JPWO2021153180A1 - - Google Patents
Info
- Publication number
- JPWO2021153180A1 JPWO2021153180A1 JP2021574579A JP2021574579A JPWO2021153180A1 JP WO2021153180 A1 JPWO2021153180 A1 JP WO2021153180A1 JP 2021574579 A JP2021574579 A JP 2021574579A JP 2021574579 A JP2021574579 A JP 2021574579A JP WO2021153180 A1 JPWO2021153180 A1 JP WO2021153180A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/63—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B using additives specially adapted for forming the products, e.g.. binder binders
- C04B35/638—Removal thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Structural Engineering (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020014571 | 2020-01-31 | ||
JP2020014571 | 2020-01-31 | ||
PCT/JP2021/000309 WO2021153180A1 (en) | 2020-01-31 | 2021-01-07 | Ceramic structure manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2021153180A1 true JPWO2021153180A1 (en) | 2021-08-05 |
JP7447154B2 JP7447154B2 (en) | 2024-03-11 |
Family
ID=77079337
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021574579A Active JP7447154B2 (en) | 2020-01-31 | 2021-01-07 | Method for manufacturing ceramic structures |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7447154B2 (en) |
KR (1) | KR20220120656A (en) |
CN (1) | CN115004353A (en) |
WO (1) | WO2021153180A1 (en) |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1085192C (en) * | 1995-11-08 | 2002-05-22 | 松下电器产业株式会社 | Ceramic die mould degreasing method and device thereof |
JP2001110879A (en) * | 1999-06-09 | 2001-04-20 | Ibiden Co Ltd | Ceramic substrate for semiconductor manufacturing/ inspection device |
JP2001089248A (en) * | 1999-09-22 | 2001-04-03 | Ngk Spark Plug Co Ltd | Process for producing ceramic substrate and jig used for the same |
JP2004214690A (en) * | 2000-02-07 | 2004-07-29 | Ibiden Co Ltd | Ceramic substrate for semiconductor manufacturing and inspection device |
JP4646461B2 (en) * | 2001-08-10 | 2011-03-09 | 京セラ株式会社 | Electrode built-in ceramic member and manufacturing method thereof |
JP2003128470A (en) * | 2001-10-23 | 2003-05-08 | Mitsubishi Materials Corp | Method of manufacturing ceramic substrate and porous ceramic plate |
JP2004018325A (en) * | 2002-06-18 | 2004-01-22 | Ngk Insulators Ltd | Method of producing sintered compact, sintered compact, member for sintering, method of producing ceramic multilayered substrate and ceramic multilayered substrate |
JP4328891B2 (en) * | 2002-09-30 | 2009-09-09 | Dowaメタルテック株式会社 | Metal-ceramic composite member mold and manufacturing method |
JP4721658B2 (en) * | 2004-05-26 | 2011-07-13 | 京セラ株式会社 | Wafer support member |
JP2007232352A (en) * | 2005-12-27 | 2007-09-13 | Ibiden Co Ltd | Degreasing tool, ceramic molding degreasing method, and method of manufacturing honeycomb structure |
JP2008120653A (en) | 2006-11-15 | 2008-05-29 | Denso Corp | Placing table for firing ceramic honeycomb-formed body |
JP4970210B2 (en) * | 2007-10-12 | 2012-07-04 | 株式会社トクヤマ | Ceramic molded body holder |
WO2009110400A1 (en) * | 2008-03-05 | 2009-09-11 | 日本碍子株式会社 | Kiln tool plate for firing ceramic |
WO2011064854A1 (en) * | 2009-11-25 | 2011-06-03 | イビデン株式会社 | Process for producing fired ceramic and process for producing honeycomb structure |
JP5423632B2 (en) * | 2010-01-29 | 2014-02-19 | 住友大阪セメント株式会社 | Electrostatic chuck device |
JP5971629B2 (en) * | 2012-04-25 | 2016-08-17 | パナソニックIpマネジメント株式会社 | Microfluidic device |
JP6215668B2 (en) * | 2012-11-30 | 2017-10-18 | 京セラ株式会社 | Ceramic sintered body, flow path member using the same, semiconductor inspection apparatus and semiconductor manufacturing apparatus |
JP6119430B2 (en) * | 2013-05-31 | 2017-04-26 | 住友大阪セメント株式会社 | Electrostatic chuck device |
US10068783B2 (en) | 2013-08-26 | 2018-09-04 | Kyocera Corporation | Sample holder |
JP2016038194A (en) * | 2014-08-12 | 2016-03-22 | 東北セラミック株式会社 | Setter for defatting and firing |
JP6464776B2 (en) * | 2014-10-29 | 2019-02-06 | 住友金属鉱山株式会社 | Cylindrical ceramic sintered body and manufacturing method thereof |
JP6410758B1 (en) * | 2016-05-24 | 2018-10-24 | 三井金属鉱業株式会社 | Ceramic lattice |
JP6741548B2 (en) * | 2016-10-14 | 2020-08-19 | 日本碍子株式会社 | Member for semiconductor manufacturing apparatus and manufacturing method thereof |
US10147610B1 (en) * | 2017-05-30 | 2018-12-04 | Lam Research Corporation | Substrate pedestal module including metallized ceramic tubes for RF and gas delivery |
WO2019088203A1 (en) * | 2017-11-02 | 2019-05-09 | 日本碍子株式会社 | Member for semiconductor production apparatuses, method for producing same, and molding die for same |
-
2021
- 2021-01-07 JP JP2021574579A patent/JP7447154B2/en active Active
- 2021-01-07 CN CN202180011161.9A patent/CN115004353A/en active Pending
- 2021-01-07 WO PCT/JP2021/000309 patent/WO2021153180A1/en active Application Filing
- 2021-01-07 KR KR1020227025957A patent/KR20220120656A/en unknown
Also Published As
Publication number | Publication date |
---|---|
WO2021153180A1 (en) | 2021-08-05 |
JP7447154B2 (en) | 2024-03-11 |
KR20220120656A (en) | 2022-08-30 |
CN115004353A (en) | 2022-09-02 |
Similar Documents
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