JPWO2021157523A1 - - Google Patents
Info
- Publication number
- JPWO2021157523A1 JPWO2021157523A1 JP2021575782A JP2021575782A JPWO2021157523A1 JP WO2021157523 A1 JPWO2021157523 A1 JP WO2021157523A1 JP 2021575782 A JP2021575782 A JP 2021575782A JP 2021575782 A JP2021575782 A JP 2021575782A JP WO2021157523 A1 JPWO2021157523 A1 JP WO2021157523A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020016430 | 2020-02-03 | ||
| JP2020016430 | 2020-02-03 | ||
| PCT/JP2021/003535 WO2021157523A1 (en) | 2020-02-03 | 2021-02-01 | Sample holder |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2021157523A1 true JPWO2021157523A1 (en) | 2021-08-12 |
| JP7252378B2 JP7252378B2 (en) | 2023-04-04 |
Family
ID=77200192
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021575782A Active JP7252378B2 (en) | 2020-02-03 | 2021-02-01 | sample holder |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP7252378B2 (en) |
| WO (1) | WO2021157523A1 (en) |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004296254A (en) * | 2003-03-27 | 2004-10-21 | Sumitomo Electric Ind Ltd | Ceramic heater; and semiconductor or liquid crystal manufacturing device composed by mounting it |
| JP2015018704A (en) * | 2013-07-11 | 2015-01-29 | 日本碍子株式会社 | Ceramic heater |
| JP2016139503A (en) * | 2015-01-27 | 2016-08-04 | 日本特殊陶業株式会社 | Laminated heating element |
| JP2016225355A (en) * | 2015-05-27 | 2016-12-28 | 京セラ株式会社 | Sample holder and plasma etching apparatus using the same |
| KR20170040617A (en) * | 2015-10-05 | 2017-04-13 | 주식회사 미코 | Substrate heating apparatus with enhanced temperature uniformity characteristic |
| WO2018016384A1 (en) * | 2016-07-19 | 2018-01-25 | 日本碍子株式会社 | Electrostatic chuck heater |
| JP2018026405A (en) * | 2016-08-08 | 2018-02-15 | 新光電気工業株式会社 | Substrate fixing device and manufacturing method of the same |
| JP2020017686A (en) * | 2018-07-27 | 2020-01-30 | 日本特殊陶業株式会社 | Retainer |
-
2021
- 2021-02-01 JP JP2021575782A patent/JP7252378B2/en active Active
- 2021-02-01 WO PCT/JP2021/003535 patent/WO2021157523A1/en active Application Filing
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004296254A (en) * | 2003-03-27 | 2004-10-21 | Sumitomo Electric Ind Ltd | Ceramic heater; and semiconductor or liquid crystal manufacturing device composed by mounting it |
| JP2015018704A (en) * | 2013-07-11 | 2015-01-29 | 日本碍子株式会社 | Ceramic heater |
| JP2016139503A (en) * | 2015-01-27 | 2016-08-04 | 日本特殊陶業株式会社 | Laminated heating element |
| JP2016225355A (en) * | 2015-05-27 | 2016-12-28 | 京セラ株式会社 | Sample holder and plasma etching apparatus using the same |
| KR20170040617A (en) * | 2015-10-05 | 2017-04-13 | 주식회사 미코 | Substrate heating apparatus with enhanced temperature uniformity characteristic |
| WO2018016384A1 (en) * | 2016-07-19 | 2018-01-25 | 日本碍子株式会社 | Electrostatic chuck heater |
| JP2018026405A (en) * | 2016-08-08 | 2018-02-15 | 新光電気工業株式会社 | Substrate fixing device and manufacturing method of the same |
| JP2020017686A (en) * | 2018-07-27 | 2020-01-30 | 日本特殊陶業株式会社 | Retainer |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2021157523A1 (en) | 2021-08-12 |
| JP7252378B2 (en) | 2023-04-04 |
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