JPWO2020179740A1 - - Google Patents

Info

Publication number
JPWO2020179740A1
JPWO2020179740A1 JP2021504086A JP2021504086A JPWO2020179740A1 JP WO2020179740 A1 JPWO2020179740 A1 JP WO2020179740A1 JP 2021504086 A JP2021504086 A JP 2021504086A JP 2021504086 A JP2021504086 A JP 2021504086A JP WO2020179740 A1 JPWO2020179740 A1 JP WO2020179740A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021504086A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2020179740A1 publication Critical patent/JPWO2020179740A1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/141—Beam splitting or combining systems operating by reflection only using dichroic mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2021504086A 2019-03-04 2020-03-02 Pending JPWO2020179740A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019038939 2019-03-04
PCT/JP2020/008724 WO2020179740A1 (ja) 2019-03-04 2020-03-02 露光用の光源装置、露光装置、及び露光方法

Publications (1)

Publication Number Publication Date
JPWO2020179740A1 true JPWO2020179740A1 (ja) 2020-09-10

Family

ID=72338374

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021504086A Pending JPWO2020179740A1 (ja) 2019-03-04 2020-03-02

Country Status (5)

Country Link
JP (1) JPWO2020179740A1 (ja)
KR (1) KR20210134326A (ja)
CN (1) CN113544589A (ja)
TW (1) TW202040281A (ja)
WO (1) WO2020179740A1 (ja)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006184709A (ja) * 2004-12-28 2006-07-13 Nikon Corp 結像光学系、露光装置及びマイクロデバイスの製造方法
US20100283978A1 (en) 2009-05-07 2010-11-11 Ultratech,Inc. LED-based UV illuminators and lithography systems using same
JPWO2012067246A1 (ja) * 2010-11-19 2014-05-19 Ｎｓｋテクノロジー株式会社 近接露光装置及び近接露光方法
JP5908297B2 (ja) * 2012-02-09 2016-04-26 株式会社トプコン 露光装置
JP6215560B2 (ja) * 2013-04-16 2017-10-18 株式会社オーク製作所 露光装置
JP6282847B2 (ja) * 2013-11-19 2018-02-21 Hoya株式会社 フォトマスク及び該フォトマスクを用いた基板の製造方法
JP2016071243A (ja) * 2014-09-30 2016-05-09 富士フイルム株式会社 樹脂パターンの形成方法、パターンの形成方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、及び、タッチパネル表示装置
JP6623847B2 (ja) * 2016-03-07 2019-12-25 ウシオ電機株式会社 光源装置及びこれを備えた露光装置
JP6654956B2 (ja) * 2016-04-01 2020-02-26 シーシーエス株式会社 光照射装置
DE202016103819U1 (de) 2016-07-14 2017-10-20 Suss Microtec Lithography Gmbh Lichtquellenanordnung für ein Belichtungssystem sowie Fotolithografie-Belichtungssystem
CN110622066A (zh) * 2017-05-19 2019-12-27 索尼公司 投影显示装置

Also Published As

Publication number Publication date
TW202040281A (zh) 2020-11-01
CN113544589A (zh) 2021-10-22
KR20210134326A (ko) 2021-11-09
WO2020179740A1 (ja) 2020-09-10

Similar Documents

Publication Publication Date Title
BR112019017762A2 (ja)
BR112021017339A2 (ja)
BR112021013854A2 (ja)
BR112021018450A2 (ja)
BR112021017939A2 (ja)
BR112021017892A2 (ja)
BR112019016141A2 (ja)
AU2020104490A4 (ja)
BR112021017738A2 (ja)
BR112021017782A2 (ja)
BR112019016138A2 (ja)
BR112019016142A2 (ja)
BR112021018168A2 (ja)
BR112021017728A2 (ja)
BR112021008711A2 (ja)
BR112021017234A2 (ja)
BR112021017355A2 (ja)
BR112021018102A2 (ja)
BR112021017173A2 (ja)
BR112021017637A2 (ja)
BR112021018452A2 (ja)
BR112021012348A2 (ja)
BR112021018250A2 (ja)
BR112021018084A2 (ja)
BR112021018093A2 (ja)