JPWO2020255985A5 - - Google Patents
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- Publication number
- JPWO2020255985A5 JPWO2020255985A5 JP2021526819A JP2021526819A JPWO2020255985A5 JP WO2020255985 A5 JPWO2020255985 A5 JP WO2020255985A5 JP 2021526819 A JP2021526819 A JP 2021526819A JP 2021526819 A JP2021526819 A JP 2021526819A JP WO2020255985 A5 JPWO2020255985 A5 JP WO2020255985A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- underlayer film
- resist underlayer
- resist
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 claims 9
- -1 dicyanostyryl group Chemical group 0.000 claims 9
- 229920000642 polymer Polymers 0.000 claims 9
- 239000000758 substrate Substances 0.000 claims 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 5
- 229910052802 copper Inorganic materials 0.000 claims 5
- 239000010949 copper Substances 0.000 claims 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 5
- 125000000217 alkyl group Chemical group 0.000 claims 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 3
- 239000002243 precursor Substances 0.000 claims 3
- 239000002904 solvent Substances 0.000 claims 3
- 125000001931 aliphatic group Chemical group 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 2
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 125000000732 arylene group Chemical group 0.000 claims 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims 2
- 125000003700 epoxy group Chemical group 0.000 claims 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 claims 1
- 239000004971 Cross linker Substances 0.000 claims 1
- 229920000877 Melamine resin Polymers 0.000 claims 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 229920003180 amino resin Polymers 0.000 claims 1
- 125000004429 atom Chemical group 0.000 claims 1
- 239000004202 carbamide Substances 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- VPVSTMAPERLKKM-UHFFFAOYSA-N glycoluril Chemical compound N1C(=O)NC2NC(=O)NC21 VPVSTMAPERLKKM-UHFFFAOYSA-N 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019111916 | 2019-06-17 | ||
| JP2019111916 | 2019-06-17 | ||
| PCT/JP2020/023671 WO2020255985A1 (ja) | 2019-06-17 | 2020-06-17 | ジシアノスチリル基を含むウェットエッチング可能なレジスト下層膜形成組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020255985A1 JPWO2020255985A1 (enExample) | 2020-12-24 |
| JPWO2020255985A5 true JPWO2020255985A5 (enExample) | 2023-06-02 |
| JP7322949B2 JP7322949B2 (ja) | 2023-08-08 |
Family
ID=74040810
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021526819A Active JP7322949B2 (ja) | 2019-06-17 | 2020-06-17 | ジシアノスチリル基を含むウェットエッチング可能なレジスト下層膜形成組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11977331B2 (enExample) |
| JP (1) | JP7322949B2 (enExample) |
| KR (1) | KR102592573B1 (enExample) |
| CN (1) | CN113994263B (enExample) |
| TW (1) | TWI834886B (enExample) |
| WO (1) | WO2020255985A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI803390B (zh) * | 2022-07-15 | 2023-05-21 | 三福化工股份有限公司 | 蝕刻液組成物及其蝕刻方法 |
| KR20250121560A (ko) * | 2022-12-15 | 2025-08-12 | 닛산 가가쿠 가부시키가이샤 | 레지스트 하층막 형성용 조성물 |
| TW202535995A (zh) * | 2024-01-31 | 2025-09-16 | 日商日產化學股份有限公司 | 光阻下層膜形成用組成物 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6199331A (ja) * | 1984-10-19 | 1986-05-17 | Sumitomo Chem Co Ltd | 微細パタ−ン形成法 |
| US5693691A (en) | 1995-08-21 | 1997-12-02 | Brewer Science, Inc. | Thermosetting anti-reflective coatings compositions |
| US6846612B2 (en) * | 2002-02-01 | 2005-01-25 | Brewer Science Inc. | Organic anti-reflective coating compositions for advanced microlithography |
| US6872506B2 (en) * | 2002-06-25 | 2005-03-29 | Brewer Science Inc. | Wet-developable anti-reflective compositions |
| GB0219745D0 (en) | 2002-08-23 | 2002-10-02 | Fast Technology Ag | Torque sensor adaptor |
| JP2005321752A (ja) | 2004-04-09 | 2005-11-17 | Nissan Chem Ind Ltd | イソシアヌル酸化合物と安息香酸化合物との反応生成物を含む反射防止膜形成組成物 |
| EP2197839B1 (en) | 2007-10-10 | 2013-01-02 | Basf Se | Sulphonium salt initiators |
| WO2011125839A1 (ja) | 2010-03-31 | 2011-10-13 | Jsr株式会社 | レジスト下層膜形成用組成物及びパターン形成方法 |
| JP5791874B2 (ja) * | 2010-03-31 | 2015-10-07 | 富士フイルム株式会社 | 着色組成物、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、並びに表示装置 |
| JP5623934B2 (ja) * | 2011-02-08 | 2014-11-12 | 富士フイルム株式会社 | 着色組成物、着色感放射線性組成物、色素多量体の製造方法、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、並びに表示装置 |
| SG11201606648QA (en) * | 2014-02-12 | 2016-09-29 | Nissan Chemical Ind Ltd | Film-forming composition including fluorine-containing surfactant |
| WO2016080217A1 (ja) * | 2014-11-19 | 2016-05-26 | 日産化学工業株式会社 | 湿式除去が可能なシリコン含有レジスト下層膜形成組成物 |
| JP7327479B2 (ja) * | 2019-06-17 | 2023-08-16 | 日産化学株式会社 | ジシアノスチリル基を有する複素環化合物を含むウェットエッチング可能なレジスト下層膜形成組成物 |
-
2020
- 2020-06-17 WO PCT/JP2020/023671 patent/WO2020255985A1/ja not_active Ceased
- 2020-06-17 JP JP2021526819A patent/JP7322949B2/ja active Active
- 2020-06-17 TW TW109120311A patent/TWI834886B/zh active
- 2020-06-17 CN CN202080044359.2A patent/CN113994263B/zh active Active
- 2020-06-17 US US17/619,433 patent/US11977331B2/en active Active
- 2020-06-17 KR KR1020217041388A patent/KR102592573B1/ko active Active
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