JPWO2020162396A1 - Mask adapters, mask adapter mounting tools, exposure equipment, and device manufacturing methods - Google Patents

Abstract

One aspect of the mask adapter of the present invention is a mask adapter used in an exposure apparatus that illuminates a mask supported on a stage and exposes a pattern formed on the mask onto a substrate, and is attached to the mask. A main body having a support portion that supports the mask outside the region where the pattern is formed, and a supported portion that is supported by the stage, and a detection unit on the main body portion of the exposure apparatus. The first detected unit comprises, and the first detected unit includes information about the mask adapter.

Description

The present invention relates to a mask adapter, a mask adapter mounting tool, an exposure apparatus, and a device manufacturing method.
This application claims priority based on Japanese Patent Application No. 2019-020167 filed on February 6, 2019, the contents of which are incorporated herein by reference.

For example, Patent Document 1 describes a mask holding member attached to an exposure mask used in an exposure apparatus. When using an exposure mask with such a mask holding member attached, it has been a problem to improve the exposure accuracy of the exposure apparatus.

Japanese Unexamined Patent Publication No. 11-288099

One aspect of the mask adapter of the present invention is a mask adapter used in an exposure apparatus that illuminates a mask supported on a stage and exposes a pattern formed on the mask onto a substrate, and is attached to the mask. A main body having a support portion that supports the mask outside the region where the pattern is formed, and a supported portion that is supported by the stage, and a detection unit on the main body portion of the exposure apparatus. The first detected unit comprises, and the first detected unit includes information about the mask adapter.

The information regarding the mask adapter may be configured to include control information for controlling the movement of the stage supporting the mask adapter to which the mask is attached in the exposure.

The information about the mask adapter may be configured to include the rigidity of the mask adapter.

The first detected portion may be configured to be a barcode.

One aspect of the mask adapter of the present invention is a mask adapter used in an exposure apparatus that illuminates a mask supported on a stage and exposes a pattern formed on the mask onto a substrate, and is attached to the mask. , A main body having a mounting portion of the mask mounted outside the region where the pattern is formed, a supported portion supported by the stage, and detection of the exposure device on the main body. The second detected portion includes a second detected portion that can be detected by the unit, and the second detected portion includes information about the mask attached to the mask adapter.

The second detected portion is provided on the main body portion and can be detected by the detection unit of the exposure apparatus, and the second detected portion may be configured to include information about the mask attached to the mask adapter. good.

The first detected portion and the second detected portion may be arranged adjacent to each other.

The information about the mask includes at least one of the flatness of the mask, the type of pattern formed on the mask, the dimensional error of the mask, the weight error of the mask, and the drawing error of the pattern formed on the mask. It may be a configuration including.

It may be configured to include a display unit that displays the second detected unit in a changeable manner.

The display unit may be configured to display information about the mask that the mask has.

The second detected portion may be configured to be an electronic barcode.

The display unit may be configured to display information about the mask of the other mask when another mask different from the mask is attached to the mask adapter.

One aspect of the mask adapter of the present invention is a mask adapter used in an exposure apparatus that illuminates a mask supported on a stage and exposes a pattern formed on the mask onto a substrate, and is attached to the mask. A main body having a mounting portion of the mask mounted outside the area where the pattern is formed, a supported portion supported by the stage, the mask adapter to which the mask is mounted, and the mask. First, the exposure apparatus uses the first sensor to recognize that the mask adapter to which the mask is attached has been transported to the stage by a transport device capable of transporting different masks. It is provided with a recognized portion.

The exposure device first sensor indicates that the mask adapter to which the mask is attached has been transported to the stage by a transport device capable of transporting the mask adapter to which the mask is attached and another mask, respectively. It may be configured to further include a first recognized portion for recognition using the above.

The first recognized portion is provided on the main body portion and includes a reflecting portion that reflects the light emitted from the first sensor, and the reflecting portion receives the light emitted from the first sensor. 1 The sensor may be configured to reflect in a direction different from the direction in which the sensor is located.

The first recognized portion may have a configuration having a first passing portion through which the light emitted from the first sensor passes.

The first recognized portion may be configured to be detected by the first sensor provided in the transport device of the exposure device.

One aspect of the mask adapter of the present invention is a mask adapter used in an exposure apparatus that illuminates a mask supported on a stage and exposes a pattern formed on the mask onto a substrate, and is attached to the mask. A main body having a mounting portion of the mask mounted outside the area where the pattern is formed, a supported portion supported by the stage, the mask adapter to which the mask is mounted, and the mask. The stage, which can support different different masks, is provided with a second recognized portion for the exposure apparatus to recognize that the mask adapter is supported by using the second sensor.

A second cover for the exposure apparatus to recognize that the mask adapter is supported on the stage capable of supporting the mask adapter to which the mask is attached and another mask, respectively, by using the second sensor. It may be configured to include a recognition unit.

The second recognized portion may have a configuration having a second passing portion through which the light emitted from the second sensor passes.

The second passing portion may be configured to be a through hole provided in the main body portion.

The second recognized portion may be configured to be detected by the second sensor provided on the stage.

The main body may have a frame-like shape that surrounds the mask.

One aspect of the exposure apparatus of the present invention is an illumination optical system that illuminates the mask attached to the mask adapter, and projection optics that projects a pattern of the mask illuminated by the illumination optical system onto the substrate. It is equipped with a system.

One aspect of the device manufacturing method of the present invention includes exposing a substrate with the above-mentioned exposure apparatus and developing the exposed substrate.

One embodiment of the device manufacturing method of the present invention exposes the substrate by illuminating the mask attached to the mask adapter and projecting an image of the illuminated mask pattern onto the substrate. This includes developing the exposed substrate.

One aspect of the mask adapter mounting tool of the present invention is to mount the mask on the mask adapter described above.

One aspect of the mask adapter mounting tool of the present invention is a mask adapter mounting tool that mounts the mask on a mask adapter used in an exposure apparatus that exposes a pattern formed on the mask onto a substrate. A writing unit for displaying a second detected unit containing information about the mask attached to the mask adapter on a display unit provided on the mask adapter is provided.

A second detection unit for detecting a third detected unit including information about the mask provided on the mask is provided, and the writing unit is based on information detected from the third detected unit by the second detecting unit. Therefore, the display unit may be configured to display the second detected unit.

It is also a tool for removing the mask from the mask adapter, and includes a removal detection unit for detecting that the mask has been removed from the mask adapter, and the writing unit has the mask removed from the mask adapter by the removal detection unit. When it is detected, the display on the display unit may be erased.

The mask may be configured to include a second detection unit that detects a third detection unit that includes information about the mask.

One aspect of the mask adapter mounting tool of the present invention is a mask adapter mounting tool that mounts the mask on a mask adapter used in an exposure apparatus that exposes a pattern formed on the mask onto a substrate. A second detection unit for detecting a third detection unit including information on the provided mask is provided.

The elevating device may be provided with an elevating device for moving the mask in the vertical direction with respect to the mask adapter, and the elevating device may be configured to lower the mask located above the mask adapter and arrange the mask on the mask adapter.

The elevating device may be configured to arrange the mask on the mask adapter having a frame shape surrounding the mask in a plan view.

One aspect of the exposure apparatus of the present invention is to use the mask adapter mounting tool to illuminate the mask attached to the mask adapter with an illumination optical system and a pattern of the mask illuminated by the illumination optical system. It includes a projection optical system that projects onto a substrate.

One aspect of the device manufacturing method of the present invention is to attach a mask to the mask adapter by using the above-mentioned mask adapter attachment tool, to illuminate the mask attached to the mask adapter, and to illuminate the illuminated mask. It includes exposing the substrate by projecting an image of the mask pattern onto the substrate, and developing the exposed substrate.

FIG. 1 is a schematic configuration diagram showing an exposure apparatus according to the present embodiment. FIG. 2 is a perspective view showing the mask case of the present embodiment. FIG. 3A is a plan view of the mask assembly in which the mask adapter of the present embodiment is attached to the mask as viewed from above. FIG. 3B is a plan view of a mask handled as a single unit in the exposure apparatus of the present embodiment as viewed from above. FIG. 4 is a perspective view showing a part of the mask adapter of the present embodiment. FIG. 5 is a plan view of a part of the mask adapter of the present embodiment as viewed from above. FIG. 6 is a perspective view showing the mask adapter mounting tool of the present embodiment. FIG. 7 is a plan view of the mask adapter mounting tool of the present embodiment as viewed from above. FIG. 8 is a cross-sectional view showing the mask adapter mounting tool of the present embodiment, and is a cross-sectional view taken along the line VIII-VIII of FIG. FIG. 9 is a plan view showing a part of a procedure for exposing a substrate in an exposure apparatus using a mask to which the mask adapter of the present embodiment is attached. FIG. 10 is a plan view of the mask stage in which the mask assembly of the present embodiment is arranged as viewed from above. FIG. 11 is a plan view of a part of the mask stage in which the mask assembly of the present embodiment is arranged as viewed from above.

Hereinafter, the mask adapter and the mask adapter mounting tool according to the embodiment of the present invention will be described with reference to the drawings.
The scope of the present invention is not limited to the following embodiments, and can be arbitrarily changed within the scope of the technical idea of the present invention. Further, in the following drawings, the scale and the number of each structure may be different from the scale and the number of the actual structure in order to make each configuration easy to understand.

Further, the Z-axis direction appropriately shown in each figure is a vertical direction in which the positive side is the upper side and the negative side is the lower side. The X-axis direction and the Y-axis direction are directions orthogonal to the vertical direction (Z-axis direction) and are horizontal directions orthogonal to each other. In the following description, the direction parallel to the Z-axis direction is referred to as "vertical direction Z", the direction parallel to the X-axis direction is referred to as "first direction X", and the direction parallel to the Y-axis direction is referred to as "second direction". Called "direction Y". Further, the positive side (+ X side) of the first direction X is referred to as "one side of the first direction X", and the negative side (-X side) is referred to as "the other side of the first direction X". Further, the positive side (+ Y side) of the second direction Y is referred to as "one side of the second direction Y", and the negative side (-Y side) is referred to as "the other side of the second direction Y". In the description of the present embodiment, the first direction X and the second direction Y are horizontal directions with respect to the mask adapter and the mask. The description will be given with the rotation (tilt) direction around the vertical direction Z (Z-axis direction) as the θz direction.

FIG. 1 is a schematic configuration diagram showing an exposure apparatus EX of the present embodiment.
The exposure apparatus EX is an apparatus that exposes the substrate P by projecting an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P. The substrate P exposed by the exposure apparatus EX of the present embodiment is, for example, a substrate for a flat panel display. As shown in FIG. 1, the exposure apparatus EX includes an exposure unit EP, a mask library LB, transfer devices H1 and H2, a chamber CH, and a control device CONT.

The exposure unit EP is a portion that exposes the pattern of the mask M to the substrate P. The exposure unit EP includes a mask stage (stage) MST, a substrate stage PST, an illumination optical system IL, and a projection unit PL. The exposure apparatus EX illuminates the mask M supported by the mask stage MST in the exposure unit EP, and exposes the pattern formed on the mask M on the substrate P.

The mask stage MST supports the mask M. The substrate stage PST supports the substrate P. The illumination optical system IL is configured in the same manner as the illumination optical system disclosed in, for example, US Pat. No. 5,729,331, and illuminates the mask M supported by the mask stage MST with the exposure light EL. As the exposure light EL, for example, light containing at least one wavelength of i-line (wavelength 365 nm), g-line (wavelength 436 nm), and h-line (wavelength 405 nm) is used. The wavelength of the light source used in the illumination optical system IL and the exposure light EL emitted from the light source is not particularly limited, and for example, ArF excima laser light (wavelength 193 nm), KrF excima laser light (wavelength 248 nm), or the like. It may be ultraviolet light or vacuum ultraviolet light such as _{F 2 laser light (wavelength 157 nm).}

The projection unit PL projects and exposes an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P supported by the substrate stage PST. The projection unit PL is a so-called multi-lens type projection optical system having the same configuration as the projection optical system disclosed in, for example, US Pat. No. 6,552,775, and is, for example, both sides forming an erect image. It has multiple telecentric projection optics. For example, a plurality of projection optical systems provided in the projection unit PL have a correction mechanism in each projection optical system that can correct a focus position, a shift amount, a non-linear correction amount, and the like. As each correction mechanism and its correction method, for example, the configurations and methods described in Japanese Patent Publication Nos. 4,211,272, US Patent Publication No. 6,811,953 and the like can be adopted.

Although not shown, in the exposure unit EP, the mask stage MST can be moved in the first direction X and the second direction Y, and the substrate stage PST can be moved in the first direction X and the second direction Y. A drive device is provided.

