JPWO2021176812A1 - - Google Patents
Info
- Publication number
- JPWO2021176812A1 JPWO2021176812A1 JP2022504984A JP2022504984A JPWO2021176812A1 JP WO2021176812 A1 JPWO2021176812 A1 JP WO2021176812A1 JP 2022504984 A JP2022504984 A JP 2022504984A JP 2022504984 A JP2022504984 A JP 2022504984A JP WO2021176812 A1 JPWO2021176812 A1 JP WO2021176812A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020034792 | 2020-03-02 | ||
JP2020034792 | 2020-03-02 | ||
PCT/JP2020/048055 WO2021176812A1 (ja) | 2020-03-02 | 2020-12-22 | 感光性転写材料、及び回路配線の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2021176812A1 true JPWO2021176812A1 (ja) | 2021-09-10 |
JP7455955B2 JP7455955B2 (ja) | 2024-03-26 |
Family
ID=77613195
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022504984A Active JP7455955B2 (ja) | 2020-03-02 | 2020-12-22 | 感光性転写材料、及び回路配線の製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7455955B2 (ja) |
TW (1) | TW202136062A (ja) |
WO (1) | WO2021176812A1 (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007093796A (ja) * | 2005-09-27 | 2007-04-12 | Fujifilm Corp | パターン形成材料、並びにパターン形成装置及びパターン形成方法 |
WO2009133817A1 (ja) * | 2008-04-28 | 2009-11-05 | 日立化成工業株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、及び、プリント配線板の製造方法 |
WO2009147913A1 (ja) * | 2008-06-02 | 2009-12-10 | 日立化成工業株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの製造方法、及びプリント配線板の製造方法 |
-
2020
- 2020-12-22 WO PCT/JP2020/048055 patent/WO2021176812A1/ja active Application Filing
- 2020-12-22 JP JP2022504984A patent/JP7455955B2/ja active Active
-
2021
- 2021-01-08 TW TW110100688A patent/TW202136062A/zh unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007093796A (ja) * | 2005-09-27 | 2007-04-12 | Fujifilm Corp | パターン形成材料、並びにパターン形成装置及びパターン形成方法 |
WO2009133817A1 (ja) * | 2008-04-28 | 2009-11-05 | 日立化成工業株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、及び、プリント配線板の製造方法 |
WO2009147913A1 (ja) * | 2008-06-02 | 2009-12-10 | 日立化成工業株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの製造方法、及びプリント配線板の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TW202136062A (zh) | 2021-10-01 |
WO2021176812A1 (ja) | 2021-09-10 |
JP7455955B2 (ja) | 2024-03-26 |
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