JPWO2021172427A1 - - Google Patents

Info

Publication number
JPWO2021172427A1
JPWO2021172427A1 JP2022503689A JP2022503689A JPWO2021172427A1 JP WO2021172427 A1 JPWO2021172427 A1 JP WO2021172427A1 JP 2022503689 A JP2022503689 A JP 2022503689A JP 2022503689 A JP2022503689 A JP 2022503689A JP WO2021172427 A1 JPWO2021172427 A1 JP WO2021172427A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022503689A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US16/805,037 external-priority patent/US20210269673A1/en
Application filed filed Critical
Publication of JPWO2021172427A1 publication Critical patent/JPWO2021172427A1/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09GPOLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00Polishing compositions
    • C09G1/02Polishing compositions containing abrasives or grinding agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1409Abrasive particles per se
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G25/00Compounds of zirconium
    • C01G25/02Oxides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
JP2022503689A 2020-02-28 2021-02-25 Pending JPWO2021172427A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/805,037 US20210269673A1 (en) 2020-02-28 2020-02-28 Polishing composition containing zirconia particles and an oxidizer
US17/100,072 US20210269674A1 (en) 2020-02-28 2020-11-20 Polishing composition containing zirconia particles and an oxidizer
PCT/JP2021/007094 WO2021172427A1 (ja) 2020-02-28 2021-02-25 ジルコニア粒子と酸化剤を含む研磨組成物

Publications (1)

Publication Number Publication Date
JPWO2021172427A1 true JPWO2021172427A1 (ja) 2021-09-02

Family

ID=77464304

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022503689A Pending JPWO2021172427A1 (ja) 2020-02-28 2021-02-25

Country Status (5)

Country Link
US (2) US20210269674A1 (ja)
JP (1) JPWO2021172427A1 (ja)
KR (1) KR20220143043A (ja)
TW (1) TW202136445A (ja)
WO (1) WO2021172427A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023171290A1 (ja) * 2022-03-08 2023-09-14 株式会社フジミインコーポレーテッド 研磨用組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150009914A (ko) * 2013-07-17 2015-01-27 삼성전자주식회사 유기막 연마용 cmp 슬러리 조성물 및 이를 이용하는 반도체 장치의 제조 방법
KR102392596B1 (ko) * 2015-06-17 2022-04-28 쇼와덴코머티리얼즈가부시끼가이샤 연마제, 연마제용 저장액 및 연마 방법

Also Published As

Publication number Publication date
KR20220143043A (ko) 2022-10-24
TW202136445A (zh) 2021-10-01
US20230081442A1 (en) 2023-03-16
WO2021172427A1 (ja) 2021-09-02
US20210269674A1 (en) 2021-09-02

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Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20231127