The mask library LB is a storage unit for storing the mask case C in which the mask M is stored. The mask library LB includes a plurality of accommodating portions LBa. The plurality of accommodating portions LBa are arranged along the vertical direction Z. A mask case C is housed in each storage part LBa. Each mask M is individually stored in the mask case C housed in the storage portion LBa. The mask case C in which the mask M is housed is carried to the exposure apparatus EX by the transport vehicle V and is housed in each storage portion LBa of the mask library LB.

FIG. 2 is a perspective view showing the mask case C of the present embodiment.
As shown in FIG. 2, the mask case C includes a mask storage portion CA and a handle portion CB. The mask storage unit CA includes a storage unit main body CA1 and a lid portion CA2. The storage unit main body CA1 has a rectangular box shape in a plan view that opens upward. The mask M is stored inside the storage unit main body CA1. The mask case C may have the same configuration as the mask case disclosed in, for example, US Patent Application Publication No. 2010/022030304 and International Publication No. 2016/121635.

The lid portion CA2 is detachably attached to the storage portion main body CA1. The lid portion CA2 closes the opening on the upper side of the storage portion main body CA1 and seals the inside of the storage portion main body CA1. A handle portion CB is provided on the outer edge portion of the lid portion CA2. The handle portion CB is a portion used when opening and closing the lid portion CA2. For example, three handle portions CB are provided.

A first window portion CC1 and a second window portion CC2 are provided on the upper surface of the lid portion CA2. The first window portion CC1 and the second window portion CC2 are transparent portions that make the inside of the mask case C visible when the lid portion CA2 is attached to the storage portion main body CA1. The first window portion CC1 and the second window portion CC2 are formed of, for example, a transparent resin or the like.

The first window portion CC1 is provided on the outer edge portion of the upper surface of the lid portion CA2. Through the first window portion CC1, the detected portion provided in the mask M housed in the mask case C or the mask adapter 10 described later can be read from the outside of the mask case C by a reader. In this embodiment, the reader is a barcode reader.

The second window portion CC2 is provided in the central portion of the upper surface of the lid portion CA2. For example, four second window portions CC2 are provided. By looking at the inside of the mask case C through the second window portion CC2, it can be confirmed whether or not the mask M is housed in the mask case C.

The transport device H1 is a device for transporting the mask case C. Although not shown, the transport device H1 includes a mask case transport unit capable of moving the mask case C in the vertical direction Z and the second direction Y. The transport device H1 accommodates the mask case C on the transport vehicle V in the storage section LBa of the mask library LB by the mask case transport section. Further, the transport device H1 raises the mask case C housed in the storage portion LBa of the mask library LB to the uppermost portion of the transport device H1 with the lid portion CA2 removed, and transports the mask M in the mask case C. Hand over to device H2.

The transport device H2 is a device that transports the mask M in the mask case C moved to the uppermost portion of the transport device H1 to the exposure unit EP. As shown in FIG. 1, the transport device H2 includes a carrier guide H2a and a carrier H2b. The carrier guide H2a extends in the first direction X. The carrier H2b grips and holds the mask M from above. The carrier H2b moves in the first direction X along the carrier guide H2a and moves to the upper side of the mask stage MST. The carrier H2b places the gripped mask M on the mask stage MST.

The chamber CH internally houses the exposure unit EP, the mask library LB, and the transfer devices H1 and H2. The inside of the chamber CH is set to a predetermined environment.
The control device CONT controls the operation of the entire exposure device EX including the operations of the transfer devices H1 and H2. The control device CONT is such that when the mask M is mounted on the mask stage MST and the substrate P is mounted on the substrate stage PST, the pattern on the mask M is exposed (formed) on the substrate P. And the substrate stage PST are relatively moved in the first direction X with respect to the projection unit PL and the illumination optical system IL. When exposing the substrate P, the control device CONT may sequentially expose a plurality of shot regions on the substrate P. When a plurality of shot regions are arranged side by side in the second direction Y, the control device CONT sets the mask stage MST and the substrate stage PST in the second direction with respect to the projection unit PL and the illumination optical system IL. It may be moved relatively to Y.

Next, the mask M used in the exposure apparatus EX of the present embodiment will be described. FIG. 3A is a plan view of the mask assembly MA in which the mask adapter 10 of the present embodiment is attached to the mask M1 as viewed from above. FIG. 3B is a plan view of the mask M2, which is handled as a single unit in the exposure apparatus EX, as viewed from above. FIG. 4 is a perspective view showing a part of the mask adapter 10 of the present embodiment. FIG. 5 is a plan view of a part of the mask adapter 10 of the present embodiment as viewed from above.

The mask M is a glass plate-shaped member on which a pattern is formed. The mask M handled by the exposure apparatus EX of the present embodiment is the mask M1 handled in the state of the mask assembly MA to which the mask adapter 10 is attached as shown in FIG. 3A, and the mask M1 handled as a single unit as shown in FIG. 3B. Includes M2 and. The mask M1 is housed in the mask case C in the state of the mask assembly MA to which the mask adapter 10 is attached, is conveyed by the transfer device H2 in the state of the mask assembly MA, and is arranged in the mask stage MST. On the other hand, the mask M2 is housed in the mask case C as a single unit, is transported by the transport device H2 as a single unit, and is arranged in the mask stage MST.

As shown in FIG. 3A, the mask M1 is smaller than the mask M2 handled by itself. The dimensions of the mask M1 in the first direction X and the dimensions of the second direction Y are shorter than the dimensions of the mask M2 in the first direction X and the dimensions of the second direction Y. The mask assembly MA to which the mask adapter 10 is attached to the mask M1 has the same size as the mask M2 handled as a single unit. That is, the dimension of the mask assembly MA in the second direction Y is substantially equal to the dimension of the mask M2 in the second direction Y. That is, it can be said that the mask adapter 10 is a changing device that changes the size of the mask M1 in the second direction Y so as to be substantially equal to the size of the mask M2 in the second direction Y. Further, the dimension of the mask assembly MA in the first direction X is substantially equal to the dimension of the mask M2 in the first direction X. That is, it can be said that the mask adapter 10 is a changing device that changes the size of the mask M1 in the first direction X so as to be substantially equal to the size of the mask M2 in the first direction X. By attaching the mask adapter 10 to the mask M1 and making it the same size as the mask M2, it is possible to use the mask M1 smaller than the mask M2 in the exposure apparatus EX in which the mask M2 is used alone.

The mask M1 includes a third detected portion MB at the central portion of the first direction X at the outer edge portion on one side (+ Y side) of the second direction Y. In the present embodiment, the third detected unit MB is a barcode. The third detected portion MB is, for example, a sticker attached to the upper surface of the mask M1. The third detected unit MB contains information about the mask M1. The information about the mask M1 includes, for example, the flatness of the mask M1, the type of the pattern formed on the mask M1, the dimensional error of the mask M1, the weight error of the mask M1, the drawing error of the pattern formed on the mask M1, and the like. Even if the mask M1 is manufactured by the same manufacturing method, there are slight individual differences. The information about the mask M1 included in the third detected unit MB has the information of the individual difference of the mask M1.

In addition, in this specification, "the detected part contains information" includes that the detection part such as a reader can acquire the information by detecting the detected part by the detection part such as a reader. The reader capable of reading the detected unit is not particularly limited, and may be a reader provided in the exposure apparatus EX, or a second detection unit 26 provided in the mask adapter mounting tool 20 described later. It may be another leader. As described above, the reader may be a barcode reader or, for example, a camera (imaging device).

As shown in FIG. 3B, the mask M2 handled as a single unit also includes a detected portion M2a containing information about the mask M2. The detected portion M2a provided on the mask M2 is provided on a portion of the mask M2 closer to one side (+ X side) of the first direction X at the outer edge portion on one side (+ Y side) of the second direction Y. .. The detected portion M2a provided on the mask M2 is, for example, a barcode and a sticker attached to the mask M2. The information about the mask M2 includes the flatness of the mask M2, the type of the pattern formed on the mask M2, the drawing error of the pattern formed on the mask M2, and the like. The information about the mask M2 included in the detected portion M2a provided on the mask M2 differs depending on the individual difference of the mask M2.

Next, the mask adapter 10 of the present embodiment used in the exposure apparatus EX and attached to the mask M1 will be described. As shown in FIG. 3A, the mask adapter 10 is a frame-shaped member that surrounds the mask M1 to which the mask adapter 10 is attached in a plan view viewed along the vertical direction Z. In the present embodiment, the mask adapter 10 has a rectangular frame shape long in the first direction X. The outer shape of the mask adapter 10 is substantially the same in shape and size as the outer shape of the mask M2 handled as a single unit. The mask adapter 10 is configured so that the weight when the mask M1 is attached to the mask adapter 10 is substantially equal to the weight of the mask M2. The mask adapter 10 includes a frame portion (supported portion) 11, a first detected portion 13, a display device 12, a support portion 16, first positioning portions 14, 15 and a second positioning portion 17. Be prepared. The frame portion 11 and the support portion 16 form a main body portion of the mask adapter 10.

The frame portion 11 is a portion of the mask M1 that is attached to a portion outside the region where the pattern is formed and is supported by the mask stage MST. The frame portion 11 has a frame-like shape that surrounds the periphery of the mask M1. The frame portion 11 has a rectangular frame shape. The frame portion 11 includes a first side portion 11a, a second side portion 11b, a third side portion 11c, and a fourth side portion 11d. The first side portion 11a and the second side portion 11b extend in the first direction X and are arranged at intervals in the second direction Y. The first side portion 11a is located on one side (+ Y side) of the second side Y with respect to the second side portion 11b. The third side portion 11c and the fourth side portion 11d extend in the second direction Y and are arranged at intervals in the first direction X. The third side portion 11c is located on one side (+ X side) of the first direction X with respect to the fourth side portion 11d. The third side portion 11c connects one end of the first direction X in the first side portion 11a and one end of the first direction X in the second side portion 11b. The fourth side portion 11d connects the end portion of the first side portion 11a on the other side (−X side) of the first direction X and the end portion of the second side portion 11b on the other side of the first direction X. ..

The frame portion 11 includes a plurality of members (for example, four members of the first to fourth side portions 11a to 11d, a member in which the first side portion 11a and the third side portion 11c are connected, and a second side portion 11b. (Two members with a member to which the fourth side portion 11d is connected, etc.) may be mechanically connected, or an opening may be provided in the central portion from one plate to form an integrated configuration. ..

The frame portion 11 is formed with a plurality of cutout portions 11f that penetrate the frame portion 11 in the vertical direction Z. Two cutout portions 11f are provided at the inner edge portion of the first side portion 11a and the inner edge portion of the second side portion 11b at intervals in the first direction X. The notch portion 11f is open to the inside of the frame portion 11. In other words, the notch portion 11f is a portion in which the inside of the frame portion 11 is notched.
The cutout portion 11f is located outside the mask M1 when viewed along the vertical direction Z in a state where the mask M1 is attached to the mask adapter 10.

The first detected unit 13 is a portion in which information can be read by a reader. The first detected portion 13 is arranged on the upper surface (+ Z side surface) of the frame portion 11. More specifically, the first detected portion 13 is arranged in a portion of the outer edge portion of the first side portion 11a slightly closer to one side (+ X side) in the center of the first direction X. The positions of the first detected portion 13 are the position of the first window portion CC1 provided on the lid portion CA2 of the mask case C and the position of the first window portion CC1 and the first direction X when the mask assembly MA is placed in the mask case C. In a position where the positions of the second directions Y substantially overlap, that is, the mask assembly MA is placed in the mask case C and the lid portion CA2 is closed, the reader moves to the second detected portion via the first window portion CC1. It is a position where MBa can be read. That is, the first detection unit 13 is provided at a position that can be detected by the reader (first detection unit) of the exposure apparatus EX.

In the present embodiment, the first detected unit 13 is a barcode. That is, the first detected unit 13 can read the information by the barcode reader. The first detected portion 13 is, for example, a sticker attached to the upper surface of the frame portion 11.

The first detected unit 13 includes information about the mask adapter 10. The information regarding the mask adapter 10 is the control information necessary for controlling each unit in the exposure apparatus EX when the mask assembly MA, that is, the mask M1 to which the mask adapter 10 is attached is arranged in the exposure apparatus EX. Parameters) and various parameters of the mask adapter 10.
The control information includes information for controlling the movement of the mask stage MST in the exposure.
Specifically, the control information includes, for example, a control gain when moving the mask stage MST, a filter that compensates for each control parameter according to individual differences of the mask adapter 10, and the like. Various parameters of the mask adapter 10 include the rigidity of the mask adapter 10, the mass of the mask adapter 10, the dimensions of the mask adapter 10, the material of the mask adapter 10, and the like. The information about the mask adapter 10 included in the first detected unit 13 differs depending on the individual difference of the mask adapter 10.

