JPWO2021172427A1 - - Google Patents
Info
- Publication number
- JPWO2021172427A1 JPWO2021172427A1 JP2022503689A JP2022503689A JPWO2021172427A1 JP WO2021172427 A1 JPWO2021172427 A1 JP WO2021172427A1 JP 2022503689 A JP2022503689 A JP 2022503689A JP 2022503689 A JP2022503689 A JP 2022503689A JP WO2021172427 A1 JPWO2021172427 A1 JP WO2021172427A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/02—Oxides
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US16/805,037 US20210269673A1 (en) | 2020-02-28 | 2020-02-28 | Polishing composition containing zirconia particles and an oxidizer |
US17/100,072 US20210269674A1 (en) | 2020-02-28 | 2020-11-20 | Polishing composition containing zirconia particles and an oxidizer |
PCT/JP2021/007094 WO2021172427A1 (ja) | 2020-02-28 | 2021-02-25 | ジルコニア粒子と酸化剤を含む研磨組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2021172427A1 true JPWO2021172427A1 (ja) | 2021-09-02 |
Family
ID=77464304
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022503689A Pending JPWO2021172427A1 (ja) | 2020-02-28 | 2021-02-25 |
Country Status (5)
Country | Link |
---|---|
US (2) | US20210269674A1 (ja) |
JP (1) | JPWO2021172427A1 (ja) |
KR (1) | KR20220143043A (ja) |
TW (1) | TW202136445A (ja) |
WO (1) | WO2021172427A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023171290A1 (ja) * | 2022-03-08 | 2023-09-14 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150009914A (ko) * | 2013-07-17 | 2015-01-27 | 삼성전자주식회사 | 유기막 연마용 cmp 슬러리 조성물 및 이를 이용하는 반도체 장치의 제조 방법 |
KR102392596B1 (ko) * | 2015-06-17 | 2022-04-28 | 쇼와덴코머티리얼즈가부시끼가이샤 | 연마제, 연마제용 저장액 및 연마 방법 |
-
2020
- 2020-11-20 US US17/100,072 patent/US20210269674A1/en not_active Abandoned
-
2021
- 2021-02-25 KR KR1020227029041A patent/KR20220143043A/ko unknown
- 2021-02-25 WO PCT/JP2021/007094 patent/WO2021172427A1/ja active Application Filing
- 2021-02-25 US US17/802,773 patent/US20230081442A1/en active Pending
- 2021-02-25 JP JP2022503689A patent/JPWO2021172427A1/ja active Pending
- 2021-02-26 TW TW110106943A patent/TW202136445A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
KR20220143043A (ko) | 2022-10-24 |
TW202136445A (zh) | 2021-10-01 |
US20230081442A1 (en) | 2023-03-16 |
WO2021172427A1 (ja) | 2021-09-02 |
US20210269674A1 (en) | 2021-09-02 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20231127 |