JPWO2020196601A1 - - Google Patents

Info

Publication number
JPWO2020196601A1
JPWO2020196601A1 JP2020517600A JP2020517600A JPWO2020196601A1 JP WO2020196601 A1 JPWO2020196601 A1 JP WO2020196601A1 JP 2020517600 A JP2020517600 A JP 2020517600A JP 2020517600 A JP2020517600 A JP 2020517600A JP WO2020196601 A1 JPWO2020196601 A1 JP WO2020196601A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2020517600A
Other languages
Japanese (ja)
Other versions
JP7484710B2 (en
JPWO2020196601A5 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2020196601A1 publication Critical patent/JPWO2020196601A1/ja
Publication of JPWO2020196601A5 publication Critical patent/JPWO2020196601A5/ja
Application granted granted Critical
Publication of JP7484710B2 publication Critical patent/JP7484710B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Silicon Polymers (AREA)
JP2020517600A 2019-03-26 2020-03-25 Positive-type photosensitive resin composition, cured film thereof, and optical device having the same Active JP7484710B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019058133 2019-03-26
JP2019058133 2019-03-26
PCT/JP2020/013260 WO2020196601A1 (en) 2019-03-26 2020-03-25 Positive-type photosensitive resin composition, cured film thereof, and optical device including same

Publications (3)

Publication Number Publication Date
JPWO2020196601A1 true JPWO2020196601A1 (en) 2020-10-01
JPWO2020196601A5 JPWO2020196601A5 (en) 2023-03-28
JP7484710B2 JP7484710B2 (en) 2024-05-16

Family

ID=72609928

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020517600A Active JP7484710B2 (en) 2019-03-26 2020-03-25 Positive-type photosensitive resin composition, cured film thereof, and optical device having the same

Country Status (3)

Country Link
JP (1) JP7484710B2 (en)
TW (1) TWI827824B (en)
WO (1) WO2020196601A1 (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5310051B2 (en) 2009-02-12 2013-10-09 Ｊｓｒ株式会社 Radiation-sensitive composition, microlens and method for forming the same
JP5397152B2 (en) 2009-10-22 2014-01-22 Ｊｓｒ株式会社 Positive radiation-sensitive composition, interlayer insulating film and method for forming the same
JP5917150B2 (en) * 2009-11-27 2016-05-11 Jsr株式会社 Positive radiation-sensitive composition, cured film and method for forming the same
JP5818022B2 (en) 2010-05-13 2015-11-18 日産化学工業株式会社 Photosensitive resin composition and display device
EP2799928B1 (en) * 2011-12-26 2019-05-22 Toray Industries, Inc. Photosensitive resin composition and process for producing semiconductor element
JP2017173741A (en) * 2016-03-25 2017-09-28 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ Photosensitive siloxane composition
CN109071742B (en) * 2016-04-25 2021-07-09 东丽株式会社 Resin composition, cured film thereof, method for producing same, and solid-state imaging device

Also Published As

Publication number Publication date
JP7484710B2 (en) 2024-05-16
TWI827824B (en) 2024-01-01
WO2020196601A1 (en) 2020-10-01
TW202040275A (en) 2020-11-01

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