176847A5 true JPWO2021176847A5 (en) 2022-10-27
JP7336584B2 JP7336584B2 (en) 2023-08-31

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JP2022505007A Active JP7336584B2 (en) 2020-03-06 2021-01-12 Method for manufacturing metal-filled microstructure

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JP (1) JP7336584B2 (en)
CN (1) CN115210410A (en)
TW (1) TW202200489A (en)
WO (1) WO2021176847A1 (en)

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Publication number Priority date Publication date Assignee Title
WO2021033467A1 (en) * 2019-08-16 2021-02-25 富士フイルム株式会社 Method for producing structure

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* Cited by examiner, † Cited by third party
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JP2010033939A (en) * 2008-07-30 2010-02-12 Murata Mfg Co Ltd Ion conductive membrane, manufacturing method for ion conductive membrane, fuel cell, and hydrogen sensor
KR101745485B1 (en) * 2013-08-30 2017-06-09 후지필름 가부시키가이샤 Method for manufacturing metal-filled microstructure
CN106460221B (en) * 2014-07-18 2021-05-11 株式会社Uacj Surface-treated aluminum material, method for producing same, and surface-treated aluminum material/resin layer assembly
JP6644895B2 (en) * 2016-08-24 2020-02-12 富士フイルム株式会社 Storage method

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