The display device 12 is arranged on the upper surface (+ Z side surface) of the frame portion 11. More specifically, the display device 12 is arranged on a portion of the outer edge portion of the first side portion 11a closer to one side (+ X side) of the first direction X. The display device 12 is arranged adjacent to one side of the first direction X of the first detected unit 13.

The display device 12 includes a display unit 12a. The display unit 12a is made of, for example, electronic paper. Characters, marks, and the like based on the information input to the display device 12 are displayed on the display unit 12a. Information input, erasure, rewriting, and the like to the display device 12 are performed by the writing unit 27, which will be described later. For example, information can be input, erased, rewritten, or the like to the display device 12 only by the writing unit 27 corresponding to the display device 12.

The first detected unit 13 and the display unit 12a are arranged adjacent to each other in the first direction X. The display unit 12a displays the second detected unit MBa in a state where the mask adapter 10 is attached to the mask M1. As a result, the second detected portion MBa is provided on the frame portion 11 which is the supported portion, and the first detected portion 13 and the second detected portion MBa are arranged adjacent to each other. The second detected unit MBa is a display in which information can be read by a reader. In the present embodiment, the second detected unit MBa is an electronic barcode. That is, the second detected unit MBa can read the information by the barcode reader.

The second detected unit MBa contains information about the mask M1 attached to the mask adapter 10. The information about the mask M1 includes at least one of the flatness of the mask M1, the type of the pattern formed on the mask M1, the dimensional error of the mask M1, the weight error of the mask M1, and the drawing error of the pattern formed on the mask M1. include. The information about the mask M1 included in the second detected unit MBa differs depending on the individual difference of the mask M1 attached to the mask adapter 10.

The second detected unit MBa is a display unit based on the fact that the information contained in the third detected unit MB provided in the mask M1 is input to the display device 12 via a writer such as a writing unit 27 described later. It is displayed on 12a. That is, the display unit 12a displays the information provided on the mask M1 as the information related to the mask M1. In the present embodiment, the second detected portion MBa has the same mark as the third detected portion MB. That is, in the present embodiment, the display unit 12a displays the same mark as the third detected unit MB provided on the mask M1 as the second detected unit MBa.

The position of the second detected portion MBa displayed on the display unit 12a in the mask assembly MA is viewed along the vertical direction Z when the mask assembly MA and the mask M2 handled as a single unit are overlapped in the vertical direction Z. This is a position that overlaps with the detected portion M2a provided on the above-mentioned mask M2. That is, the relative position of the second detected portion MBa with respect to each part of the exposure apparatus EX when handling the mask assembly MA in the exposure apparatus EX is the mask M2 with respect to each portion of the exposure apparatus EX when handling the mask M2 in the exposure apparatus EX. It is almost the same as the relative position of the detected portion M2a.

Further, the position of the second detected portion MBa is the position and the first direction of the first window portion CC1 provided on the lid portion CA2 of the mask case C when the mask assembly MA is placed in the mask case C. The position where the positions of X and the second direction Y substantially overlap, that is, the mask assembly MA is placed in the mask case C, the lid portion CA2 is closed, and the reader is second-covered via the first window portion CC1. It is a position where the detection unit MBa can be read. That is, the second detection unit MBa is provided at a position that can be detected by the reader (first detection unit) of the exposure apparatus EX.

When a different mask M1 is used without being replaced with respect to the mask adapter 10, it is not necessary to input, erase, rewrite, etc. information to the display device 12, so that the mask adapter 10 is used instead of the display device 12. , A seal on which information about the mask M1 is printed may be provided, such as the first detected unit 13.

A plurality of support portions 16 are provided on each of the inner edge portion of the first side portion 11a and the inner edge portion of the second side portion 11b. A plurality of support portions 16 are arranged side by side at intervals along the first direction X on each side portion. Each support portion 16 projects from each side portion to the inside of the frame portion 11 along the second direction Y. The support portion 16 supports the mask M1 attached to the mask adapter 10 from below. As a result, the mask M1 attached to the mask adapter 10 is positioned in the vertical direction Z with respect to the mask adapter 10.

A pair of first positioning portions 14 are provided on the inner edge portion of the fourth side portion 11d at intervals in the second direction Y. The pair of first positioning portions 14 are provided at both ends of the inner edge portion of the fourth side portion 11d in the second direction Y, respectively. A pair of first positioning portions 15 are provided on the inner edge portion of the third side portion 11c at intervals in the second direction Y. The pair of first positioning portions 15 are provided at both ends of the inner edge portion of the third side portion 11c in the second direction Y, respectively. The first positioning unit 14 and the first positioning unit 15 sandwich the mask M1 attached to the mask adapter 10 in the first direction X, and position the mask M1 in the first direction X.

The first positioning portion 14 includes a protruding portion 14a protruding inward (+ X side) of the frame portion 11.
The protruding portion 14a comes into contact with the other side (−X side) edge portion of the mask M1 in the first direction X.
The first positioning portion 15 includes a main body portion 15a and an elastic portion 15b. Although not shown, the main body portion 15a is fixed to the frame portion 11 by screwing through an elongated hole extending in the first direction X. That is, the main body portion 15a can move in the first direction X within the range of the elongated hole before being screwed and fixed. The elastic portion 15b is connected to the main body portion 15a via an elastic hinge. The elastic portion 15b contacts the edge portion on one side (+ X side) of the first direction X in the mask M1. The elastic portion 15b applies an elastic force to the mask M1 in a direction in which the mask M1 is pressed against the first positioning portion 14. As a result, the mask M1 can be attached to the mask adapter 10 in a state where the elastic force in the first direction X is applied to the mask M1, and the position of the mask M1 in the first direction X with respect to the mask adapter 10 can be determined.

The mask M1 may be fixed to the mask adapter 10 by using a clamp component. Even in this case, the elastic portion 15b may apply an elastic force in the first direction X to the mask M1. As a result, the force acting on the mask M1 can be concentrated in the first direction X.

In this way, the first positioning unit 14 and the first positioning unit 15 fix the mask M1 to the mask adapter 10 from the first direction X. Since the mask assembly MA has a large size in the XY plane, when the mask assembly MA is placed on the mask stage MST, both ends of the mask assembly MA in the second direction Y are supported by the mask stage MST and in the YZ plane. The mask assembly MA is deformed (bent) so as to be convex downward. When the projection unit PL is composed of a plurality of projection optical systems as in the present embodiment, the control device CONT controls each projection optical system of the projection unit PL according to the deflection of the mask assembly MA. The substrate P can be exposed without being affected by the deflection of the mask assembly MA.

Even when the mask M2 is placed on the mask stage MST, the mask M2 is deformed (bent) so as to be convex downward as in the mask adapter 10. Therefore, regardless of whether the mask M2 is mounted on the mask stage MST or the mask assembly MA is mounted on the mask stage MST, the mask M bends so as to be convex downward in the YZ plane, so that control is performed. Each projection optical system of the projection unit PL can be controlled in the same manner by the apparatus CONT.

The first positioning portion 14 and the first positioning portion 15 are provided on the first side portion 11a and the second side portion 11b, respectively, so that the mask M1 is fixed to the mask adapter 10 from the second direction Y. May be good. In this case, when the mask assembly MA is placed on the mask stage MST, the mask M1 is deformed (bent) so as to be convex downward in the XZ plane. In this case, the control device CONT may move the substrate stage PST in the first direction X while adjusting the position in the vertical direction (Z direction) so as to follow the deformation of the mask M1 during the exposure. As a result, the control device CONT can maintain the position of the substrate P in the vertical direction Z at the focus position of the projection optical system of the projection unit PL during the exposure.

A pair of second positioning portions 17 are provided so as to sandwich the mask M1 in the second direction Y. Each of the pair of second positioning portions 17 is provided at the central portion of the first direction X at the inner edge portion of the first side portion 11a and the central portion of the first direction X at the inner edge portion of the second side portion 11b. There is. The pair of second positioning units 17 sandwich the mask M1 attached to the mask adapter 10 in the second direction Y, and position the mask M1 in the second direction Y. Although not shown, the second positioning portion 17 is fixed to the frame portion 11 by screwing through an elongated hole extending in the second direction Y. That is, the second positioning portion 17 can move in the second direction Y within the range of the elongated hole before being screwed and fixed.

The mask adapter 10 includes a recognized portion 18. The recognized portion 18 is a portion for identifying that the mask M (mask M1) is attached to the mask adapter 10 by each sensor provided in the exposure apparatus EX, which will be described later. In other words, the recognized portion 18 is a portion for identifying whether the mask assembly MA or the mask M2 not attached to the mask adapter 10 is used by each sensor. In the present embodiment, the recognized unit 18 includes a first recognized unit 18a and a second recognized unit 18b. The first recognized portion 18a and the second recognized portion 18b are provided on the outer edge portion of the first side portion 11a of the frame portion 11.

As shown in FIG. 4, the first recognized portion 18a is provided in the frame portion 11. More specifically, the first recognized portion 18a is embedded in the recess 11e provided in the first side portion 11a.
The recess 11e is recessed downward from the upper surface of the first side portion 11a and is open to the outside of the frame portion 11.
The first recognized portion 18a is fixed to the bottom surface of the recess 11e, for example, by screwing. The first recognized portion 18a includes a reflecting portion 18c that reflects light. In the present embodiment, the reflective portion 18c is a part of the upper surface of the first recognized portion 18a. The reflecting portion 18c is an inclined surface that is inclined toward the lower side toward the other side (−X side) of the first direction X. The reflecting unit 18c reflects the light SL emitted from the sensor (first sensor) S1 described later in a direction different from the direction in which the sensor S1 is located. In the present embodiment, the reflecting unit 18c reflects the light SL emitted from the upper side diagonally upward and inclined to the other side of the first direction X.

As shown in FIG. 5, the second recognized portion 18b is a penetrating portion that penetrates the mask adapter 10. In the present embodiment, the second recognized portion 18b is a through hole provided in the frame portion 11 and penetrating the first side portion 11a in the vertical direction Z. The second recognized portion 18b is, for example, an oval hole long in the first direction X. The second recognized portion 18b passes the optical SL emitted from the sensor (second sensor) S4 described later. That is, the second recognized portion 18b has a passing portion (second passing portion) through which the light SL emitted from the sensor S4 passes.

Next, a procedure for attaching the mask M1 to the mask adapter 10 will be described. In the present embodiment, the mask M1 is attached to the mask adapter 10 via the mask adapter attachment tool 20. FIG. 6 is a perspective view showing the mask adapter mounting tool 20 of the present embodiment in which the mask M1 is mounted on the mask adapter 10. FIG. 7 is a plan view of the mask adapter mounting tool 20 as viewed from above (+ Z side). FIG. 8 is a cross-sectional view showing the mask adapter mounting tool 20, and is a cross-sectional view taken along the line VIII-VIII in FIG.

In the present embodiment, the mask adapter mounting tool 20 is a tool for mounting the mask M1 on the mask adapter 10 and also a tool for removing the mask M1 from the mask adapter 10. In the present embodiment, the mask adapter mounting tool 20 moves the mask M1 vertically to the mask adapter 10 to attach the mask M1 to the mask adapter 10 and remove the mask M1 from the mask adapter 10. conduct.

As shown in FIGS. 6 to 8, the mask adapter mounting tool 20 includes a base portion 21, guide portions 22a, 22b, 22c, a movable portion 24, an elevating device 23, a pair of mask holding portions 25, and a second mask adapter mounting tool 20. A detection unit 26, a writing unit 27, and a third detection unit 28 are provided.
In FIGS. 6 and 8, the second detection unit 26, the writing unit 27, and the third detection unit 28 are not shown. Further, in FIG. 7, the base 21 and the elevating device 23 are not shown.

As shown in FIG. 6, the base portion 21 is an angular U-shape that opens to the other side (−X side) of the first direction X when viewed along the vertical direction Z. The base portion 21 includes pillar portions 21a, 21b, 21c and a plurality of foot portions 21d. The pillar portion 21a extends in the second direction Y. The pillar portion 21b extends from the end portion of the pillar portion 21a on the other side (−Y side) of the second direction Y to the other side (−X side) of the first direction X. The pillar portion 21c extends from one end (+ Y side) of the second direction Y of the pillar portion 21a to the other side of the first direction X. The plurality of foot portions 21d extend downward from the pillar portions 21a, 21b, 21c. The mask adapter mounting tool 20 is installed on the ground via a plurality of foot portions 21d.

