JPWO2021020361A1 - - Google Patents

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Publication number
JPWO2021020361A1
JPWO2021020361A1 JP2021535339A JP2021535339A JPWO2021020361A1 JP WO2021020361 A1 JPWO2021020361 A1 JP WO2021020361A1 JP 2021535339 A JP2021535339 A JP 2021535339A JP 2021535339 A JP2021535339 A JP 2021535339A JP WO2021020361 A1 JPWO2021020361 A1 JP WO2021020361A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021535339A
Other languages
Japanese (ja)
Other versions
JP7182007B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021020361A1 publication Critical patent/JPWO2021020361A1/ja
Application granted granted Critical
Publication of JP7182007B2 publication Critical patent/JP7182007B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/02—Homopolymers or copolymers of unsaturated alcohols
    • C08L29/04—Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/80—Constructional details
    • H10K10/88—Passivation; Containers; Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H10K30/88—Passivation; Containers; Encapsulations
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Laminated Bodies (AREA)
JP2021535339A 2019-07-30 2020-07-28 保護層形成用組成物、層状膜、保護層、積層体および半導体デバイスの製造方法 Active JP7182007B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019140023 2019-07-30
JP2019140023 2019-07-30
PCT/JP2020/028783 WO2021020361A1 (ja) 2019-07-30 2020-07-28 保護層形成用組成物、層状膜、保護層、積層体および半導体デバイスの製造方法

Publications (2)

Publication Number Publication Date
JPWO2021020361A1 true JPWO2021020361A1 (zh) 2021-02-04
JP7182007B2 JP7182007B2 (ja) 2022-12-01

Family

ID=74230692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021535339A Active JP7182007B2 (ja) 2019-07-30 2020-07-28 保護層形成用組成物、層状膜、保護層、積層体および半導体デバイスの製造方法

Country Status (4)

Country Link
JP (1) JP7182007B2 (zh)
KR (1) KR20220028041A (zh)
TW (1) TW202121712A (zh)
WO (1) WO2021020361A1 (zh)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02113254A (ja) * 1988-08-30 1990-04-25 E I Du Pont De Nemours & Co フレキソ印刷版用の可塑化されたポリビニルアルコール剥離層
JPH0511405A (ja) * 1991-06-28 1993-01-22 Somar Corp 感光性組成物
JP2004302208A (ja) * 2003-03-31 2004-10-28 Fuji Photo Film Co Ltd 平版印刷版原版の製造方法
JP2006093667A (ja) * 2004-08-23 2006-04-06 Semiconductor Energy Lab Co Ltd 半導体装置の作製方法
WO2016175220A1 (ja) * 2015-04-28 2016-11-03 富士フイルム株式会社 積層体およびキット

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014044810A (ja) 2012-08-24 2014-03-13 Canon Inc 有機ｅｌ装置の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02113254A (ja) * 1988-08-30 1990-04-25 E I Du Pont De Nemours & Co フレキソ印刷版用の可塑化されたポリビニルアルコール剥離層
JPH0511405A (ja) * 1991-06-28 1993-01-22 Somar Corp 感光性組成物
JP2004302208A (ja) * 2003-03-31 2004-10-28 Fuji Photo Film Co Ltd 平版印刷版原版の製造方法
JP2006093667A (ja) * 2004-08-23 2006-04-06 Semiconductor Energy Lab Co Ltd 半導体装置の作製方法
WO2016175220A1 (ja) * 2015-04-28 2016-11-03 富士フイルム株式会社 積層体およびキット

Also Published As

Publication number Publication date
JP7182007B2 (ja) 2022-12-01
WO2021020361A1 (ja) 2021-02-04
KR20220028041A (ko) 2022-03-08
TW202121712A (zh) 2021-06-01

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