JPWO2021090576A1 - - Google Patents

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Publication number
JPWO2021090576A1
JPWO2021090576A1 JP2021554831A JP2021554831A JPWO2021090576A1 JP WO2021090576 A1 JPWO2021090576 A1 JP WO2021090576A1 JP 2021554831 A JP2021554831 A JP 2021554831A JP 2021554831 A JP2021554831 A JP 2021554831A JP WO2021090576 A1 JPWO2021090576 A1 JP WO2021090576A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021554831A
Other languages
Japanese (ja)
Other versions
JP7311846B2 (en
JPWO2021090576A5 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021090576A1 publication Critical patent/JPWO2021090576A1/ja
Publication of JPWO2021090576A5 publication Critical patent/JPWO2021090576A5/ja
Application granted granted Critical
Publication of JP7311846B2 publication Critical patent/JP7311846B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/12—Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/041—Lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B2003/0093—Simple or compound lenses characterised by the shape

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
JP2021554831A 2019-11-06 2020-09-14 Non-photosensitive resin composition Active JP7311846B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019201726 2019-11-06
JP2019201726 2019-11-06
PCT/JP2020/034727 WO2021090576A1 (en) 2019-11-06 2020-09-14 Non-photosensitive resin composition

Publications (3)

Publication Number Publication Date
JPWO2021090576A1 true JPWO2021090576A1 (en) 2021-05-14
JPWO2021090576A5 JPWO2021090576A5 (en) 2023-04-06
JP7311846B2 JP7311846B2 (en) 2023-07-20

Family

ID=75849870

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021554831A Active JP7311846B2 (en) 2019-11-06 2020-09-14 Non-photosensitive resin composition

Country Status (5)

Country Link
JP (1) JP7311846B2 (en)
KR (1) KR20220098133A (en)
CN (1) CN114599694B (en)
TW (1) TW202124470A (en)
WO (1) WO2021090576A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116547569A (en) * 2021-12-02 2023-08-04 京东方科技集团股份有限公司 Micro-lens structure, manufacturing method thereof and display device

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0578453A (en) * 1991-09-20 1993-03-30 Japan Synthetic Rubber Co Ltd Protecting film material
JP2001350010A (en) * 2000-06-06 2001-12-21 Nof Corp Coating liquid for protective film of color filter and the color filter
JP2006276048A (en) * 2005-03-25 2006-10-12 Nof Corp Resin composition for color filter protective film, and color filter
JP2007332200A (en) * 2006-06-13 2007-12-27 Jsr Corp Thermosetting resin composition, forming method of antihalation film of solid imaging element, antihalation film of solid imaging element, and solid imaging element
WO2013005619A1 (en) * 2011-07-07 2013-01-10 日産化学工業株式会社 Resin compositions
JP2015089916A (en) * 2013-11-06 2015-05-11 日油株式会社 Thermosetting resin composition suitable as color filter protective film, and color filter comprising cured film thereof
WO2019198378A1 (en) * 2018-04-13 2019-10-17 株式会社Moresco Compound and use thereof

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2776810B2 (en) 1987-07-03 1998-07-16 ソニー株式会社 Method for manufacturing solid-state imaging device
JP3254759B2 (en) 1992-09-25 2002-02-12 ソニー株式会社 Method of manufacturing optical element and on-chip lens
US20060008735A1 (en) * 2004-07-09 2006-01-12 Jsr Corporation Radiation sensitive resin composition for forming microlens
JP2006251464A (en) 2005-03-11 2006-09-21 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition for lens formation
JP4644857B2 (en) 2005-07-22 2011-03-09 昭和電工株式会社 Photosensitive resin composition
JP4656316B2 (en) 2005-12-22 2011-03-23 Ｊｓｒ株式会社 Interlayer insulating film, microlens, and manufacturing method thereof
JP2013166872A (en) * 2012-02-16 2013-08-29 Sumitomo Chemical Co Ltd Colored curable resin composition
JP2016071244A (en) * 2014-09-30 2016-05-09 富士フイルム株式会社 Photosensitive resin composition, cured product and production method of the same, production method of resin pattern, cured film, liquid crystal display device, organic el display device, and touch panel display device
JP6894749B2 (en) * 2016-07-20 2021-06-30 東京応化工業株式会社 Positive photosensitive resin composition for manufacturing microlens patterns and its applications

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0578453A (en) * 1991-09-20 1993-03-30 Japan Synthetic Rubber Co Ltd Protecting film material
JP2001350010A (en) * 2000-06-06 2001-12-21 Nof Corp Coating liquid for protective film of color filter and the color filter
JP2006276048A (en) * 2005-03-25 2006-10-12 Nof Corp Resin composition for color filter protective film, and color filter
JP2007332200A (en) * 2006-06-13 2007-12-27 Jsr Corp Thermosetting resin composition, forming method of antihalation film of solid imaging element, antihalation film of solid imaging element, and solid imaging element
WO2013005619A1 (en) * 2011-07-07 2013-01-10 日産化学工業株式会社 Resin compositions
JP2015089916A (en) * 2013-11-06 2015-05-11 日油株式会社 Thermosetting resin composition suitable as color filter protective film, and color filter comprising cured film thereof
WO2019198378A1 (en) * 2018-04-13 2019-10-17 株式会社Moresco Compound and use thereof

Also Published As

Publication number Publication date
CN114599694B (en) 2024-03-22
TW202124470A (en) 2021-07-01
JP7311846B2 (en) 2023-07-20
KR20220098133A (en) 2022-07-11
WO2021090576A1 (en) 2021-05-14
CN114599694A (en) 2022-06-07

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