As shown in FIG. 8, the carrier vehicle V equipped with the mask case C can enter the inside of the angular U-shaped base 21 from the opening on the other side (−X side) of the first direction X. .. The mask case C mounted on the transport vehicle V entering the inside of the base portion 21 has the lid portion CA2 removed, and the mask adapter 10 is housed inside.

As shown in FIG. 6, the guide portion 22a extends upward from the central portion of the pillar portion 21a in the second direction Y. The guide portion 22b extends upward from the other end (−X side) of the first direction X in the pillar portion 21b. The guide portion 22c extends upward from the other end of the pillar portion 21c in the first direction X.

The movable portion 24 has an angular U-shape that opens on the other side (−X side) of the first direction X when viewed along the vertical direction Z. The movable portion 24 is supported by the guide portions 22a, 22b, 22c and is arranged above the base portion 21. The movable portion 24 can move in the vertical direction Z along the guide portions 22a, 22b, 22c.

The movable portion 24 includes pillar portions 24a, 24b, 24c. The pillar portion 24a extends in the second direction Y. The central portion of the pillar portion 24a in the second direction Y is connected to the guide portion 22a. The pillar portion 24b extends from the end portion of the pillar portion 24a on the other side (−Y side) of the second direction Y to the other side (−X side) of the first direction X. The other end of the pillar portion 24b in the first direction X is connected to the guide portion 22b. The pillar portion 24c extends from the end portion of the pillar portion 24a on one side (+ Y side) of the second direction Y to the other side (−X side) of the first direction X. The other end of the pillar portion 24c in the first direction X is connected to the guide portion 22c. A rail portion 24d extending in the first direction X is provided on the upper surface of each of the pillar portion 24b and the pillar portion 24c.

The elevating device 23 is provided at the center of the pillar portion 21a in the second direction Y. The elevating device 23 is a device capable of moving the movable portion 24 in the vertical direction Z along the guide portions 22a, 22b, 22c. The elevating device 23 includes a handle portion 23a. The operator can move the movable portion 24 in the vertical direction Z by turning the handle portion 23a. The elevating device 23 moves the movable portion 24 in the vertical direction Z to move the mask M1 held by the mask holding portion 25 in the vertical direction Z.

The pair of mask holding portions 25 are attached to the movable portion 24 and can move in the vertical direction Z together with the movable portion 24. The pair of mask holding portions 25 are arranged at intervals in the first direction X. The pair of mask holding portions 25 are arranged symmetrically with each other in the first direction X, for example.

The pair of mask holding portions 25 includes a rail portion 25a, a pair of first slide portions 25e, a pair of second slide portions 25b, a pair of arm portions 25c, and a pair of hand portions 25d, respectively. The rail portion 25a extends in the second direction Y. Both ends of the rail portion 25a in the second direction Y are connected to each of the pillar portions 24b and 24c on the rail portions 24d via the pair of first slide portions 25e. The pair of first slide portions 25e move in the first direction X along the rail portion 24d, so that the rail portions 25a can move in the first direction X.

The pair of second slide portions 25b are arranged on the rail portion 25a along the second direction Y. The pair of second slide portions 25b can move in the second direction Y along the rail portions 25a. The pair of arm portions 25c extend downward from the side surface of the first direction X in each of the pair of second slide portions 25b. The pair of hand portions 25d are fixed to each of the lower end portions of the pair of arm portions 25c. The arm portion 25c and the hand portion 25d can move in the second direction Y via the second slide portion 25b.

The pair of hand portions 25d can approach each other from both sides of the second direction Y of the mask M1 and grip the edges of the mask M1 in the second direction Y. Since a pair of mask holding portions 25 are provided in the present embodiment, the mask M1 can be gripped and held by a total of four hand portions 25d. The mask M1 can be moved in the vertical direction Z by moving the movable portion 24 in the vertical direction Z by the elevating device 23 while the mask M1 is held by the pair of mask holding portions 25.

As shown in FIG. 7, the second detection unit 26 is attached to the pillar portion 24c. The second detection unit 26 projects from the pillar portion 24c to the other side (−Y side) in the second direction Y. The second detection unit 26 includes a detection main body unit 26a at the other end of the second direction Y. The detection main body portion 26a is located above the third detection portion MB of the mask M1 held by the mask adapter mounting tool 20. The detection main body unit 26a irradiates the third detected unit MB, which is a barcode, with light from above and reads the reflected light from the third detected unit MB to obtain information contained in the third detected unit MB. It is readable. As a result, the second detection unit 26 can read and detect the third detected unit MB including the information about the mask M1 provided on the mask M1. When the second detection unit 26 reads the third detected unit MB, the second detection unit 26 transmits the read information to the writing unit 27.

The writing portion 27 is attached to the pillar portion 24c. The writing unit 27 is arranged on one side (+ X side) of the first direction X of the second detection unit 26. The writing portion 27 projects from the pillar portion 24c to the other side (−Y side) of the second direction Y. The other end of the writing portion 27 in the second direction Y is located above the mask adapter 10 in the mask case C mounted on the transport vehicle V that has entered the inside of the base portion 21.

The writing unit 27 can transmit the information sent from the second detection unit 26 to the display device 12 provided in the mask adapter 10. As a result, the writing unit 27 causes the display unit 12a provided on the mask adapter 10 to display the second detected unit MBa including the information contained in the third detected unit MB. That is, the writing unit 27 causes the display unit 12a of the mask adapter 10 to display the second detected unit MBa based on the information detected (read) from the third detected unit MB by the second detecting unit 26. The writing unit 27 can also send a signal to the display device 12 to erase the display on the display unit 12a.

The third detection unit 28 is attached to the pillar portion 24b. The third detection unit 28 includes a stretching unit 28a, a first measuring unit 28b, and a second measuring unit 28c. The stretched portion 28a extends from the pillar portion 24b to one side (+ Y side) of the second direction Y. One end of the stretched portion 28a on one side in the second direction Y is located above the mask M1 held by the mask adapter mounting tool 20.

The first measuring section 28b and the second measuring section 28c are provided in the stretched section 28a. The first measuring unit 28b is located above the mask adapter 10 in the mask case C mounted on the transport vehicle V that has entered the inside of the base 21. The first measuring unit 28b can measure the position of the mask adapter 10 in the vertical direction Z. The second measuring unit 28c is located above the mask M1 held by the mask adapter mounting tool 20. The second measuring unit 28c can measure the position of the mask M1 in the vertical direction Z. The first measuring unit 28b and the second measuring unit 28c are, for example, laser displacement meters.

The third detection unit 28 is based on the position of the mask adapter 10 in the vertical direction Z measured by the first measurement unit 28b and the position of the mask adapter 10 in the vertical direction Z measured by the second measurement unit 28c. It is possible to detect whether or not the mask adapter 10 is attached to the mask M1.

Specifically, the third detection unit 28 calculates the relative position of the mask M1 and the mask adapter 10 in the vertical direction Z from the measurement result of the first measurement unit 28b and the measurement result of the second measurement unit 28c.
Here, the third detection unit 28 stores the relative position information in the vertical direction Z between the mask M1 and the mask adapter 10 in a state where the mask M1 is attached to the mask adapter 10. When the calculated relative position of the mask M1 is the same as the relative position of the mask M1 in the state of being attached to the mask adapter 10, the third detection unit 28 determines that the mask M1 is attached to the mask adapter 10.

On the other hand, when the calculated relative position of the mask M1 is higher than the relative position of the mask M1 in the state of being attached to the mask adapter 10, the third detection unit 28 has the mask M1 removed from the mask adapter 10. Judge. As a result, the third detection unit 28 can detect that the mask M1 is attached to the mask adapter 10 and that the mask M1 is removed from the mask adapter 10.

The third detection unit 28 determines that the mask M1 has been removed from the mask adapter 10 when the relative position of the mask M1 with respect to the mask adapter 10 changes upward. As a result, the third detection unit 28 can detect that the mask M1 has been removed from the mask adapter 10. The third detection unit 28 can transmit the detection result to the second detection unit 26 and the writing unit 27.

The operator attaches the mask M1 to the mask adapter 10 by using the mask adapter attachment tool 20 described above. First, the operator holds the mask M1 on the mask adapter mounting tool 20. The operator causes the mask M1 arranged on the lifter (not shown) to enter the inside of the base 21 together with the lifter, and raises the mask M1 to the position of the mask holding portion 25 in the vertical direction Z by the lifter. Next, the operator moves each hand portion 25d in the second direction Y, and causes each hand portion 25d to grip the outer edge portion of the mask M1 raised by the lifter. As a result, the operator can make the mask adapter mounting tool 20 hold the mask M1.

Next, the operator puts the lifter out of the base 21 and then causes the transport vehicle V on which the mask case C is mounted to enter the inside of the base 21 as shown in FIG. As described above, at this time, the lid portion CA2 of the mask case C is in a removed state, and the mask adapter 10 is arranged inside the mask case C. Therefore, the storage unit main body CA1 is open to the upper side, and the mask adapter 10 is exposed to the upper side through the opening of the storage unit main body CA1.

Next, the operator turns the handle portion 23a of the elevating device 23 to move the mask M1 together with the movable portion 24 and the mask holding portion 25 downward, and brings the mask M1 closer to the mask adapter 10 from above. As a result, the operator moves the mask M1 to a position where the mask M1 is supported from below by the support portion 16 of the mask adapter 10, and arranges the mask M1 inside the mask adapter 10. That is, the elevating device 23 lowers the mask M1 located above the mask adapter 10 and arranges the mask M1 inside the mask adapter 10 having a frame shape surrounding the mask M1 in a plan view. At this time, each hand portion 25d is inserted into the notch portion 11f provided in the mask adapter 10. Therefore, the mask M1 can be moved to a position where the mask adapter 10 is supported from the lower side by the support portion 16 without the hand portion 25d interfering with the mask adapter 10.

Next, the operator finely adjusts the position of the mask M1 in the first direction X and abuts it against the protruding portion 14a of the first positioning portion 14 of the mask adapter 10. As a result, the mask M1 is positioned in the first direction X with respect to the mask adapter 10. Then, the operator moves the main body portion 15a of the first positioning portion 15 in the first direction X along an elongated hole (not shown), and brings the elastic portion 15b into contact with the mask M1. Then, the operator fixes the main body portion 15a to the frame portion 11 by screwing. As a result, the mask M1 can be fixed to the mask adapter 10 in the first direction X.

Next, the operator moves the second positioning portion 17 in the second direction Y along a long hole (not shown) to bring it into contact with the mask M1, and fixes the second positioning portion 17 to the frame portion 11 by screwing. As a result, the mask M1 can be fixed to the mask adapter 10 in the second direction Y. As described above, the operator can attach the mask M1 to the mask adapter 10.

When the mask M1 is attached to the mask adapter 10, the third detection unit 28 detects that the mask M1 is attached to the mask adapter 10, and the detection result of the third detection unit 28 is transmitted to the second detection unit 26. .. The second detection unit 26, which has received the detection result from the third detection unit 28, reads the third detection unit MB of the mask M1 and transmits the read information to the writing unit 27. The writing unit 27, which has received the information obtained by reading the third detected unit MB from the second detection unit 26, transmits the information to the display device 12 of the mask adapter 10 and displays the second detected unit MBa on the display unit 12a. Let me.

Strictly speaking, in the third detection unit 28 of the present embodiment, when the mask M1 is supported from below by the support unit 16 and arranged inside the mask adapter 10, the mask M1 is attached to the mask adapter 10. The detection result is detected and the detection result is transmitted to the second detection unit 26. That is, in the present embodiment, for example, when the mask M1 is fixed to the mask adapter 10 by the first positioning units 14 and 15 and the second positioning unit 17 described above, the second detection unit 26 and the writing unit 27 By operating as described above, the display unit 12a displays the second detected unit MBa.

After the attachment of the mask M1 to the mask adapter 10 and the writing to the display unit 12a by the writing unit 27 are completed, the operator moves the hand unit 25d in the notch portion 11f in the second direction Y, and the hand unit Remove 25d from mask M1. Then, the operator turns the handle portion 23a of the elevating device 23 in the opposite direction to raise the movable portion 24 and the mask holding portion 25, and returns them to their original positions. After that, the operator puts out the transport vehicle V to the outside of the base portion 21 and attaches the lid portion CA2 to the storage portion main body CA1 of the mask case C.

The mask case C containing the mask assembly MA in which the mask M1 is attached to the mask adapter 10 is transported to the mask library LB of the exposure apparatus EX by the transport vehicle V, and is accommodated in the accommodating portion LBa by the transport device H1. At this time, the control device CONT of the exposure apparatus EX reads and stores the information of the mask M stored in the mask case C conveyed to the accommodating portion LBa.

