JPWO2021166857A1 - - Google Patents

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Publication number
JPWO2021166857A1
JPWO2021166857A1 JP2022501879A JP2022501879A JPWO2021166857A1 JP WO2021166857 A1 JPWO2021166857 A1 JP WO2021166857A1 JP 2022501879 A JP2022501879 A JP 2022501879A JP 2022501879 A JP2022501879 A JP 2022501879A JP WO2021166857 A1 JPWO2021166857 A1 JP WO2021166857A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022501879A
Other languages
Japanese (ja)
Other versions
JP7429283B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021166857A1 publication Critical patent/JPWO2021166857A1/ja
Application granted granted Critical
Publication of JP7429283B2 publication Critical patent/JP7429283B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B25/00—Quinophthalones
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B29/00—Monoazo dyes prepared by diazotising and coupling
    • C09B29/0025—Monoazo dyes prepared by diazotising and coupling from diazotized amino heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C09B57/004—Diketopyrrolopyrrole dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C09B57/04—Isoindoline dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006—Preparation of organic pigments
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
    • C09B67/0084—Dispersions of dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Dispersion Chemistry (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Color Television Image Signal Generators (AREA)
JP2022501879A 2020-02-20 2021-02-15 Colored compositions, films, color filters, solid-state imaging devices, and image display devices Active JP7429283B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020026816 2020-02-20
JP2020026816 2020-02-20
PCT/JP2021/005564 WO2021166857A1 (en) 2020-02-20 2021-02-15 Coloring composition, film, color filter, solid-state imaging element and image display device

Publications (2)

Publication Number Publication Date
JPWO2021166857A1 true JPWO2021166857A1 (en) 2021-08-26
JP7429283B2 JP7429283B2 (en) 2024-02-07

Family

ID=77391214

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022501879A Active JP7429283B2 (en) 2020-02-20 2021-02-15 Colored compositions, films, color filters, solid-state imaging devices, and image display devices

Country Status (4)

Country Link
JP (1) JP7429283B2 (en)
KR (1) KR20220127879A (en)
TW (1) TW202138486A (en)
WO (1) WO2021166857A1 (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008281653A (en) * 2007-05-08 2008-11-20 Taiyo Ink Mfg Ltd Photocurable resin composition, dry film, cured product, and printed wiring board
JP2012215717A (en) * 2011-03-31 2012-11-08 Taiyo Ink Mfg Ltd Curable resin composition, and dry film and printed wiring board using the same
JP2017061688A (en) * 2013-09-25 2017-03-30 三菱化学株式会社 Pigment dispersion
WO2018123462A1 (en) * 2016-12-28 2018-07-05 富士フイルム株式会社 Pattern manufacturing method, color filter manufacturing method, method of manufacturing sold state imaging element, and method of manufacturing image display device
JP2019148746A (en) * 2018-02-28 2019-09-05 東洋インキＳｃホールディングス株式会社 Color filter coloring composition and color filters
JP6586258B2 (en) * 2017-09-28 2019-10-02 株式会社Ｄｎｐファインケミカル Colored resin composition, cured product, color filter, and display device
JP2019211497A (en) * 2018-05-31 2019-12-12 東洋インキＳｃホールディングス株式会社 Red colored composition for color filter and color filter

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016103994A1 (en) 2014-12-25 2016-06-30 富士フイルム株式会社 Colored composition, method for producing colored composition, color filter, pattern formation method, method for producing color filter, solid-state imaging element, and image display device
JP7077765B2 (en) 2018-05-17 2022-05-31 東洋インキＳｃホールディングス株式会社 Manufacturing method of red coloring composition for color filter and color filter

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008281653A (en) * 2007-05-08 2008-11-20 Taiyo Ink Mfg Ltd Photocurable resin composition, dry film, cured product, and printed wiring board
JP2012215717A (en) * 2011-03-31 2012-11-08 Taiyo Ink Mfg Ltd Curable resin composition, and dry film and printed wiring board using the same
JP2017061688A (en) * 2013-09-25 2017-03-30 三菱化学株式会社 Pigment dispersion
WO2018123462A1 (en) * 2016-12-28 2018-07-05 富士フイルム株式会社 Pattern manufacturing method, color filter manufacturing method, method of manufacturing sold state imaging element, and method of manufacturing image display device
JP6586258B2 (en) * 2017-09-28 2019-10-02 株式会社Ｄｎｐファインケミカル Colored resin composition, cured product, color filter, and display device
JP2019148746A (en) * 2018-02-28 2019-09-05 東洋インキＳｃホールディングス株式会社 Color filter coloring composition and color filters
JP2019211497A (en) * 2018-05-31 2019-12-12 東洋インキＳｃホールディングス株式会社 Red colored composition for color filter and color filter

Also Published As

Publication number Publication date
WO2021166857A1 (en) 2021-08-26
JP7429283B2 (en) 2024-02-07
TW202138486A (en) 2021-10-16
KR20220127879A (en) 2022-09-20

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