Specifically, for example, the control device CONT detects the state of the mask M by reading a detected portion such as a mark through the first window portion CC1 by a reader (not shown) provided in the transport device H1. When the mask M is the mask M1 attached to the mask adapter 10, a reader (first detection unit) (not shown) provided in the transport device H1 is attached to the first detection unit 13 and the display unit 12a of the mask adapter 10. The displayed second detected unit MBa is read. As a result, the control device CONT identifies that the housed mask M is the mask M1 attached to the mask adapter 10, and the information about the mask adapter 10 included in the first detected unit 13 and the second cover. Information about the mask M1 included in the detection unit MBa is stored.

On the other hand, when the mask M is a mask M2 that is handled as a single unit, a reader (not shown) provided in the transport device H1 reads only the detected portion M2a provided in the mask M2. As a result, the control device CONT identifies that the stored mask M is a mask M2 that is not attached to the mask adapter 10, and stores information about the mask M2 included in the detected portion M2a of the mask M2. The control device CONT lists and stores the information of the mask M in the mask case C accommodated in each accommodating portion LBa of the mask library LB as described above.

Next, a procedure for exposing the substrate P in the exposure apparatus EX using the mask M1 attached to the mask adapter 10 will be described. FIG. 9 is a plan view showing a part of a procedure for exposing the substrate P in the exposure apparatus EX using the mask assembly MA, that is, the mask M1 attached to the mask adapter 10.

First, the control device CONT transports the mask M1 attached to the mask adapter 10 as the mask M used for the exposure of the next substrate P to the mask stage MST by the transport devices H1 and H2. The transport device H1 moves the mask case C in which the mask M1 to be used is housed from the inside of the storage section LBa to the uppermost portion of the transport device H1 by a mask case transport unit (not shown). At this time, the mask case transport unit moves the mask case C with the lid portion CA2 removed and left in the accommodating portion LBa.

The control device CONT is a mask M in the mask case C by a reader (not shown) provided in the transfer device H1 after the lid CA2 is removed by the mask case transfer unit of the transfer device H1 and before the mask case C is moved. The mask M is detected by reading the detected portion provided in the above. As a result, the control device CONT confirms whether or not the mask M to be conveyed is the mask M used for the next exposure of the substrate P. After confirming that the mask M to be transported is correct based on the information read by the reader, the control device CONT transports the mask case C in which the mask M is housed by the mask case transport unit of the transport device H1. Move to the top of H1.

The control device CONT lists and stores the information of the mask M when the mask case C is stored in the mask library LB. However, when the mask M to be used is conveyed as described above, the mask M is stored. By reading the detected portion of the above and confirming the mask M again, it is possible to suppress the transmission of the erroneous mask M to the exposed portion EP. When the control device CONT determines that the mask M to be transported is erroneous, the control device CONT controls the transport device H1 so as to return the mask M to the mask library LB.

The transport device H2 grips the mask M1 stored in the mask case C moved to the uppermost portion of the transport device H1 with the carrier H2b together with the mask adapter 10 as shown in FIG. 9, and takes out the mask M1 from the inside of the mask case C. .. As shown in FIG. 9, the carrier H2b includes a carrier main body portion H2c and a plurality of claw portions H2d protruding from the carrier main body portion H2c in the second direction Y. For example, two claw portions H2d are provided on both edges of the carrier main body portion H2c in the second direction Y, for a total of four. The carrier H2b grips the mask assembly MA to which the mask M1 is attached to the mask adapter 10 by sandwiching the mask assembly MA attached to the mask adapter 10 by the four claw portions H2d in the second direction Y. More specifically, the carrier H2b grips the mask adapter 10 by sandwiching it with the claw portion H2d. When transporting the single mask M2, the carrier H2b sandwiches and grips the mask M2 by the claw portion H2d.

Here, when the mask M is gripped by the carrier H2b, the control device CONT uses the sensors S1, S2, S3 provided on the carrier H2b, and the mask M gripped by the carrier H2b is attached to the mask adapter 10. It identifies whether it is the mask M1 or the mask M2 treated as a single unit. The sensors S1, S2, and S3 are sensors that are turned on when the emitted light is reflected by the mask adapter 10 or the mask M2 and receive the reflected light, and are turned off when the reflected light is not received. ..

The sensor S1 is provided on the carrier main body portion H2c at a position where the first recognized portion 18a provided at one end (+ Y side) of the second direction Y of the mask M can be identified. Although not shown, the sensor S1 includes an emission unit of the light SL and a light receiving unit capable of receiving the reflected light reflected by the light SL. As shown in FIG. 4, the sensor S1 is located above the first recognized portion 18a of the mask adapter 10 when the carrier H2b grips the mask assembly MA. The injection unit of the sensor S1 emits the optical SL to the first recognized unit 18a. More specifically, the sensor S1 emits light SL from above toward the reflecting portion 18c of the first recognized portion 18a. As described above, since the reflective portion 18c has an inclined surface that is inclined toward the lower side toward the other side (−X side) of the first direction X, the carrier H2b grips the mask assembly MA. In this case, the light SL emitted from the sensor S1 is reflected by the reflecting unit 18c in a direction different from the direction in which the sensor S1 is located. Therefore, the light receiving portion of the sensor S1 does not receive the light SL reflected from the first recognized portion 18a and is turned off.

As shown in FIG. 9, the sensors S2 and S3 are provided at both ends of the carrier main body portion H2c in the first direction X, respectively. Although not shown, the sensors S2 and S3 include an emission unit of the light SL and a light receiving unit that receives the reflected light reflected by the light SL, as in the sensor S1. The sensors S2 and S3 are located above the mask M1 when the carrier H2b grips the mask assembly MA. Each of the ejection portions of the sensors S2 and S3 emits the optical SL toward the mask M1 from above. The light SL emitted from the sensors S2 and S3 is reflected by the mask M1 and received by the light receiving portions of the sensors S2 and S3. Therefore, the sensors S2 and S3 are turned on.

In this way, when the carrier H2b grips the mask assembly MA, the sensors S1 are turned off and the sensors S2 and S3 are turned on. In this case, the control device CONT detects that the carrier H2b is holding the mask assembly MA, and identifies that the mask M being conveyed is the mask M1.

On the other hand, when the carrier H2b grips the mask M2 handled by itself, all of the sensors S1, S2, and S3 are turned on. Since the mask M2 does not have the reflecting portion 18c like the first recognized portion 18a, the light SL emitted toward the mask M2 is reflected by the mask M2 in the light receiving portion of the sensor S1 and the reflected light thereof. To receive light. As a result, the sensor S1 is turned on. In the sensors S2 and S3, the emitted light SL is reflected by the mask M2 and received by each of the sensors S2 and S3 in the same manner as when the carrier H2b grips the mask assembly MA. As a result, both the sensors S2 and S3 are turned on. When the sensors S1, S2, and S3 are turned on in this way, the control device CONT detects that the carrier H2b is holding the mask M2 handled by itself, and the mask M being conveyed is the mask M2. Identify that there is.

As described above, the first recognized portion 18a conveys the mask M2 to which the transfer device H2 is not attached to the mask adapter 10 to the mask stage MST by the sensor S1 provided in the transfer device H2 in the exposure apparatus EX. The exposure device EX is used to identify whether the transfer device H2 is transporting the mask adapter 10 to which the mask M1 is attached to the mask stage MST.

When the carrier H2b does not grip anything, the light SL emitted from the sensors S1, S2, S3 is not reflected anywhere, and the light receiving portion of each sensor S1, S2, S3 reflects the reflected light. Does not receive light. Therefore, the sensors S1, S2, and S3 are all turned off. In this case, the control device CONT detects that the carrier H2b is not gripping anything.

The control device CONT determines whether the mask M identified as described above matches the mask M used. When the mask M matches the mask M to be used, the control device CONT moves the carrier H2b along the carrier guide H2a and arranges the mask M on the mask stage MST. On the other hand, if the identified mask M does not match the mask M used, the mask M held by the carrier H2b is returned to the mask case C, and another mask M matching the mask M used is conveyed again. In the present description, the control device CONT determines that the mask M1 gripped by the carrier H2b matches the mask M used, and arranges the mask M1 on the mask stage MST in the state of the mask assembly MA attached to the mask adapter 10. .. The number of sensors included in the carrier H2b is not limited to three, and may be four or more.

FIG. 10 is a plan view of the mask stage MST in a state where the mask assembly MA is arranged, as viewed from above. FIG. 11 is a plan view of a part of the mask stage MST in a state where the mask assembly MA is arranged, as viewed from above.

As shown in FIG. 10, the mask stage MST has a rectangular frame shape, and the outer edge portion of the mask adapter 10 is supported from the lower side by the inner edge portion. That is, the mask stage MST supports the mask adapter 10 to which the mask M1 is attached via the frame portion 11 which is the supported portion. The mask stage MST attracts and holds the mask adapter 10. The method for supporting the mask adapter 10 of the mask stage MST is, for example, the method disclosed in International Publication No. 2017 / 038,788. The inner edge of the mask stage MST is provided with a penetrating portion PH that penetrates the mask stage MST in the vertical direction Z. When the mask assembly MA is placed on the mask stage MST by the carrier H2b, the claw portion H2d of the carrier H2b is inserted into the penetrating portion PH. Thereby, the mask assembly MA can be arranged on the mask stage MST by the carrier H2b without the claw portion H2d interfering with the mask stage MST.

As shown in FIGS. 5 and 11, the mask stage MST is provided with sensors S4 and S5. As shown in FIGS. 5 and 11, the sensors S4 and S5 include an emission unit of the light SL and a light receiving unit that receives the light reflected by the light SL, similarly to S1, S2 and S3. The sensors S4 and S5 are turned on when the light emitted from the emitting unit is reflected by the mask assembly MA or the mask M2 and the light receiving unit receives the reflected light, and are turned off when the light receiving unit does not receive the reflected light. It is a sensor.

As shown in FIG. 5, the sensor S4 includes an injection unit S4a that emits light SL on the upper side. In the state where the mask assembly MA is arranged on the mask stage MST, the injection portion S4a is located below the second recognized portion 18b which is a penetrating portion. The sensor S4 emits light from the ejection unit S4a to the second recognized portion 18b.

As shown in FIG. 11, the sensor S5 includes an injection unit S5a that emits light SL on the upper side.
In the state where the mask assembly MA is arranged on the mask stage MST, the injection portion S5a is located below the corner portion 11g of the frame portion 11 in the mask adapter 10.
When the mask M arranged on the mask stage MST is the mask M2 handled as a single unit, the injection portions S4a and S5a of the sensors S4 and S5 are located below the mask M2.

Here, when the mask M is arranged on the mask stage MST, the control device CONT uses the sensors S4 and S5 to handle the arranged mask M as the mask M1 to which the mask adapter 10 is attached or as a single unit. Identify the mask M2.

When the mask M arranged on the mask stage MST is the mask assembly MA in which the mask M1 is attached to the mask adapter 10, the optical SL emitted from the sensor S4 passes through the second recognized portion 18b which is a penetrating portion. do. Therefore, the light receiving portion of the sensor S4 does not receive the reflected light and is turned off. When the mask M arranged on the mask stage MST is the mask M1, the light SL emitted from the sensor S5 is reflected by the corner portion 11g of the mask adapter 10 and received by the sensor S5. Therefore, the sensor S5 is turned on. The control device CONT identifies that the mask assembly MA is arranged on the mask stage MST when the sensor S4 is turned off and the sensor S5 is turned on.

On the other hand, when the mask M2 treated as a single unit is arranged on the mask stage MST, the light SL emitted from the respective emission portions S4a and S5a of the sensors S4 and S5 is reflected by the mask M2 and each light receiving portion. Is received by. Therefore, both the sensor S4 and the sensor S5 are in the ON state. In this case, the control device CONT identifies that the mask M arranged on the mask stage MST is the mask M2 treated as a single unit.

As described above, in the second recognized portion 18b, the frame portion 11 of the mask adapter 10 to which the mask M1 is attached is supported by the mask stage MST by the sensor S4 provided on the mask stage MST, or the mask adapter 10 is used. It is used to identify whether the unattached mask M2 is supported by the mask stage MST.

When nothing is placed on the mask stage MST, the light SL emitted from the sensors S4 and S5 is not reflected anywhere, and the light receiving portion of each sensor S4 and S5 reflects the reflected light. Does not receive light. Therefore, the sensors S4 and S5 are both turned off. In this case, the control device CONT detects that nothing is placed on the mask stage MST.

The control device CONT determines whether the mask M identified as described above matches the mask M used. When the mask M matches the mask M to be used, the control device CONT controls the exposure unit EP to start the exposure of the substrate P. On the other hand, if the identified mask M does not match the mask M used, the mask M arranged in the mask stage MST is returned to the mask case C, and another mask M matching the mask M to be used is conveyed again. .. The control device CONT re-identifies whether the mask M used by the other mask M conveyed again matches the mask M, and repeats the operation until the matching is achieved. In the present description, the control device CONT determines that the mask M1 arranged on the mask stage MST matches the mask M used, and starts the exposure of the substrate P using the mask M1 attached to the mask adapter 10. ..

When the substrate P is exposed using the mask M1 attached to the mask adapter 10, the control device CONT moves the mask stage MST based on the information read from the first detected unit 13 and the second detected unit MBa. Is controlled to expose the substrate P.

In the present embodiment, the control device CONT changes the setting of the projection unit PL by using the information obtained from each detected unit and each recognized unit before the substrate P is exposed. In the following description, the information obtained from each detected unit and each recognized unit is referred to as "identification information". When the control device CONT identifies that the mask M mounted on the mask stage MST is the mask M1 attached to the mask adapter 10 based on the identification information, each projection optical system provided in the projection unit PL is identified. It controls each correction mechanism provided inside.

Specifically, the control device CONT controls each correction mechanism based on the information on the size and individual difference of the mask M when the mask M is supported by the mask stage MST among the identification information. Since the degree of bending of the mask M changes depending on the size of the mask M and individual differences, the control device CONT controls each correction mechanism according to the difference in the bending method due to the size of the mask M and individual differences.
The control device CONT may control the correction mechanism described above until the mask M is placed on the mask stage MST by the transfer devices H1 and H2. In this case, the exposure process of the substrate P can be performed immediately after the mask M is placed on the mask stage MST.

When the control device CONT detects that the exposure device EX exposes the substrate P by using the mask assembly MA, the control device CONT controls the illumination optical system IL, and when the substrate P is exposed, a plurality of components included in the projection unit PL. The exposure light EL is not supplied to the projection optical systems located at both ends of the second direction Y in the projection optical system. Here, when the pattern is not formed on the mask adapter 10 and the light from the illumination optical system IL is emitted toward the projection optical systems located at both ends of the second direction Y, the exposure light EL is projected. Before it enters the optical system, it is reflected by the mask adapter 10 and becomes noise light in the exposed portion EP, which may cause exposure failure. Therefore, the exposure light EL directed from the illumination optical system IL toward the projection optical systems located at both ends of the second direction Y by shielding a part of the exposure light EL emitted from the illumination optical system IL to the mask assembly MA, etc. By not supplying the light, it is possible to suppress the occurrence of poor exposure. In this case, the control device CONT does not change the correction mechanism for changing the focus position, shift amount, image plane tilt, etc. provided in the projection optical system located at both ends of the second direction Y. The projection optical system that does not supply the exposure light EL from the illumination optical system IL is not limited to the projection optical systems located at both ends of the second direction Y, depending on the size of the mask M1 attached to the mask adapter 10. , Determined as appropriate.

When the exposure using the mask M1 is completed, the control device CONT returns the mask assembly MA arranged in the mask stage MST into the original mask case C by the transport device H2, and puts the mask case C in which the mask assembly MA is housed. It is accommodated in the accommodating portion LBa of the mask library LB by the conveying device H1.

Next, a procedure for taking out the mask M1 attached to the mask adapter 10 from the exposure apparatus EX and removing the mask M1 from the mask adapter 10 will be described.
When the control device CONT receives the information about the mask case C taken out from the exposure device EX, the control device H1 loads the corresponding mask case C on the transport vehicle V. As a result, the mask case C can be taken out of the exposure apparatus EX by the transport vehicle V.
In the present description, the mask M housed in the removed mask case C is the mask M1 attached to the mask adapter 10.

The operator removes the lid CA2 of the mask case C taken out of the exposure apparatus EX by the transport vehicle V, and releases the fixing of the mask M1 to the mask adapter 10. Specifically, the operator removes the screws of the first positioning unit 15 and the second positioning unit 17 of the mask adapter 10 so that the first positioning unit 15 and the second positioning unit 17 are separated from the mask M1.

Next, the operator causes the transport vehicle V loaded with the mask case C from which the lid portion CA2 has been removed to enter the inside of the base portion 21 of the mask adapter mounting tool 20. Then, the operator turns the handle portion 23a of the elevating device 23 to move the movable portion 24 and the mask holding portion 25 downward, and causes the mask holding portion 25 to hold the mask M1 via the hand portion 25d. After holding the mask M1 in the mask holding portion 25, the operator turns the handle portion 23a in the reverse direction to move the mask M1 upward together with the movable portion 24 and the mask holding portion 25, and removes the mask M1 from the mask adapter 10.

Here, when the mask M1 is moved upward with respect to the mask adapter 10 and removed, the third detection unit 28 provided on the mask adapter mounting tool 20 is provided with the mask M1 from the mask adapter 10 as described above. It detects that it has been removed and sends the detection result to the writing unit 27. The writing unit 27 that has received the detection result sends a signal to the display device 12 of the mask adapter 10 and erases the second detected unit MBa displayed on the display unit 12a. In this way, when the writing unit 27 detects that the mask M1 has been removed from the mask adapter 10 by the third detecting unit 28, the writing unit 27 erases the display of the display unit 12a.

After moving the mask M1 upward and removing it from the mask adapter 10, the operator takes out the transport vehicle V to the outside of the base 21 and instead causes a lifter (not shown) to enter the inside of the base 21. Then, the operator raises the lifter to the height of the mask M1 and loads the mask M1 on the lifter. The operator moves the hand portion 25d in the second direction Y with the mask M1 arranged on the lifter, and removes the mask M1 from the mask holding portion 25. Then, the operator lowers the lifter on which the mask M1 is arranged and pulls it out from the inside of the base 21. After that, the worker transports the mask M1 to a predetermined storage place using a lifter.

When the mask M1 is used again in the exposure apparatus EX, the mask M1 is attached to the mask adapter 10 in the same manner as described above. At this time, if the mask M1 attached to the mask adapter 10 is another mask M1 different from the previously attached mask M1, the display unit 12a displays the second detected unit MBa different from the previous time. That is, when another mask M1 is attached to the mask adapter 10, the display unit 12a displays information about the other mask M1.

For example, the mask adapter 10 has individual differences due to manufacturing errors and the like. Therefore, parameters such as rigidity are different for each mask adapter 10, and bending on the mask stage MST and behavior when the mask stage MST is moved are different. As a result, even if the control information for using the mask M1 to which the mask adapter 10 is attached is input to the control device CONT in advance, the parameters of the mask adapter 10 vary due to individual differences, and the exposure accuracy deteriorates. was there. In particular, when the substrate P is a substrate for a flat panel display, the substrate P is relatively large, and the mask adapter 10 and the mask M1 are also relatively large. Therefore, even a slight manufacturing error or the like may cause a large change in the behavior of the mask M1 and the mask adapter 10 during exposure, resulting in a large decrease in exposure accuracy.

On the other hand, according to the present embodiment, the mask adapter 10 includes a first detected unit 13 including information about the mask adapter 10. Therefore, by reading the first detected unit 13 in the exposure apparatus EX, it is possible to perform exposure according to the individual difference of the mask adapter 10. Thereby, when the mask M1 attached to the mask adapter 10 is used, the exposure accuracy of the exposure apparatus EX can be improved.

Further, according to the present embodiment, the information regarding the mask adapter 10 included in the first detected unit 13 includes control information for controlling the movement of the mask stage MST in the exposure.
Therefore, for example, the mask stage MST holding the mask M1 attached to the mask adapter 10 can be suitably controlled and moved during exposure. Thereby, the exposure accuracy of the exposure apparatus EX can be further improved.

Further, according to the present embodiment, the information regarding the mask adapter 10 included in the first detected unit 13 includes the rigidity of the mask adapter 10. As a parameter of the mask adapter 10, the rigidity of the mask adapter 10 tends to particularly affect the movement control of the mask stage MST. Specifically, the mask stage MST should move almost straight in the first direction X during exposure, but if there is no information regarding the mask adapter 10, it meanders in the second direction Y or rotates in the θz direction. There is a possibility of moving to the first direction X while meandering. Therefore, since the information contained in the first detected unit 13 includes the rigidity of the mask adapter 10, the mask stage MST can be moved in the first direction X more accurately during exposure. Thereby, the exposure accuracy of the exposure apparatus EX can be further improved.

Further, according to the present embodiment, the first detected unit 13 is a barcode. Therefore, it is possible to easily read the first detected unit 13 by the exposure apparatus EX. Further, for example, by printing the first detected portion 13 on a sticker and attaching it to the mask adapter 10, the first detected portion 13 can be easily provided on the mask adapter 10.

Further, for example, similarly to the mask adapter 10, the parameters of the mask M also vary depending on individual differences. Therefore, the mask M is provided with a detected portion containing information about the mask M. When the control device CONT uses the mask M2 which is treated as a single unit as the mask M, the detection unit M2a provided on the mask M2 is read by a reader in the exposure device EX according to the individual difference of the mask M2. Adjust controls during exposure. However, the mask M1 attached to the mask adapter 10 is smaller than the mask M2 used alone.
Therefore, the third detected portion MB provided on the mask M1 attached to the mask adapter 10 has a different relative position from the detected portion M2a provided on the mask M2 used as a single unit with respect to each part of the exposure apparatus EX. It may not be possible to read or it may be difficult to read by the reader in the exposure apparatus EX.

On the other hand, according to the present embodiment, the mask adapter 10 includes a second detected portion MBa including information about the mask M1 attached to the mask adapter 10. Therefore, when the mask M1 attached to the mask adapter 10 is used by providing the second detected portion MBa at the same relative position as the detected portion M2a provided on the mask M2 used as a single unit. However, it is easy to read the second detected portion MBa by the same reader as the reader that reads the detected portion M2a of the mask M2 used alone. Therefore, the information about the mask M1 can be easily read.

Further, according to the present embodiment, the first detected unit 13 and the second detected unit MBa are arranged adjacent to each other. Therefore, it is easy to read both the first detected unit 13 and the second detected unit MBa by one reader provided in the exposure apparatus EX.

Further, according to the present embodiment, the information regarding the mask M1 includes the flatness of the mask M1, the type of the pattern formed on the mask M1, the dimensional error of the mask M1, the weight error of the mask M1, and the pattern formed on the mask M1. Includes at least one of the drawing errors of. Therefore, when the mask M1 attached to the mask adapter 10 is used, each unit in the exposure apparatus EX can be controlled more preferably. Thereby, the exposure accuracy of the exposure apparatus EX can be further improved.

Further, according to the present embodiment, the mask adapter 10 includes a display unit 12a on which the second detected unit MBa is displayed, and the display unit 12a is different when another different mask M1 is attached to the mask adapter 10. Information about the mask M1 of the above is displayed. Therefore, for each mask M1 attached to the mask adapter 10, the second detected unit MBa corresponding to each mask M1 can be displayed on the display unit 12a. This allows the mask adapter 10 to be used for a plurality of different masks M1.

Further, according to the present embodiment, the display unit 12a displays the information provided on the mask M1 (third detected unit MB) as information related to the mask M1. Therefore, information about the mask M1 attached to the mask adapter 10 can be suitably displayed on the display unit 12a.

Further, according to the present embodiment, the second detected unit MBa is an electronic barcode. Therefore, it is possible to easily read the second detected portion MBa by the exposure apparatus EX. In addition, information can be easily written and displayed on the display unit 12a.

Further, for example, when the control device CONT of the exposure device EX erroneously recognizes the mask M1 attached to the mask adapter 10 and the mask M2 handled as a single unit, the control during exposure becomes inappropriate control. Therefore, the substrate P may not be exposed normally, or the exposure accuracy may be significantly reduced.

On the other hand, according to the present embodiment, the mask adapter 10 includes a recognized portion 18 for identifying that the mask M is attached to the mask adapter 10 by a sensor provided in the exposure apparatus EX. Therefore, the control device CONT of the exposure device EX can easily identify that the mask M is attached to the mask adapter 10 by identifying the recognized portion 18 by the sensor. As a result, when the mask M1 attached to the mask adapter 10 is used, it is possible to prevent the control device CONT from erroneously recognizing that the mask M2 is not attached to the mask adapter 10. Therefore, the control during exposure can be appropriately performed, and the exposure accuracy by the exposure apparatus EX can be improved.

Further, according to the present embodiment, the mask adapter 10 transports the mask M2 to which the transport device H2 is not attached to the mask adapter 10 to the mask stage MST by the sensor S1 provided in the transport device H2 in the exposure device EX. The exposure device EX is provided with a first recognized unit 18a for identifying whether the transfer device H2 is transporting the mask adapter 10 to which the mask M1 is attached to the mask stage MST. Therefore, it can be identified that the mask M is attached to the mask adapter 10 before the mask M is placed on the mask stage MST.

Further, according to the present embodiment, the first recognized portion 18a includes the reflecting portion 18c, and the reflecting portion 18c is the direction in which the sensor S1 positions the light SL emitted from the sensor S1 which is the first sensor. It reflects in different directions. Therefore, the control device CONT can identify that the mask M is attached to the mask adapter 10 by not receiving the reflected light SL from the sensor S1.

Further, according to the present embodiment, in the mask adapter 10, the frame portion 11 of the mask adapter 10 to which the mask M1 is attached is supported by the mask stage MST by the sensor S4 provided in the mask stage MST, or the mask adapter 10 is used. A second recognized portion 18b for identifying whether the mask M2 not attached to the mask M2 is supported by the mask stage MST is provided. Therefore, when the mask M is placed on the mask stage MST, it can be identified that the mask M is attached to the mask adapter 10.

Further, according to the present embodiment, the second recognized portion 18b has a passing portion (second passing portion) through which the light SL emitted from the sensor S4 passes. Therefore, the control device CONT can identify that the mask adapter 10 is attached to the mask M by not reflecting the light SL emitted from the sensor S4 and not receiving light from the sensor S4. In the present embodiment, the second recognized portion 18b is composed of a passing portion (second passing portion).

Further, according to the present embodiment, the passing portion (second passing portion) of the second recognized portion 18b is a through hole provided in the frame portion 11. Therefore, by punching a part of the mask adapter 10 by, for example, press working, the passing portion of the second recognized portion 18b can be easily formed. This makes it possible to easily manufacture the mask adapter 10.

Further, according to the present embodiment, when the mask M is gripped by the carrier H2b using the first recognized portion 18a and the second recognized portion 18b, respectively, and when the mask M is arranged on the mask stage MST. Twice to identify the state of the mask M. If the erroneous mask M is conveyed when identifying the state of at least one of the two masks M, the control device CONT stops the transfer of the mask M. Therefore, it is possible to further suppress the exposure of the substrate P using the wrong mask M.

Further, according to the present embodiment, the frame portion 11 has a frame-like shape surrounding the periphery of the mask M1 attached to the mask adapter 10. Therefore, the outer shape of the mask M1 can be made larger than the outer shape of the mask M1 as the mask assembly MA attached to the mask adapter 10. Thereby, by handling as a mask assembly MA to which the mask adapter 10 is attached, the mask M1 smaller than the mask M2 can be handled in the exposure apparatus EX in which the mask M2 is used alone. Therefore, since the size of the mask M used in the exposure apparatus EX can be reduced, the cost of preparing the mask M can be reduced. Further, the mask M1 used in the exposure apparatus EX for the mask M1 can also be used in the exposure apparatus EX for the mask M2 by using the mask adapter 10. As a result, when performing a test exposure with the exposure apparatus EX for the mask M2, the test exposure can be performed without having to bother to make the mask M2.

Further, for example, when the information contained in the second detected unit MBa displayed on the display unit 12a of the mask adapter 10 is the information of the mask M1 different from the mask M1 attached to the mask adapter 10, the inside of the exposure apparatus EX. The information read by the reader becomes inappropriate information, and the control during exposure becomes inappropriate control. Therefore, the exposure accuracy of the exposure apparatus EX may decrease.

On the other hand, according to the present embodiment, the mask adapter mounting tool 20 for mounting the mask M1 to the mask adapter 10 has the mask adapter 10 a second detected portion MBa containing information about the mask M1 attached to the mask adapter 10. The writing unit 27 to be displayed on the display unit 12a provided in the above is provided. Therefore, when the mask M1 is attached to the mask adapter 10, the information of the mask M1 can be written to the display unit 12a of the mask adapter 10 as the second detected unit MBa. As a result, by attaching the mask M1 to the mask adapter 10 using the mask adapter attaching tool 20, it is possible to prevent the information of the different mask M1 from being written on the display unit 12a of the mask adapter 10. Therefore, it is possible to prevent the information read by the reader in the exposure apparatus EX from becoming inappropriate information, and it is possible to improve the exposure accuracy of the exposure apparatus EX.

Further, according to the present embodiment, the mask adapter mounting tool 20 includes a second detection unit 26 that detects a third detection unit MB including information about the mask M1 provided on the mask M1, and the writing unit 27 includes a writing unit 27. The display unit 12a displays the second detected unit MBa based on the information detected from the third detected unit MB by the second detection unit 26. Therefore, it is possible to prevent the writing unit 27 from writing erroneous information on the mask M1 to the display unit 12a, and to cause the display unit 12a of the mask adapter 10 to display an appropriate second detected unit MBa. As a result, it is possible to further suppress that the information read by the reader in the exposure apparatus EX becomes inappropriate information, and it is possible to further improve the exposure accuracy of the exposure apparatus EX.

Further, for example, if the second detected unit MBa displayed on the display unit 12a of the mask adapter 10 is forgotten to be erased after the mask M1 is removed from the mask adapter 10, the second detected unit MBa remains displayed. When a different mask M1 is attached to the mask adapter 10 of the above, there is a possibility that the information of the display unit 12a will not be overwritten. Therefore, there is a possibility that the second detected unit MBa different from the second detected unit MBa of the mask M1 attached to the mask adapter 10 may remain displayed on the display unit 12a.

On the other hand, according to the present embodiment, the mask adapter mounting tool 20 is also a tool for removing the mask M1 from the mask adapter 10, and the third detection for detecting that the mask M1 has been removed from the mask adapter 10. A unit 28 is provided. Then, when the writing unit 27 detects that the mask M1 has been removed from the mask adapter 10 by the third detecting unit 28, the writing unit 27 erases the display of the display unit 12a. Therefore, when the mask M1 is removed from the mask adapter 10, it is possible to prevent the second detected unit MBa displayed on the display unit 12a from being forgotten to be erased. Therefore, it is possible to prevent the display unit 12a from displaying the second detected unit MBa for the different mask M1. As a result, it is possible to further suppress that the information read by the reader in the exposure apparatus EX becomes inappropriate information, and it is possible to further improve the exposure accuracy of the exposure apparatus EX.

Further, according to the present embodiment, the mask adapter mounting tool 20 includes an elevating device 23 for moving the mask M1 in the vertical direction Z, and the elevating device 23 lowers the mask M1 located above the mask adapter 10. The mask M1 is arranged inside the mask adapter 10 having a frame shape surrounding the mask M1 in a plan view. Therefore, the mask M1 that is smaller than the mask adapter 10 can be moved to attach the mask M1 to the mask adapter 10. Therefore, it is easier to attach the mask M1 to the mask adapter 10 than when the mask adapter 10 is moved and attached to the mask M1.

The embodiment of the present invention is not limited to the above-described embodiment, and the following configurations may be adopted.
The first detected unit is not particularly limited as long as the information can be read by the reader and includes information about the mask adapter. The second detected unit is not particularly limited as long as the information can be read by the reader, includes information about the mask attached to the mask adapter, and can be displayed on the display unit. The third detected unit is not particularly limited as long as the information can be read by the reader and includes information about the mask.

The first detected unit, the second detected unit, and the third detected unit may be a one-dimensional code such as the above-mentioned barcode, a two-dimensional code, characters, numbers, or the like. May be. Further, the first detected unit and the third detected unit may be an IC chip or the like. The information contained in the second detected unit and the information contained in the third detected unit may be different from each other as long as they include information related to the mask. In this case, for example, the writing unit of the mask adapter mounting tool may display only a part of the information about the mask read from the third detected unit on the display unit as the second detected unit.

The information regarding the mask adapter included in the first detected unit may be at least one or more. The information regarding the mask included in the second detected portion may be at least one or more. At least one piece of information about the mask included in the third detected portion may be used. The information about the mask may include control information for controlling the mask in the exposure apparatus. The first detected portion may not be provided.

The recognized portion is not particularly limited as long as it is a portion used for identifying that the mask adapter is attached to the mask. The recognized portion may be a portion that absorbs light. Specifically, the first recognized portion 18a of the above-described embodiment has a horizontal surface in the first direction X and the second direction Y instead of a slope such as the reflective portion 18c, and reflects on the horizontal surface. It may be configured to be provided with a preventive film. Further, the first recognized portion 18a may include a passing portion (first passing portion) through which the light SL emitted from the sensor S1 passes. In this case, since the optical SL of the sensor S1 passes through the passing portion of the first recognized portion 18a, the sensor S1 is turned off. Thereby, it can be identified that the transport device H2 is transporting the mask adapter 10 to which the mask M1 is attached to the mask stage MST. The passing portion (first passing portion) of the first recognized portion 18a may be a through hole penetrating the mask adapter 10 in the vertical direction Z as in the second recognized portion 18b, or may be a notch. May be good. That is, the first recognized portion 18a is not particularly limited as long as the optical SL emitted from the sensor S1 is not incident on the light receiving portion of the sensor S1.

Further, the second recognized portion 18b of the above-described embodiment may not be a through hole or may be a notch. Further, the second recognized portion 18b may have a slope like the first recognized portion 18a, or a surface provided with an antireflection film horizontally in the first direction X and the second direction Y. May have. That is, the second recognized portion 18b is not particularly limited as long as the optical SL emitted from the sensor S2 is not incident on the light receiving portion of the sensor S2. The recognized portion may not be provided. The display unit is not particularly limited as long as it can display the second detected unit. The display unit may be a liquid crystal display or an organic electroluminescence display. The display unit may not be provided. Instead of the display unit, a sticker on which the second detected unit MBa is printed may be provided.

In the above-described embodiment, the mask adapter 10 has been described as a frame-shaped member surrounding the four sides around the mask M1, but the present invention is not limited to this. The mask adapter may be U-shaped so as to surround three sides around the mask. The U-shaped mask adapter that surrounds the three sides around the mask is, for example, a mask adapter in the mask adapter 10 of the above-described embodiment in which either the third side portion 11c or the fourth side portion 11d is absent. Is. Further, the mask adapter is formed in the state where both the third side portion 11c and the fourth side portion 11d are absent in the mask adapter 10 of the above-described embodiment, that is, only the first side portion 11a and the second side portion 11b. It may have a different configuration. In this case, the exposure apparatus may have a sensor for measuring the position of the mask in the first direction X with respect to the mask adapter. By using the sensor, the position of the mask with respect to the mask adapter in the first direction X can be suitably adjusted.

Further, the mask adapter may be formed by only one of the first side portion 11a and the second side portion 11b in the mask adapter 10 of the above-described embodiment. In this case, the mask stage supports the mask on one side of the second direction Y of the mask assembly and supports the mask adapter on the other side of the second direction Y.

In the mask assembly, there are cases where the mask adapter parts are provided on both sides of the second direction Y of the mask and cases where the mask adapter parts are provided only on either side of the second direction Y of the mask. The bending shape of the mask assembly in the YZ plane is different when the is placed on the mask stage. As described above, the control device may control each projection optical system based on this bending shape.

Further, when the exposure apparatus includes a mask stage that supports both ends of the first direction X of the mask assembly, the mask adapter is based only on the third side portion 11c and the fourth side portion 11d of the mask adapter 10 of the above-described embodiment. It may be configured, or it may be configured by only one of the third side portion 11c and the fourth side portion 11d.

As described above, if the mask adapter is a device capable of changing the dimensions of the mask M1 so that the mask assembly can be supported by the mask stage in the same manner as when the mask M2 handled by itself is supported by the mask stage. , Not particularly limited.

The identification information may include information for identifying the orientation of the mask. Like the mask assembly MA shown in FIG. 3A and the like, the mask assembly has different dimensions in the first direction X and the second direction Y, for example. In such a case, the identification information is placed on the mask stage so that the long side of the mask assembly is parallel to the first direction X (the short side is parallel to the second direction Y), or the long side is the second. It may contain information that identifies whether it is placed on the mask stage so that it is parallel to the direction Y (the short side is parallel to the first direction X).

Specifically, in the above-described embodiment, the control device CONT may detect the orientation when the mask assembly MA is arranged on the mask stage MST by using the sensor S4 and the sensor S5. Unlike the case shown in FIG. 10, when the long side of the mask assembly MA is arranged parallel to the second direction Y, the light from the injection portion S5a of the sensor S5 is not irradiated to the mask assembly MA and is not reflected. Therefore, the light receiving portion of the sensor S5 does not receive light, and the sensor S5 is turned off. On the other hand, the light from the ejection portion S4a of the sensor S4 is reflected by the mask adapter 10, and the light receiving portion of the sensor S4 receives the reflected light. Therefore, the sensor S4 is turned on. When the long side of the mask assembly MA is arranged parallel to the first direction X, that is, as shown in FIG. 10, the sensor S5 is in the ON state and the sensor S4 is in the OFF state. The control device CONT can detect the orientation of the mask assembly MA mounted on the mask stage MST from the respective states of the sensor S4 and the sensor S5. In this case, the control device CONT may detect that the mask assembly MA is arranged on the mask stage MST until the mask M is arranged on the mask stage MST.

Further, the portion supported by the mask stage MST in the mask assembly MA differs depending on the orientation when the mask stage MST is arranged. In this case, for example, the mask stage MST may be configured as disclosed in Japanese Patent Publication No. 5,626,206 to change the position of the mask stage MST in the second direction Y. Further, the amount of deflection of the mask assembly MA in the YZ plane differs depending on the orientation when the mask assembly MA is arranged on the mask stage MST. The control device CONT controls each part of each projection optical system in the projection unit PL based on the difference in the amount of deflection depending on the orientation in which the mask assembly MA is arranged, and the number of projection optical systems that block light and each projection optical system. It is advisable to control the focus position, shift amount, and the like.

Further, the identification information may include information for specifying the direction in which the mask M1 is attached to the mask adapter 10. Based on this identification information, the control device CONT may adjust each projection optical system of the projection unit PL before exposure, or may adjust the position of the substrate stage PST during exposure.

The mask adapter mounting tool is not particularly limited as long as it is a tool used to mount the mask on the mask adapter. The mask adapter mounting tool does not have to be the tool used to remove the mask from the mask adapter. The mask adapter mounting tool may have a portion that is manually moved by an operator as in the above-described embodiment, or may perform mounting work fully automatically. The mask adapter mounting tool may mount the mask on the mask adapter by moving the mask adapter. The mask adapter mounting tool may remove the mask from the mask adapter by moving the mask adapter.

The reading unit may be a handy scanner or the like separated from the mask adapter mounting tool. The reading unit may not be provided. The detection unit provided in the mask adapter mounting tool may be capable of detecting, for example, that the mask is fixed to the mask adapter by the first positioning unit and the second positioning unit described above. The detection unit may not be provided.

Further, the control device CONT may send each identification information to a device outside the exposure device EX, for example, a coater that applies a resist to the substrate P, a developer that develops the substrate P exposed by the exposure device EX, and the like. .. The coater may change the type of resist to be coated on the substrate P, the coating amount, the thickness, and the like based on each identification information received from the exposure apparatus EX.
Further, the developer may appropriately change the developing method, the cleaning method of the substrate P, and the like based on each identification information.

The projection optical system provided in the projection unit PL may be a 1x magnification system, a reduction system, or an expansion system.

The exposure device EX of the above-described embodiment may be a step-and-scan type projection exposure device, that is, a so-called scanner, or a stepper type exposure device having a projection area having substantially the same size as the exposure target area. good. The exposure apparatus EX may be an exposure apparatus for a liquid crystal display that transfers a liquid crystal display element pattern onto a square glass plate, and can also be applied to, for example, an exposure apparatus for manufacturing an organic EL (Electro-Lumisensence) panel. Further, the exposure apparatus EX of the above-described embodiment manufactures not only microdevices such as semiconductor elements, but also masks or reticle used in optical exposure apparatus, EUV exposure apparatus, X-ray exposure apparatus, electron beam exposure apparatus and the like. Therefore, it can also be applied to an exposure apparatus that transfers a circuit pattern to a glass substrate, a silicon wafer, or the like.

Further, the substrate P to be exposed in the above-mentioned exposure apparatus EX is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or mask blanks. Further, when the object to be exposed is the substrate P for a flat panel display as in the above-described embodiment, the thickness of the substrate P is not particularly limited. The substrate P may be, for example, a film (a flexible sheet-like member). The exposure apparatus EX of the above-described embodiment is particularly effective when the substrate P having a side length or a diagonal length of 500 mm or more is an exposure target. Further, when the substrate P to be exposed is in the form of a flexible sheet, the sheet-like substrate P may be formed in a roll shape.

For electronic devices such as liquid crystal display elements (or semiconductor elements), a step of designing the function and performance of the device, a step of manufacturing a mask (or reticle) based on this design step, and a step of manufacturing a glass substrate (or wafer). Except for the etching apparatus of each of the above-described embodiments, the lithography step of transferring the mask (reticle) pattern to the glass substrate by the exposure method, the developing step of developing the exposed glass substrate, and the portion where the resist remains. It is manufactured through an etching step of removing exposed members by etching, a resist removing step of removing a resist that is no longer needed after etching, a device assembly step, an inspection step, and the like. In this case, in the lithography step, the above-mentioned exposure method is executed using the exposure apparatus of the above embodiment, and the device pattern is formed on the glass substrate, so that a device having a high degree of integration can be manufactured with high productivity. ..

It should be noted that the above configurations and methods described in the present specification can be appropriately combined within a range that does not contradict each other.

10 ... Mask adapter, 11 ... Frame part (supported part), 12a ... Display part, 13 ... First detected part, 16 ... Support part, 18a ... First recognized part, 18b ... Second recognized part, 18c ... Reflector, 20 ... Mask adapter mounting tool, 23 ... Elevating device, 26 ... Second detection unit, 27 ... Writing unit, 28 ... Third detection unit, EX ... Exposure device, H2 ... Conveyor device, M, M1, M2 ... Mask, MB ... 3rd detected part, MBa ... 2nd detected part, MST ... Mask stage (stage), P ... Board, S1 ... Sensor (1st sensor), S4 ... Sensor (2nd sensor), Z …vertical direction

Claims (36)

A mask adapter used in an exposure apparatus that illuminates a mask supported by a stage and exposes a pattern formed on the mask onto a substrate, and is attached to the mask.
A main body portion having a support portion that supports the mask outside the region where the pattern is formed, and a supported portion that is supported by the stage.
A first detection unit on the main body unit, which can be detected by the detection unit of the exposure apparatus, is provided.
The first detected unit is a mask adapter containing information about the mask adapter. The mask adapter according to claim 1, wherein the information regarding the mask adapter includes control information for controlling the movement of the stage supporting the mask adapter to which the mask is attached in the exposure. The mask adapter according to claim 1 or 2, wherein the information regarding the mask adapter includes the rigidity of the mask adapter. The mask adapter according to any one of claims 1 to 3, wherein the first detected unit is a barcode. A mask adapter used in an exposure apparatus that illuminates a mask supported by a stage and exposes a pattern formed on the mask onto a substrate, and is attached to the mask.
A main body portion having a mounting portion of the mask to be mounted outside the region where the pattern is formed, and a supported portion supported by the stage.
A second detected portion, which is on the main body portion and can be detected by the detection unit of the exposure apparatus, is provided.
The second detected portion is a mask adapter containing information about the mask attached to the mask adapter. A second detection unit that is on the main body and can be detected by the detection unit of the exposure apparatus is provided.
The mask adapter according to any one of claims 1 to 4, wherein the second detected unit includes information about the mask attached to the mask adapter. The mask adapter according to claim 6, wherein the first detected portion and the second detected portion are arranged adjacent to each other. The information about the mask includes at least one of the flatness of the mask, the type of pattern formed on the mask, the dimensional error of the mask, the weight error of the mask, and the drawing error of the pattern formed on the mask. The mask adapter according to any one of claims 5 to 7, including the mask adapter according to any one of claims 5 to 7. The mask adapter according to any one of claims 5 to 8, further comprising a display unit that displays the second detected unit in a changeable manner. The mask adapter according to claim 9, wherein the display unit displays information about the mask possessed by the mask. The mask adapter according to claim 9 or 10, wherein the second detected unit is an electronic barcode. The mask adapter according to any one of claims 8 to 11, wherein the display unit displays information about the mask of the other mask when another mask different from the mask is attached to the mask adapter. .. A mask adapter used in an exposure apparatus that illuminates a mask supported by a stage and exposes a pattern formed on the mask onto a substrate, and is attached to the mask.
A main body portion having a mounting portion of the mask to be mounted outside the region where the pattern is formed, and a supported portion supported by the stage.
The exposure device indicates that the mask adapter to which the mask is attached is transported to the stage by a transport device capable of transporting the mask adapter to which the mask is attached and another mask different from the mask. A mask adapter comprising a first recognized portion for recognition using the first sensor. The exposure device first sensor indicates that the mask adapter to which the mask is attached has been transported to the stage by a transport device capable of transporting the mask adapter to which the mask is attached and another mask, respectively. The mask adapter according to any one of claims 1 to 12, further comprising a first recognized portion for recognition using the above. The first recognized portion is provided on the main body portion and includes a reflecting portion that reflects light emitted from the first sensor.
The mask adapter according to claim 13 or 14, wherein the reflecting unit reflects light emitted from the first sensor in a direction different from the direction in which the first sensor is located. The mask adapter according to claim 13, wherein the first recognized portion has a first passing portion through which light emitted from the first sensor passes. The mask adapter according to any one of claims 13 to 16, wherein the first recognized portion is detected by the first sensor provided in the transport device of the exposure device. A mask adapter used in an exposure apparatus that illuminates a mask supported by a stage and exposes a pattern formed on the mask onto a substrate, and is attached to the mask.
A main body portion having a mounting portion of the mask to be mounted outside the region where the pattern is formed, and a supported portion supported by the stage.
Because the exposure device uses the second sensor to recognize that the mask adapter is supported on the stage that can support the mask adapter to which the mask is attached and another mask different from the mask. A mask adapter comprising a second recognized portion of. A second cover for the exposure apparatus to recognize that the mask adapter is supported on the stage capable of supporting the mask adapter to which the mask is attached and another mask, respectively, by using the second sensor. The mask adapter according to any one of claims 1 to 17, comprising a recognition unit. The mask adapter according to claim 18 or 19, wherein the second recognized portion has a second passing portion through which light emitted from the second sensor passes. The mask adapter according to claim 20, wherein the second passing portion is a through hole provided in the main body portion. The mask adapter according to any one of claims 18 to 21, wherein the second recognized portion is detected by the second sensor provided on the stage. The mask adapter according to any one of claims 1 to 22, wherein the main body portion has a frame-like shape surrounding the mask. An illumination optical system that illuminates the mask attached to the mask adapter according to any one of claims 1 to 23.
An exposure device including a projection optical system that projects a pattern of the mask illuminated by the illumination optical system onto the substrate. The substrate is exposed by the exposure apparatus according to claim 24, and
To develop the exposed substrate and
Device manufacturing methods, including. Illuminating the mask attached to the mask adapter according to any one of claims 1 to 23.
To expose the substrate by projecting an illuminated image of the mask pattern onto the substrate.
To develop the exposed substrate and
Device manufacturing methods, including. A mask adapter mounting tool for mounting the mask on the mask adapter according to any one of claims 1 to 23. A mask adapter mounting tool that attaches the mask to a mask adapter used in an exposure apparatus that exposes a pattern formed on a mask onto a substrate.
A mask adapter mounting tool comprising a writing unit for displaying a second detected unit containing information about the mask attached to the mask adapter on a display unit provided on the mask adapter. A second detection unit for detecting a third detection unit including information about the mask provided on the mask is provided.
The mask adapter mounting tool according to claim 28, wherein the writing unit displays the second detected unit on the display unit based on the information detected from the third detected unit by the second detection unit. It is also a tool for removing the mask from the mask adapter.
A removal detector for detecting that the mask has been removed from the mask adapter is provided.
The mask adapter mounting tool according to claim 28 or 29, wherein when the writing unit detects that the mask has been removed from the mask adapter by the removal detection unit, the display on the display unit is erased. The mask adapter mounting tool according to claim 27, comprising a second detection unit for detecting a third detection unit including information about the mask provided on the mask. A mask adapter mounting tool that attaches the mask to a mask adapter used in an exposure apparatus that exposes a pattern formed on a mask onto a substrate.
A mask adapter mounting tool provided with a second detection unit for detecting a third detection unit including information about the mask provided on the mask. A lifting device for moving the mask in the vertical direction with respect to the mask adapter is provided.
The mask adapter mounting tool according to any one of claims 27 to 32, wherein the elevating device lowers the mask located above the mask adapter and arranges the mask on the mask adapter. The mask adapter mounting tool according to claim 33, wherein the elevating device arranges the mask on the mask adapter having a frame shape surrounding the mask in a plan view. An illumination optical system that illuminates the mask attached to the mask adapter by the mask adapter attachment tool according to any one of claims 27 to 34.
An exposure device including a projection optical system that projects a pattern of the mask illuminated by the illumination optical system onto the substrate. Attaching the mask to the mask adapter by using the mask adapter attachment tool according to any one of claims 27 to 34.
Illuminating the mask attached to the mask adapter and
To expose the substrate by projecting an illuminated image of the mask pattern onto the substrate.
To develop the exposed substrate and
Device manufacturing method including.

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